Patent classifications
G01N3/46
Nanometer Cutting Depth High-speed Single-point Scratch Test Device and Test Method Thereof
A nanometer cutting depth high-speed single-point scratch test device includes a workbench, an air-bearing turntable, a test piece fixture, a test piece, a Z-direction feeding device, a nano positioning stage, a force sensor and a scratch tool. A micro convex structure with controllable length and height is machined in a position of the test piece to be scratched.
System for manufacturing electrode for secondary battery having scratch tester
Disclosed is a system for manufacturing an electrode for a secondary battery, which includes an active material drying unit configured to dry an active material coated on an electrode current collector, and a tester unit configured to measure a dried state of the active material by performing a scratch test to the dried active material.
System for manufacturing electrode for secondary battery having scratch tester
Disclosed is a system for manufacturing an electrode for a secondary battery, which includes an active material drying unit configured to dry an active material coated on an electrode current collector, and a tester unit configured to measure a dried state of the active material by performing a scratch test to the dried active material.
Indenter receptacle for a measuring device, and a measuring device for detecting signals
The invention relates to an indenter receptacle for a measuring device, having a receptacle for detachably fastening an indenter, having an interface for mounting a measuring device, wherein a solid body joint arrangement is provided, which at least three solid body joints are provided between the interface and the receptacle and which are aligned offset at 90 to one another with respect to their flexibility in only one spatial direction.
TESTING DEVICE AND METHOD FOR TESTING A SURFACE OF A TEST OBJECT
A testing device for testing a surface of a test object using an abrasion ribbon and a load body. The abrasion ribbon is guided from a provision device through a testing area, in which the abrasion ribbon can come into contact with the surface of the test object under the influence of the load body onto the abrasion ribbon, to a take-up device. The take-up device has a drive for moving the abrasion ribbon using the take-up device.
TESTING DEVICE AND METHOD FOR TESTING A SURFACE OF A TEST OBJECT
A testing device for testing a surface of a test object using an abrasion ribbon and a load body. The abrasion ribbon is guided from a provision device through a testing area, in which the abrasion ribbon can come into contact with the surface of the test object under the influence of the load body onto the abrasion ribbon, to a take-up device. The take-up device has a drive for moving the abrasion ribbon using the take-up device.
METHOD AND APPARATUS FOR TESTING RELATIVE HARDNESS OF HORIZONTALLY DISPLACED SURFACES
An apparatus and method for testing relative hardness of horizontal concrete surfaces includes a weighted platform with scratching pins on a bottom surface of the platform. The pins are arranged in a trapezoidal arrangement. The apparatus is translated over the surface to determine if the surface has reached the desired level of hardness. If translation of the apparatus results in scratching of the surface, the desired level of hardness has not been reached.
METHOD AND APPARATUS FOR TESTING RELATIVE HARDNESS OF HORIZONTALLY DISPLACED SURFACES
An apparatus and method for testing relative hardness of horizontal concrete surfaces includes a weighted platform with scratching pins on a bottom surface of the platform. The pins are arranged in a trapezoidal arrangement. The apparatus is translated over the surface to determine if the surface has reached the desired level of hardness. If translation of the apparatus results in scratching of the surface, the desired level of hardness has not been reached.
Method for testing interfacial tribochemical reaction between abrasive and diamond wafer
A method for testing an interfacial tribochemical reaction between a diamond wafer and active metal abrasive or metal oxide abrasive is provided. A surface of a diamond indenter used in a nano scratch tester is coated with a layer of the active metal abrasive or the metal oxide abrasive with uniform and controllable thickness by magnetron sputtering, and an interface interaction between the layer of the active metal abrasive or the metal oxide abrasive and the diamond wafer is controlled by a scratch test of the diamond wafer. Chemical components of an interaction section on a surface of the diamond wafer are analyzed by the scanning probe micro Raman spectrometer.
Apparatus and Method for Two Dimensional Nanoindentation
A two-dimensional nanoindentation measurement apparatus includes a first actuator that imparts a first force in a first direction, and a second actuator that imparts a second force in a second direction orthogonal to the first direction. A first elongate member has a first end attached to the first actuator and a second end attached to an indenter tip that engages the surface of the sample. A second elongate member includes a first end attached to the second actuator and a second end connected to the second end of the first elongate member. The first elongate member is rigid in the first direction and compliant in the second direction, and the second elongate member is rigid in the second direction and compliant in the first direction. The first force is imparted to the indenter tip in the first direction through the first elongate member, and the second force is imparted to the indenter tip in the second direction through the second elongate member.