This disclosure provides photonic integrated chip that has an optical waveguide located on a photonic circuit substrate that includes a photonic circuit that is optically coupled to the waveguide. A microfluidic channel is in a silicon substrate and is attached to the photonic circuit substrate. The microfluidic channel is positioned over the optical waveguide such that its side surfaces and an outermost surface extend into the microfluidic channel. The microfluidic channel extends along a length of the optical waveguide, and nanoparticles are located on or adjacent the optical waveguide located within the microfluidic channel.

A method, measuring device, machining system and computer program product are provided for determining a corrected height signal from measurement data obtained with optical coherence tomography. The measurement data comprises an object signal and a background signal superimposed on the object signal, the object signal and the background signal being subject to different dispersion. A first transformation is performed comprising transforming the measurement data, the first transformation being targeted at the background signal to obtain a height signal, background components in the height signal are determined, the background components in the height signal are compensated to obtain a background-compensated height signal, an inverse transformation is performed comprising back-transforming the background-compensated height signal to obtain background-compensated measurement data, dispersion compensation for the object signal is performed to obtain dispersion-compensated and background-compensated measurement data, and a second transformation is performed comprising transforming the dispersion-compensated and background-compensated measurement data to obtain a dispersion-compensated and background-compensated height signal.

The present disclosure provides an OCT imaging system having a variety of advantages. In particular, the OCT system of the present disclosure may provide a more intuitive interface, more efficient usage of controls, and a greater ability to view OCT imaging data.

The invention relates to a device for measuring a substrate for semiconductor lithography with a reference interferometer for ascertaining the change in the ambient conditions, wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer, wherein the means is configured to bring about a change in the refractive index.

Furthermore, the invention relates to a method for correcting cyclic error components of a reference interferometer, wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer, comprising the following method steps: starting up the reference interferometer, continuously detecting measurement values of the reference interferometer, changing the optical path length of the measurement section of the reference interferometer until a path length change of at least one quarter of the wavelength of the reference interferometer is detected, determining the cyclic errors on the basis of the continuously detected measurement values of the reference interferometer, and correcting the current measurement values ascertained by the reference interferometer on the basis of the cyclic errors ascertained.

A method is disclosed for operating an endpoint detection system of a processing chamber having a ceiling formed therein, a substrate support located internal to the processing chamber, and a substrate resting on the substrate support. A transparent panel is located in the ceiling of the processing chamber, the panel oriented at a first acute angle relative to the substrate and the substrate support. The transparent panel receives an incident light beam from the endpoint detection system at a second acute angle relative to the panel. The transparent panel transmits the incident light beam to the substrate within the processing chamber at an angle perpendicular to the substrate and the substrate support.

The present disclosure provides an OCT imaging system having a variety of advantages. In particular, the OCT system of the present disclosure may provide a more intuitive interface, more efficient usage of controls, and a greater ability to view OCT imaging data.

Embodiments of the present invention provide a method and apparatus for frequency-domain optical interferometry imaging. Embodiments of the invention include an apparatus comprising a line-shaping optical element for directing optical radiation into a line illumination, an imaging optical element for receiving optical radiation comprising radiation reflected from a target sample and a reference point associated with the target sample, and a detection unit for measuring common path interferences between a plurality of reflections from the target sample and the reference point. Embodiments of the invention include a method comprising directing radiation into a line illumination, directing the line illumination towards a target sample, receiving radiation reflected from the target sample at a detection unit, and measuring common path interferences between a plurality of reflections at the target sample and a reference point.

A laser interference device includes: a measurement mirror being movable in an X direction; a reference mirror disposed at a position different from a position of the measurement mirror in a Y direction; a beam splitter having a splitting surface that divides a laser beam into a measurement light and a reference light; a first light guide configured to guide the measurement light incident from the beam splitter and emit the measurement light toward the measurement mirror; and a second light guide configured to guide the reference light incident from the beam splitter and emit the reference light toward the reference mirror, in which a first distribution path formed by the first light guide and a second distribution path formed by the second light guide are mutually equal in a mechanical path length and an optical path length.

An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.

There is described an interferometer for use in an optical locker. The interferometer comprises at least two transparent materials having different thermal path length sensitivities. The interferometer is configured such that an input beam is split by the interferometer into first and second intermediate beams, which recombine to form an output beam, the first and second intermediate beams travelling along respective first and second intermediate beam paths which do not overlap. At least one of the intermediate beam paths passes through at least two of the transparent materials. A length of each intermediate beam path which passes through each transparent material is selected such that an optical path difference between the first and second intermediate beam path is substantially independent of temperature.