G11C2213/78

MEMORY DEVICE AND METHOD OF FORMING THE SAME

A memory device includes a memory cell array. The memory cell array includes first-tier word lines extending in a first direction, second-tier word lines disposed below the first-tier word lines and extending in a second direction angularly offset from the first direction, and bit lines extending in a third direction angularly offset from the first and second directions. The bit lines are arranged between a pair of the first-tier word lines and between a pair of the second-tier word lines.

Integrated circuit including eFuse cell

An integrated circuit is disclosed. The integrated circuit includes a transistor, a first fuse element and a second fuse element. The transistor is formed in a first conductive layer. The first fuse element is formed in a second conductive layer disposed above the first conductive layer. The second fuse element is formed in the second conductive layer and is coupled to the first fuse element. The transistor is coupled through the first fuse element to a first data line for receiving a first data signal, and the transistor is coupled through the second fuse element to a second data line for receiving a second data signal. A method of fabricating an integrated circuit (IC) is also disclosed herein.

SPIKE CURRENT SUPPRESSION IN A MEMORY ARRAY

Systems, methods, and apparatus related to spike current suppression in a memory array. In one approach, a memory device includes a memory array having a cross-point memory architecture. The memory array has access lines (e.g., word lines and/or bit lines) configured to access memory cells of the memory array. Each access line is split into left and right portions. Each portion is electrically connected to a single via, which a driver uses to generate a voltage on the access line. To reduce electrical discharge associated with current spikes, a first resistor is located between the left portion and the via, and a second resistor is located between the right portion and the via.

Hybrid memristor/field-effect transistor memory cell and its information encoding scheme

A resistive random-access memory (ReRAM) includes a hybrid memory cell. The hybrid memory cell includes: (a) a left resistance-switching device comprising a first terminal and a second terminal, (b) a right resistance-switching device comprising a first terminal and a second terminal, wherein the first terminal of the right resistance-switching device is connected to the first terminal of the left-resistive switching device at an internal node, and (c) a transistor comprising a source terminal, a drain terminal, and a gate terminal, wherein the drain terminal of the transistor is connected to the left resistance-switching device and the right resistance-switching device at the internal node.

ELECTRONIC DEVICE WITH VARIABLE RESISTANCE LAYERS AND INSULATING LAYERS ALTERNATELY STACKED AND METHOD OF MANUFACTURING THE SAME
20220285439 · 2022-09-08 ·

A method of manufacturing an electronic device includes alternately forming first variable resistance layers and insulating layers, forming conductive pillars passing through the first variable resistance layers and the insulating layers, forming a slit passing through the first variable resistance layers and the insulating layers and extending in a first direction, forming openings by etching the first variable resistance layers exposed through the slit, and forming conductive layers in the respective openings.

CAPACITIVE PILLAR ARCHITECTURE FOR A MEMORY ARRAY
20220262859 · 2022-08-18 ·

Methods, systems, and devices for a capacitive pillar architecture for a memory array are described. An access line within a memory array may be, include, or be coupled with a pillar. The pillar may include an exterior electrode, such as a hollow exterior electrode, surrounding an inner dielectric material that may further surround an interior, core electrode. The interior electrode may be maintained at a voltage level during at least a portion of an access operation for a memory cell coupled with the pillar. Such a pillar structure may increase a capacitance of the pillar, for example, based on a capacitive coupling between the interior and exterior electrodes. The increased capacitance may provide benefits associated with operating the memory array, such as increased memory cell programming speed, programming reliability, and read disturb immunity.

CAPACITIVE PILLAR ARCHITECTURE FOR A MEMORY ARRAY
20220190031 · 2022-06-16 ·

Methods, systems, and devices for a capacitive pillar architecture for a memory array are described. An access line within a memory array may be, include, or be coupled with a pillar. The pillar may include an exterior electrode, such as a hollow exterior electrode, surrounding an inner dielectric material that may further surround an interior, core electrode. The interior electrode may be maintained at a voltage level during at least a portion of an access operation for a memory cell coupled with the pillar. Such a pillar structure may increase a capacitance of the pillar, for example, based on a capacitive coupling between the interior and exterior electrodes. The increased capacitance may provide benefits associated with operating the memory array, such as increased memory cell programming speed, programming reliability, and read disturb immunity.

RRAM MEMORY CELL WITH MULTIPLE FILAMENTS
20220093687 · 2022-03-24 ·

The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a first resistive random access memory (RRAM) element over a substrate. The first RRAM element has a first terminal and a second terminal. A second RRAM element is arranged over the substrate and has a third terminal and a fourth terminal. The third terminal is electrically coupled to the first terminal of the first RRAM element. A reading circuit is coupled to the second terminal and the fourth terminal. The reading circuit is configured to read a single data state from both a first non-zero read current received from the first RRAM element and a second non-zero read current received from the second RRAM element.

Physically unclonable function architecture including memory cells with parallel-connected access transistors and common write wordlines

Disclosed is a memory cell including parallel-connected first access transistors and a first variable resistor in series between a bitline and a source line and parallel-connected second access transistors and a second variable resistor in series between the bitline and the source line. A write wordline controls one pair of first and second access transistors so that, during an initialization mode, the resistors are concurrently subjected to the same write bias conditions for one-time programming to switch from an unprogrammed state (where the resistors have the same first resistance state) to a programmed state (where one resistor has switched to a second resistance state and a bit is stored). Discrete first and second read wordlines control another pair of first and second access transistors to enable discrete read processes associated with the first and second variable resistors. Also disclosed are an associated circuit (e.g., a PUF) and a method.

Interleaved routing for MRAM cell selection

In some embodiments, the present disclosure relates to an integrated circuit. The integrated circuit includes a first memory device and a second memory device arranged over a substrate. The first memory device is coupled to a first bit-line. The second memory device is coupled to a second bit-line. A shared control element is arranged within the substrate and is configured to provide access to the first memory device and to separately provide access to the second memory device. The shared control element includes one or more control devices sharing one or more components.