G01B9/02011

SYSTEM AND A METHOD FOR DETECTING A MATERIAL IN REGION OF INTEREST
20200043161 · 2020-02-06 ·

An exemplary system, method and computer-accessible medium for detecting deposits in subjects can be provided, which can include, for example receiving information related to reference information obtained from measurements in further subjects, obtaining a threshold regarding a suspect data points in the information, and detecting the deposits in the subjects based on the threshold of the suspect data points. Retardances induced by the deposits can be located below the deposits using references that can be positioned above the deposits. Inner and outer segments of a photoreceptor layer can be used as a reference to collect the retardances located below a retinal pigment epitheliumBruch's membrane complex.

Interferometer and optical instrument with integrated optical components

The interferometer 10 according to this disclosure includes: a first optical component 12 that splits each of the P polarization component and the S polarization component of the light to be measured into the first optical path R1 and the second optical path R2 and combines the light to be measured; a second optical component 13 placed in the first optical path; a third optical component 14 that splits the light to be measured into the P polarization component and the S polarization component; and a P polarization detector 11a and an S polarization detector 11b that respectively detect the P polarization component and the S polarization component split by the third optical component, wherein the second optical component has an optical surface that changes the propagation direction of the light to be measured and gives a phase difference between the P polarization component and the S polarization component.

Method and device for characterizing the surface shape of an optical element

Methods for characterizing the surface shapes of optical elements include the following steps: carrying out, in an interferometric test arrangement, at least a first interferogram measurement on the optical element by superimposing a test wave, which has been generated by diffraction of electromagnetic radiation on a diffractive element and has been reflected at the optical element, carrying out at least one additional interferogram measurement on in each case one calibrating mirror for determining calibration corrections, and determining the deviation from the target shape of the optical element based on the first interferogram measurement carried out on the optical element and the determined calibration corrections. At least two interferogram measurements are carried out for the at least one calibrating mirror, which differ from one another with regard to the polarization state of the electromagnetic radiation.

Polarization enhanced interferometric imaging

An imaging system uses polarized light to illuminate the target and then uses a polarization filter to remove the light that is reflected from the target without modification. The target can include one or more anisotropic objects that scatter the light and alter the polarization state of the reflected light and causing it to be selectively transmitted to the imaging device which can record the transmitted light through the filter. The illuminating light can be circularly polarized and the filter can remove the circularly polarized light. The target can include asymmetric nanoparticles, such as nanorods that alter the amplitude or phase of the scattered light enabling pass through the filter to be detected by the imaging device.

Inspecting a slab of material
10480925 · 2019-11-19 · ·

A system for inspecting a slab of material may include an optical fiber, a broadband light source configured to emit light having wavelengths of 780-1800 nanometers over the optical fiber, a beam-forming assembly configured to receive the light over the optical fiber and direct the light toward a slab of material, the beam-forming assembly may be configured to maintain the position of one or more elements within the beam-forming assembly despite changes in environmental temperature; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.

Displacement detecting device with controlled heat generation
10451401 · 2019-10-22 · ·

A displacement detecting device includes a first diffraction grating, a light source, a displacement detecting unit, and a light receiving unit. The displacement detecting unit includes a light flux dividing unit, a second diffraction grating, and a reference reflecting member. An incident angle of a first light flux to the first diffraction grating, a diffraction angle of the first diffraction grating, an incident angle of the first light flux to the second diffraction grating, and a diffraction angle of the second diffraction grating are angles at which a displacement amount in an optical path length of the first light flux from the light flux dividing unit to the first diffraction grating and a displacement amount in an optical path length of the first light flux from the first diffraction grating to the second diffraction grating become equal in a case where a measured member is displaced in a direction orthogonal to a measured surface.

Optical system, optical device, and program
10422624 · 2019-09-24 · ·

An optical system includes a polarized light phase shift optical circuit that includes a polarizing beam splitter that splits light having a coherence length shorter than a difference in optical path length between a normal optical path and a delay optical path having an optical path length longer than the normal optical path, the light being split into normal light, which travels along the normal optical path, and delay light, which travels along the delay optical path; a separator where the normal light and the delay light are individually emitted at a reference flat and the separator divides the reflected light that reflects off the reference flat into a plurality of light beams; and a plurality of image capture elements that respectively detect the intensities of the plurality of divided light beams, and the optical system also includes an information processor that includes a calibrator.

Coherent optical imaging for detecting neural signatures and medical imaging applications using holographic imaging techniques

A neural imaging system may include an imaging array, an image data processor operably coupled to the imaging array to process image data received from the imaging array, and a beam angle separator disposed between the imaging array and an object being imaged. The beam angle separator may be configured to separate an object beam reflected from the object being imaged into a plurality of reference beams each having different angular separation with respect to the object beam. The image data processor may be configured to generate image data of the object for each one of the reference beams to correspond to a respective different depth within the object.

Apparatus for a dynamic multi-axis heterodyne interferometric vibrometer

A multi-axis heterodyne interferometer is disclosed for observations of five degrees of dynamic freedom using a single illumination source. The sensor utilizes polarization and frequency multiplexing to simultaneously observe and separate the image and Fourier planes following scattering of coherent illumination from a dynamic surface. Multiple carrier frequencies and polarizations separate two segments of a Mach-Zehnder interferometer. Segments of this interferometer have unique optical configurations to generate the image and Fourier planes simultaneously on a focal plane array. The measured irradiance contains information pertaining to an object's in-plane translation, out-of-plane rotation, and out-of-plane displacement.

Position measurement system, calibration method, lithographic apparatus and device manufacturing method
10359708 · 2019-07-23 · ·

A position measurement system configured to measure a position of an object. The system includes an optical system to obtain a first measurement wave and a second measurement wave from a radiation source, and to allow the first and second measurement wave to at least partially interfere with each other after interaction of at least one of the first and second measurement wave with the object to form a first detection beam. The system further includes a first detector to receive the first detection beam. The system also has a processing unit configured to receive an output from the first detector and to determine a signal representative for the position of the object from the output, wherein the optical system includes a phase modulator configured to modulate a phase difference between the first measurement wave and the second measurement wave.