An infrared sensor module and a forehead thermometer are provided. The infrared sensor module includes a light guide structure and an infrared sensor element. An annular hollow space is formed inside the light guide structure and passes therethrough. A first and second opening is formed on two opposite sides of the light guide structure, respectively. A diameter of the first opening is greater than a diameter of the second opening. The annular hollow space includes a matte and reflective area, the matte area has serration portions, and each of the serration portions extends from the first opening to the second opening and is arranged parallel to each other. The reflective area is formed between the second opening and the matte area. The infrared sensor element is disposed at the second opening. The forehead thermometer includes a casing, a circuit board, the infrared sensor module, and an operating switch.

An infrared sensor module and a forehead thermometer are provided. The infrared sensor module includes a light guide structure and an infrared sensor element. An annular hollow space is formed inside the light guide structure and passes therethrough. A first and second opening is formed on two opposite sides of the light guide structure, respectively. A diameter of the first opening is greater than a diameter of the second opening. The annular hollow space includes a matte and reflective area, the matte area has serration portions, and each of the serration portions extends from the first opening to the second opening and is arranged parallel to each other. The reflective area is formed between the second opening and the matte area. The infrared sensor element is disposed at the second opening. The forehead thermometer includes a casing, a circuit board, the infrared sensor module, and an operating switch.

Embodiments of the present disclosure generally relate to apparatus for processing a substrate, and more specifically to reflector plates for rapid thermal processing. In an embodiment, a reflector plate assembly for processing a substrate is provided. The reflector plate assembly includes a reflector plate body, a plurality of sub-reflector plates disposed within the reflector plate body, and a plurality of pyrometers. A pyrometer of the plurality of pyrometers is coupled to an opening formed in a sub-reflector plate. Chambers including a reflector plate assembly are also described herein.

Embodiments of the present disclosure generally relate to apparatus for processing a substrate, and more specifically to reflector plates for rapid thermal processing. In an embodiment, a reflector plate assembly for processing a substrate is provided. The reflector plate assembly includes a reflector plate body, a plurality of sub-reflector plates disposed within the reflector plate body, and a plurality of pyrometers. A pyrometer of the plurality of pyrometers is coupled to an opening formed in a sub-reflector plate. Chambers including a reflector plate assembly are also described herein.

Various embodiments disclosed herein describe an infrared (IR) imaging system for detecting a gas. The imaging system can include an optical filter that selectively passes light having a wavelength in a range of 1585 nm to 1595 nm while attenuating light at wavelengths above 1600 nm and below 1580 nm. The system can include an optical detector array sensitive to light having a wavelength of 1590 that is positioned rear of the optical filter.

Various embodiments disclosed herein describe an infrared (IR) imaging system for detecting a gas. The imaging system can include an optical filter that selectively passes light having a wavelength in a range of 1585 nm to 1595 nm while attenuating light at wavelengths above 1600 nm and below 1580 nm. The system can include an optical detector array sensitive to light having a wavelength of 1590 that is positioned rear of the optical filter.

Various embodiments disclosed herein describe an infrared (IR) imaging system for detecting a gas. The imaging system can include an optical filter that selectively passes light having a wavelength in a range of 1585 nm to 1595 nm while attenuating light at wavelengths above 1600 nm and below 1580 nm. The system can include an optical detector array sensitive to light having a wavelength of 1590 that is positioned rear of the optical filter.

An electromagnetic wave detection apparatus (10) includes a switch (16), a first detector (19), and a second detector (20). The switch (16) includes an action surface (as) with a plurality of pixels (px) disposed thereon. The switch (16) is configured to switch each pixel (px) between the first state and the second state. In the first state, the pixels (px) cause electromagnetic waves incident on the action surface (as) to travel in a first direction (d1). In the second state, the pixels (px) cause the electromagnetic waves incident on the action surface (as) to travel in a second direction (d2). The first detector (19) detects the electromagnetic waves that travel in the first direction (d1). The second detector (20) detects the electromagnetic waves that travel in the second direction (d2).

An electromagnetic wave detection apparatus (10) includes a switch (16), a first detector (19), and a second detector (20). The switch (16) includes an action surface (as) with a plurality of pixels (px) disposed thereon. The switch (16) is configured to switch each pixel (px) between the first state and the second state. In the first state, the pixels (px) cause electromagnetic waves incident on the action surface (as) to travel in a first direction (d1). In the second state, the pixels (px) cause the electromagnetic waves incident on the action surface (as) to travel in a second direction (d2). The first detector (19) detects the electromagnetic waves that travel in the first direction (d1). The second detector (20) detects the electromagnetic waves that travel in the second direction (d2).

An optical device for arrangement on a detector provided with an infrared sensor in order to modify the visual field of the detector. The device includes primary and secondary conical mirrors. The primary mirror collects the infrared radiation coming from a sub-ceiling layer around the device for returning it onto the secondary mirror which, itself, reflects it to the infrared sensor.