Provided is an electromagnetic field control member including a first insulating member that is made of a ceramic having a tubular shape and includes a plurality of through holes extending in an axial direction; a conductive member made of a metal, the conductive member sealing off each of the through holes and leaving an opening portion in the through hole, the opening portion opening to an outer periphery of the first insulating member; a power feed terminal connected to the conductive member; and flanges respectively located at two ends of the first insulating member. A second insulating member made of a ceramic having a tubular shape is disposed on an outer peripheral side of the first insulating member, and includes two ends that are hermetically fixed to the flanges, respectively.

A loading assembly configured for providing atomic objects to an atomic object confinement apparatus is provided. The loading assembly comprises one or more ovens. Each oven (a) comprises a respective oven nozzle and (b) is configured to generate a respective atomic flux of a respective atomic species via the respective oven nozzle. The loading assembly comprises a mirror array and a magnet array configured to, when optical beams are provided to the mirror and magnet assembly, generate a two-dimensional magneto-optical trap (2D MOT). The 2D MOT is configured to generate a substantially collimated atomic beam from the respective atomic fluxes generated by the one or more ovens. The loading assembly further comprises a differential pumping tube defining a beam path. The differential pumping tube is configured to provide the substantially collimated atomic beam via the beam path. The respective oven nozzle of each of the one or more ovens is misaligned with the beam path and the 2D MOT is configured to provide the substantially collimated atomic beam in alignment with the beam path.

A loading assembly configured for providing atomic objects to an atomic object confinement apparatus is provided. The loading assembly comprises one or more ovens. Each oven (a) comprises a respective oven nozzle and (b) is configured to generate a respective atomic flux of a respective atomic species via the respective oven nozzle. The loading assembly comprises a mirror array and a magnet array configured to, when optical beams are provided to the mirror and magnet assembly, generate a two-dimensional magneto-optical trap (2D MOT). The 2D MOT is configured to generate a substantially collimated atomic beam from the respective atomic fluxes generated by the one or more ovens. The loading assembly further comprises a differential pumping tube defining a beam path. The differential pumping tube is configured to provide the substantially collimated atomic beam via the beam path. The respective oven nozzle of each of the one or more ovens is misaligned with the beam path and the 2D MOT is configured to provide the substantially collimated atomic beam in alignment with the beam path.

A particle beam adjustment device includes: a position monitor that detects a positional deviation of a particle beam transported from a beam transport section; an interlock device to interrupt irradiation of the particle beam when a positional deviation of the particle beam is detected by the position monitor; a pair of screen monitors that measure position and angle of an axis of the particle beam; a correction electromagnet that controls the axis of the particle beam by adjusting a magnetic field on a basis of a signal indicating the particle beam position and angle measured by the screen monitors; and a beam scanning electromagnet that irradiates an irradiation target with the particle beam. One of the screen monitors is installed outside a treatment room, and the other screen monitor and the position monitor are installed inside the treatment room.

A particle beam adjustment device includes: a position monitor that detects a positional deviation of a particle beam transported from a beam transport section; an interlock device to interrupt irradiation of the particle beam when a positional deviation of the particle beam is detected by the position monitor; a pair of screen monitors that measure position and angle of an axis of the particle beam; a correction electromagnet that controls the axis of the particle beam by adjusting a magnetic field on a basis of a signal indicating the particle beam position and angle measured by the screen monitors; and a beam scanning electromagnet that irradiates an irradiation target with the particle beam. One of the screen monitors is installed outside a treatment room, and the other screen monitor and the position monitor are installed inside the treatment room.

Reflectron-electromagnetostatic cells for use in mass spectrometers are provided herein that cause ion packets to pass through the cell a plurality of times during fragmentation.

Reflectron-electromagnetostatic cells for use in mass spectrometers are provided herein that cause ion packets to pass through the cell a plurality of times during fragmentation.

The present invention provides a vapor-cell system comprising: a vapor-cell region configured for vapor-cell optical paths; a first electrode disposed in contact with the vapor-cell region; a second electrode electrically isolated from the first electrode; and an ion conductor interposed between the first electrode and the second electrode. The first electrode, the ion conductor, and the second electrode collectively form a bidirectional solid-state electrochemical charge-depletion capacitor. The ion conductor is ionically conductive for mobile ions, such as Rb.sup.+, Cs.sup.+, Na.sup.+, K.sup.+, or Sr.sup.2+. The first electrode is permeable to the mobile ions and/or neutral atoms formed from the mobile ions. The system can be electrically controlled to quickly pump mobile ions into or out of the vapor-cell region. The system may further contain an atom chip, and the vapor-cell optical paths may be configured to trap a population of cold atoms. Methods of operating these vapor-cell systems are also disclosed.

Apparatus and methods for controlling a radiotherapy electron beam. Exemplary embodiments provide for focusing the electron beam at different depths by altering parameters of a plurality of magnets. Exemplary embodiments can also provide for focusing the electron beam at different depths while maintaining the energy level of the electron beam at a consistent level.

Apparatus and methods for controlling a radiotherapy electron beam. Exemplary embodiments provide for focusing the electron beam at different depths by altering parameters of a plurality of magnets. Exemplary embodiments can also provide for focusing the electron beam at different depths while maintaining the energy level of the electron beam at a consistent level.