A polarization property image measurement device includes: a first radiation unit that radiates light beams in different polarization conditions onto a target object after subjecting the light beams to intensity modulation at frequencies different from one another; a light receiving unit including first photoelectric conversion units that photoelectrically convert the light beams having been radiated from the first radiation unit and scattered at the target object in correspondence to each of the different polarization conditions, and second photoelectric conversion units that photoelectrically convert visible light from the target object; and a processor that detects signals individually output from the first photoelectric conversion units at the different frequencies and differentiates each signal from other signals so as to determine an origin of the signal as one of the light beams; and creates an image of the target object based upon signals individually output from the second photoelectric conversion units.

A device is disclosed for determining characteristic parameters of the dimensions of nanoparticles in suspension in a liquid. The device emits an incident light beam that is linearly polarized along a polarization axis; a detecting unit comprising a measurement arm that is rotatable with respect to an axis of rotation, the detecting unit comprising first and second detection channels that are separated by a polarization-splitting element arranged in the measurement arm; a fixed sample holder receives a container of cylindrical symmetry of the sample, an axis of symmetry of the container being coincident with the axis of rotation of the measurement arm; and a control unit. The polarization-splitting element of the measurement arm is configured to simultaneously send, over each of the first and second detection channels, respectively, a first and second polarized component of the beam scattered by the sample.

Laser speckle microrheology is used to determine a mechanical property of a biological tissue, namely, an elastic modulus. Speckle frames may be acquired by illuminating a coherent light and capturing back-scattered rays in parallel and cross-polarized states with respect to illumination. The speckle frames may be analyzed temporally to obtain diffuse reflectance profiles (DRPs) for the parallel-polarized and cross-polarized states. A scattering characteristic of particles in the biological tissue may be determined based on the DRPs, and a displacement characteristic may be determined based at least in part on a speckle intensity autocorrelation function and the scattering characteristic. A size characteristic of scattering particles may be determined based on the DRP for the parallel polarization state. The mechanical property may be calculated using the displacement and size characteristics.

A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

Methods and systems for performing high throughput spectroscopic measurements of semiconductor structures at mid-infrared wavelengths are presented herein. A Fourier Transform Infrared (FTIR) spectrometer includes one or more measurement channels spanning a wavelength range between 2.5 micrometers and 12 micrometers. The FTIR spectrometer measures a target at multiple different angles of incidence, azimuth angles, different wavelength ranges, different polarization states, or any combination thereof. In some embodiments, illumination light is provided by a laser sustained plasma (LSP) light source to achieve high brightness and small illumination spot size. In some embodiments, FTIR measurements are performed off-axis from the direction normal to the surface of the wafer. In some embodiments, a Stirling cooler extracts heat from the detector of an FTIR spectrometer. In another aspect, measurements performed by one or more spectrometer measurement channels are combined with measurements performed by a mid-infrared FTIR spectrometer channel to characterize high aspect ratio structures.

Disclosed is a device for measuring radiation doses absorbed by a gel dosimeter, including in particular a polarizer for a light beam according to at least two distinct polarization angles, the polarizer being positioned between a light source and an optical detector, a unit for measuring the value of the intensity of the light beam, which intensity is measured by the optical detector, and a unit for calculating the value of a ratio of intensities of the light beam, which intensities are measured by the optical detector, for two distinct polarization angles of the light beam that is selected by the polarizer.

Additive manufacturing, such as laser sintering or melting of additive layers, can produce parts rapidly at small volume and in a factory setting. To ensure the additive manufactured parts are of high quality, a real-time non-destructive evaluation (NDE) technique is required to detect defects while they are being manufactured. The present invention describes an in-situ (real-time) inspection unit that can be added to an existing additive manufacturing (AM) tool, such as an FDM (fused deposition modeling) machine, or a direct metal laser sintering (DMLS) machine, providing real-time information about the part quality, and detecting flaws as they occur. The information provided by this unit is used to a) qualify the part as it is being made, and b) to provide feedback to the AM tool for correction, or to stop the process if the part will not meet the quality, thus saving time, energy and reduce material loss.

Methods of characterizing an optical retardance or a stress-related property of a glass-bases sample include directing a light beam into the glass-based sample while varying the polarization of the light beam to generate scattered light for each polarization are provided. The scattered light for each polarization is captured with an image sensor, which has an exposure time and a frame rate. The scattered light has an intensity distribution at the image sensor. The sample is moved so that the image sensor averages two or more different intensity distributions per frame to form an averaged intensity distribution for each polarization. The averaged intensity distributions for multiple frames are then used to characterize the optical retardance. The optical retardance can turn be used to determine stress-related properties of the glass-based sample. Moving the substrate reduces measurement noise scattered light having no optical retardance information.

Systems and methods for optical inspection of a sample are provided. Radiation scattered from the sample includes a first portion having a first polarization state and a second portion having a second polarization state that is a mirror image of the first polarization state. The first polarization state of the first portion of the scattered radiation is transposed using a polarizing mirroring device so that the scattered radiation output from the polarizing mirroring device has substantially the second polarization state.

A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.