A method and an apparatus for measuring a coherence of a light source of a holographic display through steps of: photographing an interference pattern generated by light output from the light source; obtaining an interference pattern feature information with respect to the interference pattern from an interference pattern image of the interference pattern; and measuring the coherence of the light source based on the interference pattern feature information, are provided.

A wavefront measuring device and method obtain wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

A method of interferometric optical sensing via spatial demodulation includes emitting a laser beam; splitting the laser beam into a reference beam and an interrogation beam; converting a desired signal into a change in the optical path of the interrogation beam via an optical sensor; and capturing the reference beam and the interrogation beam via a camera, wherein the interrogation beam is incident to the camera at a first angle and the reference beam is incident to the camera at a second angle different from the first angle, thereby causing an interference pattern at the camera.

A patterned line of optical radiation can be steered in the other two directions (e.g., line patterned in y, steered in x and z) with a 1-D phase shifter array in a Fourier optics configuration. Preferably the patterned line is provided by forming a line focus and modulating it with an array of grating light valve devices in an amplitude modulation configuration. Phase modulation is preferably provided with an array of grating light valve devices in a phase modulation configuration.

Method and systems are presented for analysing a wavefront using a spectral wavefront analyser to extract optical phase and spectral information at a two dimensional array of sampling points across the wavefront, wherein the relative phase information between the sampling points is maintained. Methods and systems are also presented for measuring an eye by reflecting a wavefront of an eye and measuring the wavefront at a plurality of angles to provide a map of the off-axis relative wavefront curvature and aberration of the eye. The phase accuracy between wavelengths and sample points over a beam aperture offered by these methods and systems have a number of ocular applications including corneal and anterior eye tomography, high resolution retinal imaging, and wavefront analysis as a function of probe beam incident angle for determining myopia progression and for designing and testing lenses for correcting myopia.

A wavefront measuring device and method obtain wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

There is provided a wavefront measuring method for obtaining wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

A totagram is produced by an iterative spectral phase recovery process resulting in complete information recovery using special masks, without a reference beam. Using these special masking systems reduce computation time, number of masks, and number of iterations. The special masking system is (1) a unity mask together with one or more bipolar binary masks with elements equal to 1 and ?1, or (2) a unity mask together with one or more phase masks, or (3) a unity mask together with one pair of masks or more than one pair of masks having binary amplitudes of 0's and 1's, in which the masks in the pair are complementary to each other with respect to amplitude, or (4) one or more pairs of complementary masks with binary amplitudes of 0's and 1's without a unity mask.

The present invention provides a detection device and a detection method. The detection device comprises a light source module, a receiving module, an image generation module and a judgment module. The light source module is configured to emit light towards a film at a predetermined angle, the receiving module is configured to receive interference light formed by first reflected light reflected by an upper surface of the film and second reflected light reflected by a lower surface of the film, the image generation module is configured to generate an equal thickness interference fringe image according to the interference light, and the judgment module is configured to judge whether thickness of the film is uniform according to the equal thickness interference fringe image. The detection device can perform high accuracy detection on uniformity of the thickness of a film, thereby facilitating improving display quality of a display panel.

Method and systems are presented for analysing a wavefront using a spectral wavefront analyser to extract optical phase and spectral information at a two dimensional array of sampling points across the wavefront, wherein the relative phase information between the sampling points is maintained. Methods and systems are also presented for measuring an eye by reflecting a wavefront of an eye and measuring the wavefront at a plurality of angles to provide a map of the off-axis relative wavefront curvature and aberration of the eye. The phase accuracy between wavelengths and sample points over a beam aperture offered by these methods and systems have a number of ocular applications including corneal and anterior eye tomography, high resolution retinal imaging, and wavefront analysis as a function of probe beam incident angle for determining myopia progression and for designing and testing lenses for correcting myopia.