Patent classifications
G01N2021/1782
NON-INVASIVE MEASUREMENT OF PHYSIOLOGICAL PARAMETERS OR SUBSTANCE CONCENTRATIONS IN HUMAN TISSUE
A device for optical detection of analytes in a sample includes at least two optoelectronic components. The optoelectronic components include at least one optical detector configured to receive a photon and at least one optical emitter configured to emit a photon. The at least one optical emitter includes at least three optical emitters disposed in a flat, non-linear arrangement, and the at least one optical detector includes at least three optical detectors disposed in a flat, non-linear arrangement. The at least three optical emitters and the at least three optical detectors include at least three different wavelength characteristics.
Apparatus and method for determining spectral information
Embodiments of the present invention provide an apparatus for determining spectral information of a three-dimensional object, comprising a cavity (110) for location in relation to the object, an imaging light source (120) located in relation to the cavity, wherein the imaging source is controllable to selectively emit light in a plurality of wavelength ranges, structured light source (130) for emitting structured illumination toward the object, wherein the structured light source comprises a plurality of illumination devices arranged around the cavity, one or more imaging devices (140) for generating image data relating to at least a portion of the object, a control unit, wherein the control unit (1100) is arranged to control the structured light source to emit the structured illumination and to control the imaging light source to emit light in a selected one or more of the plurality of wavelength ranges, a data storage unit (1120) arranged to store image data corresponding to the structured illumination and each of the selected one or more of the plurality of wavelength ranges, and processing means (1110) arranged to determine depth information relating to at least a portion of the object in dependence on the image data corresponding to the structured illumination stored in the data storage means.
THREE-DIMENSIONAL IMAGING WITH ENHANCED RESOLUTION
An imaging system may include an imaging metrology tool with an illumination source, one or more illumination optics to direct illumination from the illumination source to a sample, a detector, one or more collection optics to image the sample onto the detector; and one or more aberration-controlling components. The one or more aberration-controlling components may provide aberration correction for imaging the sample onto the detector according to one or more degrees of freedom, where the one or more degrees of freedom include at least a defocus of the imaging system, and where the one or more aberration-controlling components are integrated with at least one of the one or more illumination optics, the one or more collection optics, or the detector.
MONITORING DEVICE, MONITORING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Provided are a monitoring device and method. A monitoring device includes a laser processor configured to emit a processing laser beam to perform a melting annealing process on a wafer; a laser monitor configured to emit a monitoring laser beam onto the wafer while the laser processor performs the melting annealing process, the laser monitor configured to measure reflectivity of the wafer; and a data processor configured to process data on the reflectivity measured by the laser monitor, and monitor one or more characteristics of the wafer based on the data on the reflectivity.
Monitoring device, monitoring method and method of manufacturing semiconductor device using reflectivity of wafer
Provided are a monitoring device and method. A monitoring device includes a laser processor configured to emit a processing laser beam to perform a melting annealing process on a wafer; a laser monitor configured to emit a monitoring laser beam onto the wafer while the laser processor performs the melting annealing process, the laser monitor configured to measure reflectivity of the wafer; and a data processor configured to process data on the reflectivity measured by the laser monitor, and monitor one or more characteristics of the wafer based on the data on the reflectivity.
Complex Spatially-Resolved Reflectometry/Refractometry
Apparatus and methods for complex imaging reflectometry and refractometry using at least partially coherent light. Quantitative images yield spatially-dependent, local material information about a sample of interest. These images may provide material properties such as chemical composition, the thickness of chemical layers, dopant concentrations, mixing between layers of a sample, reactions at interfaces, etc. An incident beam of VUV wavelength or shorter is scattered off of a sample and imaged at various angles, wavelengths, and/or polarizations. The power of beam is also measured. This data is used to obtain images of a sample's absolute, spatially varying, complex reflectance or transmittance, which is then used to determine spatially-resolved, depth-dependent sample material properties.
Optical Inspection System and Method Including Accounting for Variations of Optical Path Length Within a Sample
An illuminator/collector assembly can deliver incident light to a sample and collect return light returning from the sample. A sensor can measure ray intensities as a function of ray position and ray angle for the collected return light. A ray selector can select a first subset of rays from the collected return light at the sensor that meet a first selection criterion. In some examples, the ray selector can aggregate ray intensities into bins, each bin corresponding to rays in the collected return light that traverse within the sample an estimated optical path length within a respective range of optical path lengths. A characterizer can determine a physical property of the sample, such as absorptivity, based on the ray intensities, ray positions, and ray angles for the first subset of rays. Accounting for variations in optical path length traversed within the sample can improve accuracy.
Device and method for determining a concentration in a sample
A device for optical detection of analytes in a sample includes at least two optoelectronic components. The optoelectronic components include at least one optical detector configured to receive a photon and at least one optical emitter configured to emit a photon. The at least one optical emitter includes at least three optical emitters disposed in a flat, non-linear arrangement, and the at least one optical detector includes at least three optical detectors disposed in a flat, non-linear arrangement. The at least three optical emitters and the at least three optical detectors include at least three different wavelength characteristics.
Optical inspection system and method including accounting for variations of optical path length within a sample
An illuminator/collector assembly can deliver incident light to a sample and collect return light returning from the sample. A sensor can measure ray intensities as a function of ray position and ray angle for the collected return light. A ray selector can select a first subset of rays from the collected return light at the sensor that meet a first selection criterion. In some examples, the ray selector can aggregate ray intensities into bins, each bin corresponding to rays in the collected return light that traverse within the sample an estimated optical path length within a respective range of optical path lengths. A characterizer can determine a physical property of the sample, such as absorptivity, based on the ray intensities, ray positions, and ray angles for the first subset of rays. Accounting for variations in optical path length traversed within the sample can improve accuracy.
APPARATUS AND METHOD FOR DETERMINING SPECTRAL INFORMATION
Embodiments of the present invention provide an apparatus for determining spectral information of a three-dimensional object, comprising a cavity (110) for location in relation to the object, an imaging light source (120) located in relation to the cavity, wherein the imaging source is controllable to selectively emit light in a plurality of wavelength ranges, structured light source (130) for emitting structured illumination toward the object, wherein the structured light source comprises a plurality of illumination devices arranged around the cavity, one or more imaging devices (140) for generating image data relating to at least a portion of the object, a control unit, wherein the control unit (1100) is arranged to control the structured light source to emit the structured illumination and to control the imaging light source to emit light in a selected one or more of the plurality of wavelength ranges, a data storage unit (1120) arranged to store image data corresponding to the structured illumination and each of the selected one or more of the plurality of wavelength ranges, and processing means (1110) arranged to determine depth information relating to at least a portion of the object in dependence on the image data corresponding to the structured illumination stored in the data storage means.