An ellipsometer, polarimeter and the like system operating in the infrared spectral range (0.75 um to 1000 .Math.m), utilizing a tunable quantum cascade laser (QCL) source with the capability if reducing speckle and standing wave effects, dual-rotatable optical elements, a single-point detector, as well as optional means of reducing the size of the probe beam at the measurement surface and optional chopper for lock-in detection.

Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures over a broad range of angles of incidence (AOI), azimuth angles, or both, are presented herein. Spectra including two or more sub-ranges of angles of incidence, azimuth angles, or both, are simultaneously measured over different sensor areas at high throughput. Collected light is linearly dispersed across different photosensitive areas of one or more detectors according to wavelength for each subrange of AOIs, azimuth angles, or both. Each different photosensitive area is arranged on the one or more detectors to perform a separate spectroscopic measurement for each different range of AOIs, azimuth angles, or both. In this manner, a broad range of AOIs, azimuth angles, or both, are detected with high signal to noise ratio, simultaneously. This approach enables high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.

A device for identifying water on a surface, including an optical sensor and a processor. The optical sensor is configured to produce a first image of the surface which has a first optical bandwidth within which the water has a first absorption rate, and a second image of the surface which has a second optical bandwidth within which the water has a second absorption rate that is higher than the first absorption rate. The processor is configured to combine the first image and the second image to produce a combined image in which the surface is reduced or eliminated as compared to the water. In addition, the processor is configured to detect water in the combined image.

An ellipsometer, polarimeter and the like system operating in the infrared spectral range (0.75 μm to 1000 μm), utilizing a tunable quantum cascade laser (QCL) source in combination with dithering capability to reduce speckle and standing wave effects, dual-rotating optical elements, a single-point detector, as well as optional means of reducing the size of the probe beam at the measurement surface and optional chopper for lock-in detection.

In certain aspects, a method for training a model is disclosed. A model for measuring a geometric attribute of a hole structure in a semiconductor chip is provided by at least one processor. A plurality of training samples each including a pair of an optical spectrum signal and a reference signal corresponding to a same hole structure are obtained by the at least one processor. The reference signal is labeled with a labeled geometric attribute of the hole structure. An estimated geometric attribute of the hole structure is estimated using the model. A parameter of the model is adjusted based, at least in part, on a difference between the labeled geometric attribute and the estimated geometric attribute in each of the training samples by the at least one processor.

Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of between 400 nm to between 4400 nm and 18000 nm, and another source of wavelengths to provide between 400 nm and as high as at least 50000 nm; a stage for supporting a sample and a detector of electromagnetic radiation, wherein the source provides a beam of electromagnetic radiation which interacts with a sample and enters a detector system optionally incorporating a wavelength modifier, where the detector system can be functionally incorporated with combinations of gratings and/or combination dichroic beam splitter-prisms, which can be optimized as regards wavelength dispersion characteristics to direct wavelengths in various ranges to various detectors that are well suited to detect them.

A sensor suitable for detecting specific analytes, a method for manufacturing the sensor, and a method for using the sensor in a diagnostic procedure provided. In an embodiment, the sensor device includes a substrate, a dielectric layer disposed on the substrate, and a probe layer disposed on the dielectric layer. The probe layer is configured to react with an analyte. The reaction may include: binding with the analyte, undergoing a change in a chemical property of the probe layer, or undergoing a change in a structural property of the probe layer. In examples, an attribute of the dielectric layer is configured to identify the device during a process that determines whether the probe layer has reacted with the analyte.

An embodiment of the present disclosure provides a multi-reflection silicon-based liquid immersion micro-channel measurement device and measurement method capable of improving measurement sensitivity by completely separating, through multi-reflection, first reflective light reflected by a sample detection layer and a second reflective light by a prism-buffer solution interface and by allowing the light to enter multiple times through the multi-reflection. The multi-reflection silicon-based liquid immersion micro-channel measurement device according to the embodiment of the present disclosure includes a micro-channel structure including a support, and one or more micro-channels formed on the support and each having a sample detection layer with a fixed bioadhesive material for detecting a sample, a sample injection unit configured to inject a buffer solution containing the sample into the micro-channel, a prism unit including a prism, and a reflection structure formed by coating a bottom surface of the prism with a mirror reflection material, the polarized light generating unit configured to generate polarized light, and the polarized light detecting unit configured to detect a polarization change of reflected light.

A system includes a memory, and at least one processing device, operatively coupled to the memory, to facilitate an etch recipe development process by performing operations including obtaining, from an optical detector, first material thickness data for a first material and second material thickness data for a second material resulting from an iteration of an etch process using an etch recipe. The first material is located at a first reflectometry measurement point and the second material is located at a second reflectometry measurement point different from the first reflectometry measurement point. The operations further include determining one or more etch parameters based on at least the first material thickness data and the second material thickness data.

System and method for use in optical monitoring of a sample. The system comprising: a light source unit (140) for providing collimated illumination; polarization modulation unit (160) located in optical path of light propagating from the light source unit; a lens unit (120) for focusing light onto an illumination spot on a surface of a sample, and for collection of light components returning from the sample; a light collection unit configured for collecting light returning from the sample and generate output image data associated with Fourier plane imaging with respect to surface of the sample; and a control unit (500) configured processing said data in accordance with said system calibration. The method provides calibration data, and comprising: providing reference data indicative of complex refractive index of the reference samples on at least two reference samples; collecting ellipsometry data for said at least two reference samples using the ellipsometry system, generating output data having a plurality of data pieces, each associated with unknown angular direction; and for each data piece corresponding to an unknown angular direction, determining simultaneously system parameters and angle of incidence in accordance with corresponding parameters of the reference data to thereby determine calibration data.