An analysis apparatus includes an acquisition part that acquires a plurality of interference images of the object to be measured from the interference measurement apparatus, a calculation part that calculates a sine wave component and a cosine wave component of an interference signal for each pixel in the plurality of interference images, respectively, an error detection part that detects an error between a first Lissajous figure constructed on the basis of the sine wave component and the cosine wave component for each pixel and an ideal second Lissajous figure, a correction part that corrects the sine wave component and the cosine wave component for each pixel on the basis of the error, and a geometry calculation part that calculates surface geometry of the object to be measured on the basis of the corrected sine wave component and cosine wave component.

A position measurement method is used by a device including an imaging unit and a position detector that detects a position of the imaging unit to measure, using a detection value at imaging of a measurement point, position coordinates of the measurement point. The method for correcting the detection value from the position detector includes obtaining, with the device, position coordinates of predetermined indices (22) arranged two-dimensionally on a calibration plate (20) as an actual measurement value, obtaining, as a correction value, a difference between the actual measurement value and a true value resulting from transformation of position coordinates of the indices (22) with respect to a reference point on the calibration plate (20), and correcting the detection value from the position detector (8, 9, 10). The imaging unit (3) images measurement points (P) on the measurement target (3) to measure position coordinates of the measurement points (P).

There is provided a probe unit correction method for correcting linear expansion of a probe unit to obtain an accurate measurement value. First, a probe offset value is calculated as a model. Then, a probe unit correction method includes a temperature data acquisition step of acquiring a temperature difference between a temperature at a time of calibration and a temperature of a current measurement environment, a reference tip coordinate correction step of calculating, as a reference tip correction coordinate value, a correction value of a reference tip coordinate value to which linear expansion is added, and a probe offset correction step of calculating, as a probe offset correction value, a correction value of a probe offset value to which the linear expansion is added.

A method efficiently measures an object having a feature. The feature has a plurality of cross-sections that each have a surface. The method provides a coordinate measuring machine having a discretely indexable wrist coupled with a measuring probe. The wrist has a given wrist orientation, relative to an arm of the coordinate measuring machine, that is adjustable between a plurality of different orientations. The probe is able to measure different surfaces as a function of the different wrist orientations. The method segments an object to be measured into a plurality of segments that are each measurable with a given wrist orientation.

A reference-standard device (20) for calibration of measurements of length, comprising a substrate (10) that includes a surface (10a) having at least one calibration pattern (11). According to the invention, this pattern comprises a plurality of nanometric structures (14), said nanometric structures (14) having one and the same section in the plane of said surface and having the same nanometric dimensions, in particular less than 50 nm, said nanometric structures (14) being arranged at a distance from one another by a constant pitch of nanometric length, in particular less than 50 nm, in at least one direction, said nanometric structures (14) being arranged within spatial regions (12) delimited in one or more directions in the plane of the substrate (10), said nanometric structures (14) being obtained via application to said substrate (10) of a process of nanostructuring (100) by means of a mask of block copolymers in order to make calibrations of measurements of length of the order of nanometres.

The invention relates to a measuring system for a construction machine having a carrier including several portions, a measuring system for a construction machine including a calculation unit determining a regression line as well as a controller having two control loops.

A computer program product for numerically correcting an endpoint position of a Coordinate Measuring Machine (CMM) implemented on a computing unit, receiving as input temporally resolved information from a set of sensors attached to or integrated into the CMM, and to a method for numerically correcting an endpoint position of a CMM, wherein errors between a targeted endpoint position and an actual endpoint position reached during a measurement process are numerically compensated through the use of the computer program product.

A method and system for estimating a pipe property for a plurality of nested pipes. The method may comprise disposing an electromagnetic logging tool in a wellbore. The electromagnetic logging tool may comprise a transmitter disposed on the electromagnetic logging tool and a receiver disposed on the electromagnetic logging tool. The method may further comprise transmitting an electromagnetic field from the transmitter into a pipe string to energize the pipe string with the electromagnetic field thereby producing an eddy current that emanates from the pipe string, measuring the eddy current in the pipe string with the receiver on at least one channel to obtain a plurality of measurements, forming a log from the plurality of measurements, zoning the log into a plurality of zones based at least in part on a well plan, and extracting a representative signal for each zone of the plurality of zones.

A shape measurement method includes: acquiring first data of a change of a distance between a first probe and a calibration measurement object and acquiring second data of a change of a distance between a second probe and the calibration measurement object while moving the calibration measurement object in a first direction, the calibration measurement object being rotationally symmetric around an axis parallel to the first direction, the first probe and the second probe being arranged in a second direction orthogonal to the first direction; estimating an error of the movement included in the first data based on the first and second data; acquiring third data of a change of a distance between the first probe and a measurement object while moving the measurement object relative to the first probe in the first direction; and correcting the third data by using the error.

A 3D measuring instrument includes a registration camera and a surface measuring system having a projector and autofocus camera. In a first pose, the registration camera captures a first registration image of first registration points. The autofocus camera captures a first surface image of first light projected onto the object by the projector and determines first 3D coordinates of points on the object. In a second pose, the registration camera captures a second registration image of second registration points. The autofocus camera adjusts the autofocus mechanism based at least in part on adjusting a focal length to reduce a difference between positions of the first and second registration points. A second surface image of second light is captured. A compensation parameter is determined based at least in part on the first registration image, the second registration image, the first 3D coordinates, the second surface image, and the projected second light.