G21K1/067

Structured grating component, imaging system and manufacturing method

The invention relates to a method of manufacturing a structured grating, a corresponding structured grating component (1) and an imaging system. The method comprising the steps of: providing (110, 120, 130) a catalyst (30) on a substrate (20), the catalyst (20) having a grating pattern; growing (140) nanostructures (50) on the catalyst (30) so as to form walls (52) and trenches (54) based on the grating pattern; and filling (160) the trenches (54) between the walls (52) of nanostructures (50) using an X-ray absorbing material (70). The invention provides an improved method for manufacturing a structured grating and such structured grating component (1), which is particularly suitable for dark-field X-ray imaging or phase-contrast imaging.

OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION AND OPTICAL ARRANGEMENT

The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λ.sub.EUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.

X-ray apparatus including x-ray reflector and method for operating the x-ray apparatus
11229411 · 2022-01-25 · ·

An X-ray apparatus includes an X-ray source embodied to generate X-rays; an X-ray detector; and an X-ray reflector. The X-ray reflector is embodied to reflect X-rays generated by the X-ray source such that the reflected X-rays hit the X-ray detector. The X-ray detector is in particular embodied to detect the X-rays. The X-ray apparatus can, on the one hand, enlarge the available space above a patient. Furthermore, focusing via the X-ray reflector enables the power of the X-ray source to be increased while retaining a constant spatial resolution or the spatial resolution to be improved while retaining a constant power of the X-ray source.

OPTICAL SYSTEM WITH VARIABLE FOCAL DISTANCE AND OPTICAL ASSEMBLY COMPRISING SUCH A SYSTEM

The present invention relates to an optical system with a variable focal distance in a predetermined focal distance range, comprising two mirrors and a KB mechanical assembly having two supports adapted to support the mirrors one after the other along their main axis so as to form a propagation path.

The system is characterized in that each mirror has a useful portion whose width and/or thickness is/are variable and selected according to said predetermined distance range, and in that, for each mirror, it further comprises a deformation mechanism adapted to generate a curvature of the corresponding mirror along its length to adjust the focal distance within said predetermined distance range.

X-RAY ANALYZER
20220003691 · 2022-01-06 · ·

An X-ray analyzer includes an X-ray source, a straight tube type multi-capillary, a flat plate spectroscopic crystal, a parallel/point focus type multi-capillary X-ray lens, and a Fresnel zone plate. A qualitative analysis is performed over an area on the sample, the flat plate spectroscopic crystal and the Fresnel zone plate are removed from the X-ray optical path, and X-rays are collected by the multi-capillary lens and the sample is irradiated. When analyzing the chemical morphology of an element, the multi-capillary lens retracts from the optical path, the source rotates, and the flat plate spectroscopic crystal and the Fresnel zone plate are inserted on the optical path. A narrow sample area is irradiated by the Fresnel zone plate with X-rays having energy extracted from the flat plate spectroscopic crystal. This makes it possible to carry out accurate qualitative analysis on the sample and perform detailed analysis of more minute parts.

X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles
11217357 · 2022-01-04 · ·

An x-ray mirror optic includes a plurality of surface segments with quadric cross-sections having differing quadric parameters. The quadric cross-sections of the surface segments share a common axis and are configured to reflect x-rays in a plurality of reflections along a single optical axis or in a scattering plane defined as containing an incident x-ray and a corresponding reflected x-ray.

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
20230292426 · 2023-09-14 · ·

An extreme ultraviolet light generation apparatus includes a target supply unit configured to output a droplet target into a chamber device, a prepulse laser light irradiation system configured to irradiate the droplet target with prepulse laser light having linear polarization to generate a diffusion target, and a main pulse laser light irradiation system configured to irradiate the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, a cross section perpendicular to an optical axis of the main pulse laser light when being radiated to the diffusion target having a shape longer in a polarization direction of the prepulse laser light when being radiated to the droplet target than in directions other than the polarization direction.

ATOMIC COOLING AND TRAPPING METHODS AND APPARATUS

An optical trap for laser cooling and trapping atoms. Three pairs of laser beams are directed to cross in a vacuum chamber at a common intersection volume, wherein each pair is formed by two counterpropagating beams. Rather than having a mutually orthogonal arrangement in which each beam pair forms an angle χ of 45° to a reference axis, z, these angles are instead between 5°≤χ≤40°. Moreover, in each beam pair, the counterpropagating beams are not precisely aligned in a common path, as in a conventional magneto-optical trap, but are slightly misaligned by respective misalignment angles [α, β, κ] of typically 0.1° to 2°. The misalignment angles and beam widths are however selected so that a common intersection volume for all six beams is maintained. This provides an all-optical trap in which laser cooling and trapping of atoms takes place without a magnetic field being present.

X-ray analyzer

An X-ray analyzer includes an X-ray source, a straight tube type multi-capillary, a flat plate spectroscopic crystal, a parallel/point focus type multi-capillary X-ray lens, and a Fresnel zone plate. A qualitative analysis is performed over an area on the sample, the flat plate spectroscopic crystal and the Fresnel zone plate are removed from the X-ray optical path, and X-rays are collected by the multi-capillary lens and the sample is irradiated. When analyzing the chemical morphology of an element, the multi-capillary lens retracts from the optical path, the source rotates, and the flat plate spectroscopic crystal and the Fresnel zone plate are inserted on the optical path. A narrow sample area is irradiated by the Fresnel zone plate with X-rays having energy extracted from the flat plate spectroscopic crystal. This makes it possible to carry out accurate qualitative analysis on the sample and perform detailed analysis of more minute parts.

Testing of curved X-ray gratings

The present invention relates to a method, and a corresponding device, for testing a radius of curvature and/or for detecting inhomogeneities of a curved X-ray grating for a grating-based X-ray imaging device. The method comprises generating a beam of light diverging from a source point, propagating along a main optical axis and having a line-shaped beam profile. The method comprises reflecting the beam off a concave reflective surface of the grating. A principal axis of the concave reflective surface coincides with the main optical axis and the source point is at a predetermined distance from a point where the main optical axis intersects the concave reflective surface. The method comprises determining whether a projection of the reflected beam in a plane at or near the source point is present outside a central region around the source point, in which an absence of this projection outside the central region indicates that a radius of curvature of the concave reflective surface corresponds to the predetermined distance and/or that the reflective surface is substantially homogeneously curved along a curve formed by the beam impinging on the concave reflective surface.