A memory cell includes a first resistive memory element, a second resistive memory element electrically coupled with the first resistive memory element at a common node, and a switching element comprising an input terminal electrically coupled with the common node, the switching element comprising a driver configured to float during one or more operations.

Systems, methods, and apparatus related to spike current suppression in a memory array. In one approach, a memory device includes a memory array having a cross-point memory architecture. The memory array has access lines (e.g., word lines and/or bit lines) configured to access memory cells of the memory array. Each access line is split into left and right portions. Each portion is electrically connected to a single via, which a driver uses to generate a voltage on the access line. To reduce electrical discharge associated with current spikes, a first resistor is located between the left portion and the via, and a second resistor is located between the right portion and the via.

An integrated circuit includes a first plurality of flip flops; a first bank of resistive memory cells, wherein each flip flop of the first plurality of flip flops uniquely corresponds to a resistive memory cell of the first bank of resistive memory cells; write circuitry configured to store data from the first plurality of flip flops to the first bank of resistive memory cells; and read circuitry configured to read data from the first bank of resistive memory cells and provide the data from the first bank for storage into the first plurality of flip flops.

Some embodiments include an integrated assembly having a set of true digit-lines and a set of complementary digit-lines. Each of the complementary digit-lines is comparatively coupled with an associated one of the true digit-lines. A semiconductor substrate is under the true digit-lines. The semiconductor substrate includes semiconductor features which project upwardly from a semiconductor base and which extend along a first direction. Each of the semiconductor features has opposing sidewalls. First source/drain regions are within the semiconductor features and second source/drain regions are within the semiconductor base. The true digit-lines are coupled with the first source/drain regions. Wordlines are along the opposing sidewalls and include gating regions which gatedly couple the first source/drain regions with the second source/drain regions. Storage-elements are coupled with the second source/drain regions. In some embodiments, memory may utilize a 4F.sup.2 layout.

A memory cell includes a first resistive memory element, a second resistive memory element electrically coupled with the first resistive memory element at a common node, and a switching element comprising an input terminal electrically coupled with the common node, the switching element comprising a driver configured to float during one or more operations.

An integrated circuit is disclosed. The integrated circuit includes a transistor, a first fuse element and a second fuse element. The transistor is formed in a first conductive layer. The first fuse element is formed in a second conductive layer disposed above the first conductive layer. The second fuse element is formed in the second conductive layer and is coupled to the first fuse element. The transistor is coupled through the first fuse element to a first data line for receiving a first data signal, and the transistor is coupled through the second fuse element to a second data line for receiving a second data signal. A method of fabricating an integrated circuit (IC) is also disclosed herein.

According to one embodiment, a memory device includes first to third interconnects, memory cells, and selectors. The first to third interconnects are provided along first to third directions, respectively. The memory cells includes variable resistance layers formed on two side surfaces, facing each other in the first direction, of the third interconnects. The selectors couple the third interconnects with the first interconnects. One of the selectors includes a semiconductor layer provided between associated one of the third interconnects and associated one of the first interconnects, and gates formed on two side surfaces of the semiconductor layer facing each other in the first direction with gate insulating films interposed therebetween.

A data storage device includes a memory die. The memory die includes a resistive random access memory (ReRAM) having a first portion and a second portion that is adjacent to the first portion. A method includes determining whether to access the second portion of the ReRAM in response to initiating a first operation targeting the first portion of the ReRAM. The method further includes initiating a second operation that senses information stored at the second portion to generate sensed information in response to determining to access the second portion. The method further includes initiating a third operation to rewrite the information at the ReRAM in response to detecting an indication of a disturb condition based on the sensed information.

A resistive memory structure, for example, phase change memory structure, includes one access device and two or more resistive memory cells. Each memory cell is coupled to a rectifying device to prevent parallel leak current from flowing through non-selected memory cells. In an array of resistive memory bit structures, resistive memory cells from different memory bit structures are stacked and share rectifying devices.

Operating characteristics associated with NAND flash memory can be modified and/or emulated to support corresponding operating characteristics for two-terminal memory. As a result, NAND flash memory modules included in conventional NAND flash memory devices (e.g., memory cards, solid-state drives, etc.) can be replaced with two-terminal memory without substantial changes to manufacturing infrastructure associated with the manufacture of these NAND flash memory devices.