A random number generator device has at least at least a memory unit, a voltage generator, and a control circuit. Each memory unit has two memory cells, one of the two memory cells is coupled to a bias line and a first bit line, and another of the two memory cells is coupled to the bias line and a second bit line. The voltage generator provides the two memory cells a bias voltage, a first bit line voltage and a second bit line voltage via the bias line, the first bit line and the second bit line respectively. The control circuit shorts the first bit line and the second bit line to program the two memory cells simultaneously during a programming period and generates a random number bit according the statuses of the two memory cells during a reading period.

A single poly NVM cell includes a first N-type well region and a second N-type well region spaced apart from each other by a P-type semiconductor layer, a first active region and a second active region disposed in the first N-type well region and the second N-type well region, respectively, a P-channel floating gate transistor including a floating gate disposed in the first active region, a P-type drain region disposed in the first active region, and a P-type junction region disposed in the first active region, wherein the floating gate extends to over the second active region, a P-channel read selection transistor including a read selection gate electrode disposed in the first active region, the P-type junction region disposed in the first active region, and a P-type source region disposed in the first active region, and an interconnection line connecting the first N-type well region to the P-type source region of the P-channel read selection transistor.

A memory cell array of a multi-time programmable non-volatile memory includes plural memory cells. The memory cell has the structure of 1T1C cell, 2T1C cell or 3T1C cell. Moreover, the floating gate transistors of the memory cells in different rows of the memory cell array are constructed in the same well region. Consequently, the chip size is reduced. Moreover, by providing proper bias voltages to the memory cell array, the program action, the erase action or the read action can be performed normally.

A memory cell of a memory cell array includes a well region, a first doped region, a second doped region, a first gate structure, and a storage structure. The first doped region and the second doped region are formed in the well region. The first gate structure is formed over a first surface between the first doped region and the second doped region. The storage structure is formed over a second surface and the second surface is between the first surface and the second doped region. The storage structure is covered on a portion of the first gate structure, the second surface and an isolation structure.

A differential sensing device includes two reference cells, four path selectors, and four sample circuits. The first path selector is coupled to a first sensing node, the second reference cell, and a first memory cell. The second path selector is coupled to a second sensing node, the first reference cell, and the first memory cell. The third path selector is coupled to a third sensing node, the first reference cell, and a second memory cell. The fourth path selector is coupled to a fourth sensing node, the second reference cell, and the second memory cell. During a sample operation, the first sample circuit samples a first cell current, the second sample circuit samples the first reference current, the third sample circuit samples a second cell current, and the fourth sample circuit samples the second reference current.

A non-volatile memory cell includes a first well of a first conductivity type and a second well of a second conductivity type in a body adjacent to each other; a first conduction region, a second conduction region and a third conduction region in the first well, the first, second and third conduction regions being of the second conductivity type; a control gate region, of the first or second conductivity type, in the second well; a selection gate over the first well forming, together with the first and second conduction regions, a selection transistor; and a floating gate region. The floating gate region has a programming portion overlying the first well and a capacitive portion overlying the second well. The floating gate region forms, together with the second and third conduction regions, a storage transistor and, together with the control gate region, a capacitive element.

An erasable programmable single-poly non-volatile memory cell and an associated array structure are provided. In the memory cell of the array structure, the assist gate region is composed at least two plate capacitors. Especially, the assist gate region at least contains a poly/poly plate capacitor and a metal/poly plate capacitor. The structures and the fabricating processes of the plate capacitors are simple. In addition, the uses of the plate capacitors can effectively reduce the size of the memory cell.

A memory device includes a well, a poly layer, a dielectric layer, an alignment layer and an active area. The poly layer is formed above the well. The dielectric layer is formed above the poly layer. The alignment layer is formed on the dielectric layer, used to receive an alignment layer voltage and substantially aligned with the dielectric layer in a projection direction. The active area is formed on the well. The dielectric layer is thicker than the alignment layer. A first overlap area of the poly layer and the active area is smaller than a second overlap area of the poly layer and the dielectric layer excluding the first overlap area.

A write voltage generator is connected with a magnetoresistive random access memory. The write voltage generator provides a write voltage during a write operation. A storage state of a selected memory cell in a write path of the magnetoresistive random access memory is changed in response to the write voltage. The write voltage generator includes a temperature compensation circuit and a process corner compensation circuit. The temperature compensation circuit generates a transition voltage according to an ambient temperature. The transition voltage decreases with the increasing ambient temperature. The process corner compensation circuit receives the transition voltage and generates the write voltage.

A self-biased sense amplification circuit includes a local bit line, a reset unit, a main bit lie, a pre-amplifier, a data line, a sample reference unit, and a sense amplifier. The local bit line receives a cell current generated by a memory cell during a sense operation. The reset unit resets the local bit line to a first system voltage during a sample operation. The pre-amplifier generates a read current on the main bit line according to a voltage of the local bit line during the sample operation and the sense operation. The data line is coupled to the main bit line. The sample reference unit generates a first reference current and a second reference current during the sample operation, and generates the first reference current during the sense operation. The sense amplifier senses a voltage of the data line.