Patent classifications
G01J1/1626
Sensing system for the detection of electromagnetic radiation on an electronic device
A sensing system comprising a measurement sensor configured to detect electromagnetic radiation and a reference sensor configured to detect a source of measurement uncertainty. The sensing system further comprises a shield configured to reduce an interaction between the electromagnetic radiation and the reference sensor.
Quantum meta-device for ultrasensitive displacement metrology
Displacement measurement systems, measurement methods and EUV lithography machines for quantum meta-structure elements are disclosed, which include: an entangled state light source generator, a meta-device, a collimating lens, a polarizing beam splitter, and a computing section. Left-rotation photon and the right-rotation photon are projected to the polarizing beam splitter, and the correlation between output ports of two polarizing beam splitters is counted for reading to measure the displacement of the meta-device element. The displacement of the meta-structure element is measured in a manner that realizes the correlation between the left-rotation photons and the right-rotation photons.
Device and method for measuring semiconductor-based light sources
Methods and devices for the sequential measurement of a plurality of semiconductor-based light sources that operate faster, more accurately and more sensitively than known methods and devices. In accordance with one implementation, a current pulse is applied by a pulsed current source to the low-luminosity light sources consecutively or simultaneously. The emitted light pulse of LED is converted into electric charge carriers by a photodiode, the electric charge carries are added up by means an integrator circuit, the added-together charge carriers are converted by an A/D converter into a digital signal and the digital signal is forwarded to a measurement and control unit.
Inadvertent operations in touchless lavatory
A method for controlling a touchless lavatory is disclosed herein. The method includes forming one or more groups of sensors from a plurality of sensors, determining that a trigger event is detected from the first sensor, and identifying a first group of sensors of the one or more groups of sensors to which the first sensor belongs. The method further includes requesting an ambient light measurement from each of the plurality of sensor. The method further includes computing an average ambient light value based on the ambient light measurement, comparing the ambient light measurement of the first sensor to the average ambient light value of all the sensors, determining that the ambient light measurement of the first sensor is less than the average ambient light value of all the sensors, and determining that the first sensor trigger event is valid.
OPTICAL CONCENTRATION MEASURING DEVICE AND SIGNAL PROCESSOR
An optical concentration measuring device includes a light source, detectors (21, 22) that detect a signal, based on light emitted from the light source, and output a detection signal, a signal processor (50) that acquires the detection signal and converts the detection signal to a digital signal, and a substrate (30) on which the detector and the signal processor are provided. The signal processor has a terminal array in which a plurality of signal terminals is sandwiched between a plurality of voltage terminals, the signal terminals being input and output terminals of signal lines electrically connected to the detectors, 10 the voltage terminals supplying a voltage other than 0 V. In plan view of the substrate from the front, the signal processor and wiring connecting the plurality of voltage terminals surround the signal lines.
BEAM PROFILER CERTIFICATION AND CALIBRATION
A calibration tool for a beam profiler is disclosed. The calibration tool includes an integrating sphere configured to receive laser light emitted from a laser and generate diffuse laser light. A sensor system is configured to output an expected intensity value of the diffuse laser light. An interface is configured to align a beam profiler with the integrating sphere to direct the diffuse laser light to be incident on an array of pixels of a beam sensor of the beam profiler. The array of pixels of the beam sensor is configured to output a plurality of native intensity values of the diffuse laser light. A computing system is configured to calibrate the beam profiler based at least on differences between the plurality of native intensity values of the diffuse laser light and the expected intensity value of the diffuse laser light.