Provided herein are a system and a method thereof which allows for calibrating a laser or getting characteristics of the laser by measuring the temporally and spatially resolved beam profile and power density cross-section using non-contact radiometry. An example method includes receiving a radiation beam from a light source by protrusions that protrude from a plate. The example method further includes imaging the protrusions, measuring a respective temperature of each of the protrusions based on the imaging, and profiling the radiation beam based on the measuring.

The laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam, and a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam.

An apparatus for the determination of geometric parameters of a laser beam, such as, for example, the beam diameter or the focus diameter. The apparatus includes a device for the emission of a laser beam into an active region, a detector arrangement, which can be positioned in the active region, a device for the provision of a relative movement between the laser beam and the detector arrangement, and a device for the registration and evaluation of a temporally varying signal of the detector arrangement. The detector arrangement includes at least one light guide, at least two flight-diffusing structures, and at least one light-sensitive sensor. The light guide has a light-emitting surface and a light-conducting region, with an elongated shape. The at least two light-diffusing structures are essentially extended along two different directions.

A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF.sub.2.

An M.sup.2 value beam profiling apparatus and method is described. The M.sup.2 value beam profiler comprises an optical axis defined by a focussing lens assembly and a detector, wherein the focussing lens acts to create an artificial waist within an optical field propagating along the optical axis. The beam profiler also comprises a multiple blade assembly having a first set of blades located at an artificial waist position and a second set of blades longitudinally separated along the optical axis from the artificial waist position. The multiple blade assembly therefore provides a means for selectively passing the blades through the location of the optical axis. Employing these measured widths allows for the M.sup.2 value of the optical field to be determined.

A method and a gonioradiometer for the direction-dependent measurement of at least one photometric or radiometric characteristic of an optical radiation source. The emission direction of the photometric or radiometric characteristic is described using a system of planes (A, B, C), the planes of which intersect at an intersection line which passes through the radiation centroid of the radiation source, and using an emission angle (, , ) which specifies the emission direction (, , ) within a considered plane. A sensor or the radiation source is fastened to a multi-axis articulated robot. The robot is configured to only swivel about precisely one of its axes during a measuring process, in which measurement values relating to different emission angles (, , ) within a considered plane of the system of planes (A, B, C) or to different planes at a considered emission angle (, , ) are detected.

The laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam, and a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam.

A system for characterizing a light beam includes a detector that includes at least one detector unit, and a micro-opto-electromechanical system that includes an array of mirrors. Each mirror is switchable between a first sand a second witching states. In the first switching state, the mirror reflects light emitted by a light source onto the detector. In the second switching state, the mirror reflects the light away from the detector. The system further includes a controller configured to cause a beam profile measurement to be performed on the light detected by the detector unit while selectively switching the mirrors between the first and the second switching states, and an optical unit configured to direct the light in a form of two different input light beams onto the micro-opto-electromechanical system. The controller is configured to cause the beam profile measurement to be performed on each of the two input light beams.

A device for determining a focal position of a laser beam, in particular a processing laser beam in a laser processing head, has an optical decoupling element for decoupling a partial beam from a beam path of the laser beam, a detector for detecting at least one beam parameter of the partial beam, and at least one optical element with an adjustable focal length, which is arranged in a region of the beam path of the partial beam between the optical decoupling element and the detector. Also disclosed is a laser processing head which includes a device of this type, as well as a method for determining a focal position of a laser beam.

To achieve the object, provided is a dimming device including a beam splitter that has an optical thin film of 10 or more layers formed close to a surface on which the laser beam is incident, and that, when any orthogonal coordinate axes whose origin in a plane perpendicular to an optical axis of the laser beam irradiation optical unit is on the optical axis are defined as an X axis and a Y axis, is disposed so as to be inclined at an angle of 30 or more and 60 or less with respect to the optical axis with the X axis as a rotation axis.