The present disclosure provides a method for regulating an inert gas flow in a crystal pulling furnace, a method for preparing monocrystalline silicon, and monocrystalline silicon. The method for regulating an inert gas flow includes introducing the inert gas into a main furnace chamber of the crystal pulling furnace from an auxiliary furnace chamber of the crystal pulling furnace, and regulating a flow direction of the inert gas flow introduced into the auxiliary furnace chamber of the crystal pulling furnace.

The present disclosure provides a method for regulating an inert gas flow in a crystal pulling furnace, a method for preparing monocrystalline silicon, and monocrystalline silicon. The method for regulating an inert gas flow includes introducing the inert gas into a main furnace chamber of the crystal pulling furnace from an auxiliary furnace chamber of the crystal pulling furnace, and regulating a flow direction of the inert gas flow introduced into the auxiliary furnace chamber of the crystal pulling furnace.

The invention relates to a device and method for measuring the flow rate of a liquid flowing in a flow duct, from upstream to downstream, in which: a shutter member (4) is able to close/open said flow duct (3), a deformable membrane (5) obstructs an opening (6) made through the wall of said flow duct and situated upstream of said shutter member, and an electronic device (100) comprises a detection means (101) that detects deformations of said deformable membrane (5) and is able to deliver deformation signals, a means (112) that controls said shutter member (4), a means (112) that takes readings of the values of at least two deformation signals that are separated by a predetermined time period, established when the solenoid valve (4) is closed, and a calculation means that calculates a liquid volume depending on the read deformation signals and in order to calculate a flow rate depending on said calculated volume and the predetermined time period.

Disclosed is a method of inspecting a flow rate measuring system used in a substrate processing system. The flow rate measuring system provides a gas flow path used for calculating a flow rate in a build-up method. A gas output by a flow rate controller of a gas supply unit of the substrate processing system may be supplied to the gas flow path. In the method, apart from a previously obtained initial value of a volume of the gas flow path, a volume of the gas flow path is obtained at the time of inspection of the flow rate measuring system. Then, the obtained volume is compared to the initial value.

A gas meter includes a meter entrance that allows a fluid to flow in, a meter exit that allows the fluid to flow out, and a flow rate measurer that measures a flow rate of the fluid. In addition, the flow rate measurer includes a plurality of flow rate measuring units having the same shape and composed of a flow passage portion with a rectangular cross section shape on the outer side and a sensor portion disposed on one face of the flow passage portion. The plurality of flow rate measuring units are integrally configured by bonding faces having no sensor portion so as to serve as bonding faces of the flow rate measuring units.

A differential monitoring system of carbon dioxide levels within an associated building with a monitoring zone including a quantity of captured carbon dioxide and a reference zone that is spaced away from the monitoring zone. The differential monitoring system includes a first carbon dioxide monitoring inlet disposed within the monitoring zone. A second carbon dioxide monitoring inlet is disposed within the monitoring zone in spaced relation to the first carbon dioxide monitoring inlet and/or is disposed within the reference zone in spaced relation to the first carbon dioxide monitoring zone. A controller is operable to determine when a carbon dioxide level at the second carbon dioxide monitoring inlet exceeds a carbon dioxide level at the first carbon dioxide monitoring inlet by a predetermined differential threshold. The inlets can be part of an aspirated sampling system and/or part of a distributed sensor system. Methods of monitoring carbon dioxide levels are also included.

In a substrate processing system according to an exemplary embodiment, gas supply units are configured to supply gases to chambers through first gas flow channels thereof, respectively. Chamber pressure sensors are configured to measure pressures in the chambers. A second gas flow channel is connected to the first gas flow channel of each of the gas supply units. A reference pressure sensor is configured to measure a pressure in the second gas flow channel. In a method according to an exemplary embodiment, each of the chamber pressure sensors is calibrated by using a measurement value thereof and a measurement value of the reference pressure sensor which are obtained in a state where pressures in a corresponding chamber, the first gas flow channel of a corresponding gas supply unit, and the second gas flow channel are maintained.

Flow rate measurement device includes flow rate measurement unit that measures a flow rate of gas at a prescribed time interval, and arithmetic unit that calculates a characteristic flow rate from the flow rates measured within a predetermined period, and calculates a ratio of each flow rate measured at multiple times within the predetermined period with respect to the characteristic flow rate. In addition, flow rate measurement device includes appliance characteristic extraction unit that extracts an appliance characteristic quantity which indicates a characteristic of a flow rate change in currently using gas appliances within the predetermined period, the appliance characteristic quantity being the ratio or information obtained from the ratio, and appliance inherent characteristic information holding unit that holds an appliance inherent characteristic quantity indicating a characteristic flow rate state of a specific gas appliance. Furthermore, flow rate measurement device includes appliance discrimination unit that discriminates the currently using gas appliance by comparing the appliance characteristic quantity with the appliance inherent characteristic quantity.

Flow rate measurement device includes flow rate measurement unit that measures a flow rate of gas at a prescribed time interval, and arithmetic unit that calculates a characteristic flow rate from the flow rates measured within a predetermined period, and calculates a ratio of each flow rate measured at multiple times within the predetermined period with respect to the characteristic flow rate. In addition, flow rate measurement device includes appliance characteristic extraction unit that extracts an appliance characteristic quantity which indicates a characteristic of a flow rate change in currently using gas appliances within the predetermined period, the appliance characteristic quantity being the ratio or information obtained from the ratio, and appliance inherent characteristic information holding unit that holds an appliance inherent characteristic quantity indicating a characteristic flow rate state of a specific gas appliance. Furthermore, flow rate measurement device includes appliance discrimination unit that discriminates the currently using gas appliance by comparing the appliance characteristic quantity with the appliance inherent characteristic quantity.

A flow rate measurement device includes flow rate measurer to measure a flow rate of a fluid at regular time intervals, the fluid flowing in flow path, period setting unit to set a first period and a second period, arithmetic unit to calculate first average flow rates and amounts of change each between the average flow rates in sequence, and second average flow rates and amounts of change each between the average flow rates in sequence in a predetermined period, and fuel cell determinator to determine whether or not a fuel cell is in operation. Fuel cell determinator determines that a fuel cell is in operation when an increment of the second average flow rate within a first predetermined flow rate range repeats for first predetermined successive times, an increment of the first average flow rate within a second predetermined flow rate range repeats for second predetermined times or more in each of the second periods, and an increment of the first average flow rate not greater than or equal to a third predetermined flow rate in each of the second periods.