Patent classifications
G21K2201/068
REFLECTOR
A reflector (15) for cooling or trapping atoms or molecules, the reflector (15) having a reflecting surface (17) forming a perimeter around and facing a central axis (33), the reflecting surface (17) extending along the axis (33), and converging from a first end of the reflector (15) towards a second end of the reflector (15), such that the reflecting surface (17) is arranged to reflect input laser light to form a cooling region (21), wherein an aperture (23) for providing a beam (27) of cooled atoms or molecules from the cooling region (21) is formed in the reflecting surface (17), the aperture (23) perpendicular to the central axis (33), such that the reflector (15) forms a truncated pyramid, and wherein the reflecting surface (17) is formed by three or more planar mirrors (39a-d) arranged around and at an angle to the central axis (33).
BEAM SHAPING ASSEMBLY FOR NEUTRON CAPTURE THERAPY
In order to improve flux and quality of neutron sources, the disclosure provides a beam shaping assembly for neutron capture therapy includes: a beam inlet; a target, wherein the target has nuclear reaction with an incident proton beam from the beam inlet to produce neutrons; a moderator adjoining to the target, wherein the neutrons are moderated by the moderator to epithermal neutron energies, the moderator includes a main body and a supplement section surrounding the main body, the main body and the supplement section form at least a tapered structure; a reflector surrounding the moderator; a thermal neutron absorber adjoining to the moderator; a radiation shield arranged inside the beam shaping assembly, wherein the radiation shield is used for shielding leaking neutrons and photons so as to reduce dose of the normal tissue not exposed to irradiation; and a beam outlet.
NEUTRAL BEAM AND EXTREME ULTRAVIOLET LIGHT-GENERATING DEVICE AND METHOD
A neutral beam and extreme ultraviolet (EUV) light-generating device capable of generating EUV light while generating a neutral beam. The neutral beam and EUV light-generating device includes: an ion beam source configured to generate an ion beam and to output the ion beam in a first direction, a first electron beam source configured to generate a first electron beam incident on the ion beam, a second electron beam source configured to generate and output a second electron beam, and a first electromagnetic control device configured to control a traveling direction of the second electron beam to cause the second electron beam to collide head-on with the ion beam to generate a neutral beam and EUV light.
Scattering fast neutrons that have passed through an irradiated first sample to generate radioisotopes in both the first sample and a second sample
A method and apparatus for producing radioisotopes. The method includes generating fast neutrons by irradiating a neutron producing target with a deuteron beam from a deuteron accelerator. These fast neutrons directly irradiate a first sample. The fast neutrons that pass through the first sample undergo multiple-scattering by a neutron scattering material made of a light element positioned around both the neutron producing target and the first sample. This arrangement generates various radioisotopes simultaneously in large amounts from both the first sample and a second sample through nuclear reactions. The method enables production of multiple radioisotopes in a single process for applications in medicine, research, education, agriculture, and industry.
Speckle-based imaging diffuser and method for controllably fabricating same
A mask for use in a speckle-based x-ray or neutron phase contrast imaging system and methods of making the mask are disclosed. The mask may either absorb or change the phase of the incident x-ray or neutron beam. The mask in various embodiments has consistent statistics across the mask, is locally unique (thereby avoiding ambiguous correlations), has a speckle size on the order of the imaging system's resolution, has a speckle pattern that is visible through the sample being imaged, and/or is matched to the energy level of the imaging system and the sample density. These mask attributes are controlled by the method and materials used in the fabrication of the mask. Various embodiments use a pseudo-random binary array for generating the required speckle pattern.
ELECTRON BEAM DEFLECTOR
There is provided an electron beam deflector (32) for use in electron beam welding, the deflector (32) comprising a planar body (32) defining at least one channel (36) enabling passage of an electron beam (14) to a weld site, wherein at least one deflector element (44) in the form of an electromagnetic coil is disposed within the at least one channel (36) and the electromagnetic coil (44) is configured to modify the direction of travel of an electron beam so as to deflect the electron beam (14) to be incident substantially orthogonal to a weld site of a workpiece. The planar body (32) comprises a separate base portion (40) and lid portion (42).