G01J1/18

Ambient light detector, detector array and method
11199442 · 2021-12-14 · ·

An ambient light detector, a detector array and a method are disclosed. An ambient light sensor includes a first plurality of sensor elements, where each sensor element is configured to provide a signal in response to a level of illumination and a second plurality of reference elements, each reference element configured to provide a reference signal and each including a blocking element configured to shield the respective reference element from being illuminated, where the first plurality is larger than the second plurality and the first plurality of sensor elements and the second plurality of reference elements are arranged in an array, and where a sensor element and a reference element are laterally arranged on or in a common layer substrate sharing at least one common first contact.

BALANCED LIGHT DETECTOR
20220205838 · 2022-06-30 ·

A system and method with AC coupling that reserves photodiode bandwidth in a biased configuration, allows optimal transimpedance amplifier performance, retains DC signal measurement capability, and does not introduce noise into the balanced detection signal.

BALANCED LIGHT DETECTOR
20220205838 · 2022-06-30 ·

A system and method with AC coupling that reserves photodiode bandwidth in a biased configuration, allows optimal transimpedance amplifier performance, retains DC signal measurement capability, and does not introduce noise into the balanced detection signal.

Degradation detection for a pulsed laser

A device may determine at least one metric related to a plurality of laser pulses associated with a Q-switched laser. The device may determine a statistical metric for the at least one metric related to the plurality of laser pulses. The device may determine that the statistical metric satisfies a threshold level of deviation of the at least one metric related to the plurality of laser pulses from a baseline value for the at least one metric. The device may indicate laser degradation of the Q-switched laser based on determining that the statistical metric satisfies the threshold.

Degradation detection for a pulsed laser

A device may determine at least one metric related to a plurality of laser pulses associated with a Q-switched laser. The device may determine a statistical metric for the at least one metric related to the plurality of laser pulses. The device may determine that the statistical metric satisfies a threshold level of deviation of the at least one metric related to the plurality of laser pulses from a baseline value for the at least one metric. The device may indicate laser degradation of the Q-switched laser based on determining that the statistical metric satisfies the threshold.

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH APPLICATIONS
20230268235 · 2023-08-24 ·

Disclosed herein is a method for determining the endpoint of an etch operation used for forming high aspect ratio features and/or over low open area (<1%) on a substrate in a processing chamber. The method begins by obtaining a reference emission curve. An etch operation is performed on a patterned substrate. A plasma optical emission intensity is measured for each of the etch cycles. A differential curve between the reference emission and the plasma optical emissions is calculated. And endpoint is determined for the etch operation on the first substrate based on an inflection point detection or other unique features through pattern recognition in the differential curve for stopping the etch of the first substrate.

ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH APPLICATIONS
20230268235 · 2023-08-24 ·

Disclosed herein is a method for determining the endpoint of an etch operation used for forming high aspect ratio features and/or over low open area (<1%) on a substrate in a processing chamber. The method begins by obtaining a reference emission curve. An etch operation is performed on a patterned substrate. A plasma optical emission intensity is measured for each of the etch cycles. A differential curve between the reference emission and the plasma optical emissions is calculated. And endpoint is determined for the etch operation on the first substrate based on an inflection point detection or other unique features through pattern recognition in the differential curve for stopping the etch of the first substrate.

SYSTEMS AND METHODS FOR FILTERING SENSOR SIGNAL INTERFERENCE DERIVING FROM POWERED COMPONENTS OF A HEADER
20220128404 · 2022-04-28 ·

In one aspect, a system for filtering signal interference from sensors signals includes a header comprising a frame and a powered component supported relative to the frame, and a sensor configured to detect electromagnetic waves indicative of a parameter associated with the header. In addition, the system includes an electronic control unit operably connected to the sensor such that the electronic control unit is configured to receive signals from the sensor associated with the detection of the electromagnetic waves. The electronic control unit is further configured to filter interference from the signals deriving from motion of the powered component relative to the sensor.

Capacity estimator for an energy generation and/or storage system

A method and apparatus for estimating capacity of a system including an energy generation system, an energy storage system or both. The method and apparatus initially estimate the system capacity based on a facility location and size. The initial estimate may be adjusted through adjustment of at least one parameter. An updated capacity estimate is generated and displayed.

Capacity estimator for an energy generation and/or storage system

A method and apparatus for estimating capacity of a system including an energy generation system, an energy storage system or both. The method and apparatus initially estimate the system capacity based on a facility location and size. The initial estimate may be adjusted through adjustment of at least one parameter. An updated capacity estimate is generated and displayed.