A three-dimensional measurement device includes: an optical system that splits incident light into two lights and radiates lights to a measurement object and to a reference surface, and recombines the two lights to emit combined light; a first irradiator that emits first light including first polarized light and entering a first surface; a second irradiator that emits second light including second polarized light and entering a second surface; a first imaging system to which the first output light enters wherein the first output light is emitted from the first surface when the first light enters the first surface; a second imaging system to which the second output light enters wherein the second output light is emitted from the second surface when the second light enters the second surface; and an image processor that performs three-dimensional measurement based on interference fringe images obtained by the first and second imaging systems.

Aspects of inventive concepts described herein relate to an interferometric reflectance imaging system. The system can include an imaging sensor including pixels that are preferentially sensitive to a plurality of light components; an illumination source configured to emit illumination light along an illumination path, the illumination light including the plurality of light components; and a target including a target substrate configured to support one or more nanoparticles on a surface of the target substrate. The system may be configured to, at a nominal focus position: generate an image at the imaging sensor based, at least in part, on the light reflected from the target interfering with light scattered from nanoparticles on the target substrate; and process the image to detect the nanoparticles on the target substrate.

A position measurement system configured to measure a position of an object. The system includes an optical system to obtain a first measurement wave and a second measurement wave from a radiation source, and to allow the first and second measurement wave to at least partially interfere with each other after interaction of at least one of the first and second measurement wave with the object to form a first detection beam. The system further includes a first detector to receive the first detection beam. The system also has a processing unit configured to receive an output from the first detector and to determine a signal representative for the position of the object from the output, wherein the optical system includes a phase modulator configured to modulate a phase difference between the first measurement wave and the second measurement wave.

A system for inspecting a slab of material may include an optical fiber, a broadband light source configured to emit light having wavelengths of 780-1800 nanometers over the optical fiber, a beam-forming assembly configured to receive the light over the optical fiber and direct the light toward a slab of material, the beam-forming assembly may be configured to maintain the position of one or more elements within the beam-forming assembly despite changes in environmental temperature; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.

Disclosed herein is a simultaneous orthogonal scanning dual beam OCT system. The simultaneous orthogonal scanning dual beam OCT system includes: a light source 10; a light distribution unit 20; a sample arm 40; a reference arm 50; a interference unit 60; and a detection unit 70.

An optical system includes a polarized light phase shift optical circuit that includes a polarizing beam splitter that splits light having a coherence length shorter than a difference in optical path length between a normal optical path and a delay optical path having an optical path length longer than the normal optical path, the light being split into normal light, which travels along the normal optical path, and delay light, which travels along the delay optical path; a separator where the normal light and the delay light are individually emitted at a reference flat and the separator divides the reflected light that reflects off the reference flat into a plurality of light beams; and a plurality of image capture elements that respectively detect the intensities of the plurality of divided light beams, and the optical system also includes an information processor that includes a calibrator.

The embodiments of the present disclosure relate to a Fabry-Perot cavity, a manufacturing method thereof, an interferometer and a measuring method for wavelength of light. The Fabry-Perot cavity includes two parallel substrates and a liquid crystal layer between the two parallel substrates, and a sealed cavity is defined between the two substrates; wherein the two substrates comprise a first substrate and a second substrate, light could enter through the first substrate and run out from the second substrate via the liquid crystal layer, and a deflection angle of the liquid crystal layer could be changed by applying various voltage between the two substrates.

A system for inspecting a slab of material may include a polarization maintaining single mode optical-fiber, a linearly polarized broadband light-source configured to emit a polarized-light over the optical fiber, a beam-assembly configured to receive the light over the optical fiber and direct the light toward a slab of material; a polarization-rotator for controlling polarization of the light directed to the slab of material from the beam-assembly; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.

A displacement detecting device includes a first diffraction grating, a light source, a displacement detecting unit, and a light receiving unit. The displacement detecting unit includes a light flux dividing unit, a second diffraction grating, and a reference reflecting member. An incident angle of a first light flux to the first diffraction grating, a diffraction angle of the first diffraction grating, an incident angle of the first light flux to the second diffraction grating, and a diffraction angle of the second diffraction grating are angles at which a displacement amount in an optical path length of the first light flux from the light flux dividing unit to the first diffraction grating and a displacement amount in an optical path length of the first light flux from the first diffraction grating to the second diffraction grating become equal in a case where a measured member is displaced in a direction orthogonal to a measured surface.

A system for inspecting a slab of material may include a polarization maintaining single mode optical-fiber, a linearly polarized broadband light-source configured to emit a polarized-light over the optical fiber, a beam-assembly configured to receive the light over the optical fiber and direct the light toward a slab of material; a polarization-rotator for controlling polarization of the light directed to the slab of material from the beam-assembly; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.