A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.

To provide an X-ray microscope that has a size small enough to be brought into a room by shortening the path length, an X-ray microscope including at least one of each of an X-ray source 1, a sample holding part 3, a concave KB mirror 4, a convex KB mirror 5, and a light receiving part 8 located at a position in an imaging relation to a position of the sample holding part 3 in this order along an optical axis is fabricated.

A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.

Described herein are systems and methods for assembling electron spin and charge to possess one or more properties of a magnetic monopole. Example systems can include a laser configured to generate a light beam with a first spin and/or a first orbital angular momentum, and a surface including a coupling structure having a geometrical charge. When exposed to the light beam, the surface is configured to enable excitations of surface plasmon polariton field waves at metal-dielectric interfaces of the coupling structure to generate a plasmonic field. The surface can be configured to focus the plasmonic field to form a plasmonic vortex, in which plasmonic spin-orbit coupling between a total spin and a total orbital angular momentum forms a topological spin texture that is homotopic to that of a magnetic monopole.

An X-ray system comprises: a source of an X-ray diverging beam having a central imaging portion and a peripheral treatment-portion; a lens transforming the peripheral treatment portion of the X-ray beam into a converging beam directed to a target; a shutter located between the X-ray source and the target in the central imaging portion of the X-ray radiation; and a detector of imaging radiation after interaction with the target and to provide imaging information of the target.

An optical system has a light source having an original etendue of less than 0.1 mm.sup.2 for an illumination system for projection lithography. An optical assembly serves for simultaneously increasing the etendue of a used emission of the light source. The optical assembly is embodied such that an increase in the etendue by at least a factor of 10 results. A component of the optical assembly that is impinged on is displaced relative to the light source such that an impingement region of the emission of the light source on the optical component of the optical assembly varies temporally.

The invention relates to a grating arrangement and a method for spectral filtering of an X-ray beam (B), the grating arrangement comprising: a dispersive element (10) comprising a prism configured to diffract the X-ray beam (B) into a first beam component (BC1) comprising a first direction (D1) and a second beam component comprising (BC2) a second direction (D2), tilted with respect to the first direction; a first grating (20) configured to generate a first diffraction pattern (DP1) of the first beam component (BC1) and a second diffraction pattern (DP2) of the second beam component (BC2), the second diffraction pattern (DP2) shifted with respect to the first diffraction patter (DP1); and a second grating (30) comprising at least one opening (31) which is aligned along a line (d) from a maximum (MA) to a minimum (MI) of intensity of the first diffraction pattern (DP1) or of the second diffraction pattern (DP2).

An X-ray system comprises: (a) a source providing an X-ray diverging beam having treatment and imaging angular portions; (b) one or more lenses transforming the treatment portion of the X-ray beam into a converging beam directed to a target; (c) a first shutter located between the X-ray source and the target in the imaging portion of the X-ray radiation; the first shutter being selectively openable such that imaging portion of X-ray beam reaches the target; and (d) a detector configured to detect at least a portion of the imaging radiation after the imaging radiation has interacted with the target to provide imaging information of the target.

An embodiment of the invention relates to an X-ray device, more particularly for phase-contrast imaging in the medical sector. In at least one embodiment, the X-ray device includes an X-ray radiation source, a coherence grid, a phase grid and an X-ray detector from a number of pixels arranged in a matrix, the pixels including a lens grid.

A neutral beam and extreme ultraviolet (EUV) light-generating device capable of generating EUV light while generating a neutral beam. The neutral beam and EUV light-generating device includes: an ion beam source configured to generate an ion beam and to output the ion beam in a first direction, a first electron beam source configured to generate a first electron beam incident on the ion beam, a second electron beam source configured to generate and output a second electron beam, and a first electromagnetic control device configured to control a traveling direction of the second electron beam to cause the second electron beam to collide head-on with the ion beam to generate a neutral beam and EUV light.