A method of determining a phase shift caused by reflection at, or transmission through, a dielectric coating as a function of wavenumber includes obtaining a nominal phase shift for the dielectric coating as a function of wavenumber, determining a first wavenumber and a second wavenumber for performing measurements of phase shift at these wavenumbers based on the nominal phase shift, determining a wavenumber shift based on a first measurement of phase shift at the first wavenumber, a second measurement of phase shift at the second wavenumber, and the nominal phase shift as a function of wavenumber, and determining the phase shift as a function of wavenumber based on the wavenumber shift and the nominal phase. Further described is a method of determining a layer design for a dielectric coating, wherein the dielectric coating comprises a plurality of stacked layers.

A microscope includes light-transmitting-optical-system that irradiates specimen with illumination-light, light-receiving-optical-system that receives signal-light emitted from the specimen, phase-modulation-element that adds predetermined phase distribution to the illumination-light or the signal-light, phase-distribution-measuring-unit that measures first phase distribution, which corresponds to specimen-induced aberration at sampling point of the specimen, at each of a plurality of the sampling points, phase-distribution-calculation-unit that creates phase-data-model showing an amount of phase change which the illumination-light or the signal-light receives when the illumination-light or the signal-light passes through predetermined position in the specimen based on the plurality of first phase distributions, and calculates a second phase distribution which is added to the illumination-light or the signal-light in order to detect detection point of the specimen in a state in which specimen-induced aberration is reduced based on the phase-data-model, and phase-distribution-setting-unit that sets the second phase distribution to the phase-modulation-element.

A deformometer includes: a cavity body; entry and exit optical cavity optics, such that the optical cavity produces filtered combined light from combined light; a first laser that provides first light; a second laser that provides second light; an optical combiner that: receives the first light; receives the second light; combines the first light and the second light; produces combined light from the first light and the second light; and communicates the combined light to the entry optical cavity optic; a beam splitter that: receives the filtered combined light; splits the filtered combined light; a first light detector in optical communication with the beam splitter and that: receives the first filtered light from the beam splitter; and produces a first cavity signal from the first filtered light; and a second light detector that: receives the second filtered light; and produces a second cavity signal from the second filtered light.

A method is provided that allows the sulfur component concentration in gasoline to be estimated to high precision. The measuring method of the disclosure is a method of measuring the concentration of sulfur components in gasoline that contains sulfur components and aromatic components. The measuring method of the disclosure comprises: (A1) removing a portion of the gasoline by gasification to lower the proportion of the aromatic component concentration with respect to the sulfur component concentration in the gasoline, (A2) measuring values related to the refractive index of the gasoline, and (A3) measuring the sulfur component concentration in the gasoline based on the values related to the refractive index.

A cell image evaluation device includes an image acquisition unit that acquires a captured image of a cell, a cell evaluation unit that evaluates the cell image, and a maturity information acquisition unit that acquires information related to maturity of the cell. The cell evaluation unit determines a method for evaluating the cell image on the basis of the information related to the maturity.

Methods and apparatus for examining a material are provided. One example method generally includes disposing the material in a dielectric contrast analysis structure, wherein the dielectric contrast analysis structure comprises a bulk dielectric substance and a plurality of receptacles in the bulk dielectric substance, wherein the material is disposed in one or more of the plurality of receptacles; exposing the dielectric contrast analysis structure to incident electromagnetic radiation; detecting resultant radiation from the exposed dielectric contrast analysis structure; and analyzing the detected resultant radiation to estimate at least one of a phase fraction and a phase distribution in the material. One example system generally includes an electromagnetic radiation source; a dielectric contrast analysis structure comprising a bulk dielectric substance and a plurality of receptacles in the bulk dielectric substance for receiving the material; and an electromagnetic radiation detector, wherein the analysis structure is between the radiation source and the detector.

An apparatus and a method for in-situ phase determination are provided. The apparatus includes a measurement chamber configured to retain a substance, and an entrance window mounted on a side of the measurement chamber. An exit window is mounted on an opposite side of the measurement chamber, and the exit window is parallel with the entrance window. The apparatus further includes a light source configured to generate an incident light beam. The incident light beam is directed to the entrance window at a non-zero angle of incidence with respect to a normal of the entrance window. The incident light beam passes through the entrance window, the measurement chamber and the exit window to form an output light beam. A detector is positioned under the exit window and configured to collect the output light beam passing through the exit window and generate measurement data.

Systems for examining a material comprising: an electromagnetic radiation source; a dielectric contrast analysis structure comprising: a bulk dielectric substance; a plurality of receptacles in the bulk dielectric substance for receiving the material; and an electromagnetic radiation detector, wherein the dielectric contrast analysis structure is between the electromagnetic radiation source and the electromagnetic radiation detector. Wherein the plurality of receptacles are substantially parallel with one another and are disposed in a dielectric contrast analysis structure that is disposed in a pipe. Wherein the dielectric contrast analysis structure comprises: a bulk dielectric substance having a first end, a second end, and the plurality of receptacles disposed within the bulk dielectric substance, wherein a flow path of the material through the receptacles is from the first end of the bulk dielectric substance to the second end of the bulk dielectric substance.

Embodiments of the present disclosure provide a measurement chip. The measurement chip may include a propagation layer configured to allow light to propagate in a propagation direction, an introductory part configured to introduce the light into the propagation layer, an outgoing part configured to outgo the light from the propagation layer, and a coating layer configured to be formed on a surface of the propagation layer. A length of a formed region of the coating layer in the propagating direction is increased or decreased along a direction perpendicular to the propagating direction. The length of the formed region of the coating layer is modifiable using a ligand that reacts with an analyte on the surface of the propagation layer at least in an exposed area that is exposed from the coating layer.

A microscope includes light-transmitting-optical-system that irradiates specimen with illumination-light, light-receiving-optical-system that receives signal-light emitted from the specimen, phase-modulation-element that adds predetermined phase distribution to the illumination-light or the signal-light, phase-distribution-measuring-unit that measures first phase distribution, which corresponds to specimen-induced aberration at sampling point of the specimen, at each of a plurality of the sampling points, phase-distribution-calculation-unit that creates phase-data-model showing an amount of phase change which the illumination-light or the signal-light receives when the illumination-light or the signal-light passes through predetermined position in the specimen based on the plurality of first phase distributions, and calculates a second phase distribution which is added to the illumination-light or the signal-light in order to detect detection point of the specimen in a state in which specimen-induced aberration is reduced based on the phase-data-model, and phase-distribution-setting-unit that sets the second phase distribution to the phase-modulation-element.