In the method for optical monitoring and/or determination of properties on samples, monochromatic electromagnetic radiation with a predetermined wavelength is sequentially directed from several radiation sources onto a sample influenced by an electronic evaluation unit. The respective intensity specific to the wavelength of the electromagnetic radiation scattered and/or reflected by the sample is detected by at least one detector and fed to the electronic evaluation unit for spectrally resolved evaluation in order to use it to monitor and/or determine properties of the respective sample.

An optical device and a spectral detection apparatus are provided. The optical device includes an optical waveguide, including: a polychromatic light channel configured to transport a polychromatic light beam, and provided with a light incident surface for receiving the incident polychromatic light beam at an input end of the polychromatic light channel; a chromatic dispersion device arranged downstream from the polychromatic light channel in an optical path and configured to separate the polychromatic light beam from the polychromatic light channel into a plurality of monochromatic light beams; and a plurality of monochromatic light channels arranged downstream from the chromatic dispersion device in the optical path and configured to respectively conduct the plurality of monochromatic light beams with different colors from the chromatic dispersion device. Monochromatic light output surfaces are respectively provided at output ends of the plurality of monochromatic light channels and configured to output the monochromatic light beams.

Disclosed are embodiments of an improved apparatus and system, and associated methods for optically diagnosing a semiconductor manufacturing process. A hyperspectral imaging system is used to acquire spectrally-resolved images of emissions from the plasma, in a plasma processing system. Acquired hyperspectral images may be used to determine the chemical composition of the plasma and the plasma process endpoint. Alternatively, a hyperspectral imaging system is used to acquire spectrally-resolved images of a substrate before, during, or after processing, to determine properties of the substrate or layers and features formed on the substrate, including whether a process endpoint has been reached; or before or after processing, for inspecting the substrate condition.

A photonic integrated circuit (PIC) for determining a wavelength of an input signal is disclosed. The PIC comprises: a substrate; a first Mach-Zehnder Interferometer (MZI) disposed over the substrate, comprising first optical waveguides having a first optical path length difference, and configured to receive a first output optical signal from a light source. The PIC also comprises a second Mach-Zehnder Interferometer (MZI) disposed over the substrate, comprising second optical waveguides having a second optical path length difference, which is greater than the first optical path length difference, and configured to receive a second output optical signal from the light source.

An optical sensor system may include a light source. The optical sensor system may include a concentrator component proximate to the light source and configured to concentrate light from the light source with respect to a measurement target. The optical sensor system may include a collection component that includes an array of at least two components configured to receive light reflected or transmitted from the measurement target. The optical sensor system may include may a sensor. The optical sensor system may include a filter provided between the collection component and the sensor.

A spectroscopic measurement device includes: a light source unit configured to output pump light and probe light; a terahertz wave generation unit configured to generate a terahertz wave by the input of the pump light; a terahertz wave detection unit to which the terahertz wave and the probe light are input and configured to modulate the probe light based on a refractive index that changes due to an electro-optical effect according to the input of the terahertz wave; and a light detection unit configured to detect the probe light modulated by the terahertz wave detection unit. A main body unit is configured to include the light source unit and the light detection unit. A measurement unit is configured to include the terahertz wave generation unit and the terahertz wave detection unit. The main body unit and the measurement unit are optically connected to each other by a polarization maintaining fiber.

Disclosed are a system and techniques to determine a color of an optical fiber in a fiber optic cable. A spectrophotometer camera may obtain a color value of the optical fiber. A fiber adaptor is operable to hold a single optical fiber of a fiber optic cable in a field of view of the spectrophotometer camera. A memory storing instructions that, when executed by a processor, enable identifying a color of the optical fiber. The color value may be compared to a color value of a number of reference colors. A color match score value may be generated for the color value with respect to each reference color. A confidence value may be obtained for a pair of color match scores that are closest in score value. Based on the confidence value, one of the reference colors is identified as a color of the optical fiber.

A measurement method includes: (a) measuring an emission intensity for each wavelength of light detected from a plasma generated in a plasma processing apparatus at each different exposure time by a light receiving element; (b) specifying, with respect to each of a plurality of different individual wavelength ranges that constitutes a predetermined wavelength range, a distribution of the emission intensity in the individual wavelength range measured at an exposure time at which an emission intensity of a predetermined wavelength included in the individual wavelength range becomes an emission intensity within a predetermined range; (c) selecting a distribution of the emission intensity in the individual wavelength range from the distribution of the emission intensity specified in (b); and (d) outputting the distribution of the emission intensity selected for each individual wavelength range.

The present disclosure relates to a spectrometer comprising a spectral decomposition device and a radiation detector. These components are configured such that the spectral decomposition device can break up an incident electromagnetic measuring radiation into components in a wavelength-dependent manner. The radiation detector can measure the intensity of at least one of these components. The spectrometer is configured such that the spectrometer transmits analysis information from the analysis of a food or of a food component to a food preparation device and/or outputs it to the user via an output device. The present disclosure further relates to a system including a control device as well as to a method. In this way, a reproducible cooking result as well as an output of the nutritional values and the actual energy content of the prepared food can be made possible.

Structures for a photonics chip, testing methods for a photonics chip, and methods of forming a structure for a photonics chip. A photonics chip includes a first waveguide, a second waveguide, an optical tap coupling the first waveguide to the second waveguide, and a photodetector coupled to the second waveguide. A laser is attached to the photonics chip. The laser is configured to generate laser light directed by the first waveguide to the optical tap.