A substrate processing system includes: a substrate processing apparatus including a stage on which a substrate and an annular member are placed; a substrate transport mechanism including a substrate holder; a distance sensor provided in the substrate holder; and a control device, wherein the substrate transport mechanism is configured to place a jig substrate having a reference surface as a reference for a height of the annular member on the stage, wherein the distance sensor is configured to measure a distance from the substrate holder positioned above the stage to the reference surface of the jig substrate and a distance from the substrate holder to the annular member, and wherein the control device is configured to estimate the height of the annular member based on a measurement result of the distance to the reference surface and a measurement result of the distance to the annular member.

Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device.

A measurement apparatus for measuring a height position of an object is provided. The apparatus comprises a light projector that projects measurement light onto the object, a light receiver that receives the measurement light reflected by the object, and a processor that determines a height position of the object based on an image of the measurement light received by the light receiver. The light projector projects a coarse detection pattern and a fine detection pattern having a periodic pattern onto the object, and the processor determines a coarse detection value of a height position of the object based on the coarse detection pattern received by the light receiver, and determines a fine detection value of a height position of the object based on the coarse detection value and the fine detection pattern received by the light receiver.

A method of training a lifeguard to properly view an area of a swimming pool or body of water and recognize a swimmer/bather in distress. The method includes: positioning submersible devices or other objects on a bottom of the swimming pool or body of water according to an established grid or pattern; observing the submersible devices to make observations; analyzing the observations to evaluate the ability to see the submersible devices under varying environmental and density conditions. The observation trains the lifeguard to recognize the swimmer/bather in distress in the swimming pool or body of water to minimize the risk of the swimmer/bather drowning.

A coordinate measuring machine (CMM) system is provided including utilization of a vision probe (e.g., for performing operations for determining and/or measuring surface profiles of workpieces, etc.) The angular orientation of the vision probe may be adjusted using a rotation mechanism so that the optical axis of the vision probe is directed toward an angled surface of a workpiece (e.g., in some implementations the optical axis may be approximately perpendicular to the angled workpiece surface). X-axis, y-axis and z-axis slide mechanisms (e.g., moving in mutually orthogonal directions) may in conjunction move the vision probe to acquisition positions along an image stack acquisition axis (which may approximately coincide with the optical axis) for acquiring a stack of images of the angled workpiece surface. Focus curve data may be determined from analysis of the image stack, which indicates 3-dimensional positions of surface points on the angled surface of the workpiece.

Provided is a technique capable of more accurately determining a solder protruding defect in an appearance inspection device that acquires an image of an inspection region of an inspection target and measures a height of a predetermined place in the inspection region with a height measurement device. The appearance inspection device includes: an imaging unit (3); a height measurement unit (20); a moving mechanism (5) that moves the imaging unit (3) and the height measurement unit (20). When a restricted region (M) in the inspection target is irradiated with the measurement light emitted from the height measurement unit (20), the determination unit restricts defect determination based on the information on the height of the predetermined place measured by the height measurement unit (20).

A method for measuring a height map of a test surface having a varying reflectivity using a multi-sensor apparatus including a pre-scan sensor and a height measuring sensor is disclosed. The multi-sensor apparatus further comprises one or more light sources configured to illuminate the test surface and a spatial light modulator. The spatial light modulator is placed in a light path between the one or more light sources and a measuring location of the multi-sensor apparatus and is configured to modulate light emitted from at least one of the light sources. The method comprises performing a measurement for determining an illumination intensity map of the test surface and a measurement for performing a height map of the test surface.

A high-power fast-pulse driver and illumination system for high speed metrology imaging is provided, which includes an illumination source and a driver circuit configured to overdrive the illumination source using high currents and/or high current densities. The high currents are currents higher than manufacturer-recommended currents used to drive the illumination source and the high current densities are current densities higher than manufacturer-recommended current densities used to drive the illumination source. The illumination source is operated using a lifetime preserving technique selected from a first technique of operating the illumination source at low duty cycles of 2% or less or a second technique of operating the illumination source in a burst mode at higher duty cycles for short intervals. The driver and illumination system may be incorporated in a variable focus lens (VFL) system, to define multiple exposure increments for acquiring one or more images focused at one or more focus planes.

An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.

An optical test system and corresponding method disclosed herein provides highly accurate test data for both sides of a lens simultaneously and efficiently to analyze the surface topography and/or geometric parameters of a lens or lens system. More particularly, the optical test system and corresponding method moves the lens in test plane to align a plurality of points of a test pattern on a lens surface with a vertical axis while probes aligned with the vertical axis and on opposing sides of the lens simultaneously collect wavelength-specific data for both lens surfaces. The optical test system uses the collected wavelength-specific data to produce a surface topography and/or the associated lens geometric parameters for each lens surface.