An emission-based detector for use in conjunction with capillary chromatography or other applications involving a gas sample having a small volume is provided. The detector is based on optical emission from a plasma medium. An optical cartridge or other detection and/or processing means may be provided to receive and analyse the emitted radiation and thereby obtain information on the gas to be analysed. The emission-based detector includes a gas inlet, a gas outlet and a capillary channel which is in fluid communication with the gas inlet and gas outlet. The capillary channel acts as the plasma chamber. Preferably, the capillary channel has transversal dimensions of the same order as the cross-section of typical chromatography capillary columns and defines a winding path within the detection area. A multi-cell emission-based detector and a method of analysing a gas sample using multiple detection cells are also provided.

An emission-based detector for use in conjunction with capillary chromatography or other applications involving a gas sample having a small volume is provided. The detector is based on optical emission from a plasma medium. An optical cartridge or other detection and/or processing means may be provided to receive and analyse the emitted radiation and thereby obtain information on the gas to be analysed. The emission-based detector includes a gas inlet, a gas outlet and a capillary channel which is in fluid communication with the gas inlet and gas outlet. The capillary channel acts as the plasma chamber. Preferably, the capillary channel has transversal dimensions of the same order as the cross-section of typical chromatography capillary columns and defines a winding path within the detection area. A multi-cell emission-based detector and a method of analysing a gas sample using multiple detection cells are also provided.

A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.

A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.

The invention relates to an optical emission spectrometer with a spark chamber (10) which comprises a spark stand opening (14) and an oblong electrode (11) being arranged inside thereof for generating a spark and a beam of light originating therefrom. Furthermore, a coupling unit (20) is provided which comprises at least one window being arranged on a window holder and a channel. The spark chamber (10) and the coupling unit (20) are arranged with respect to each other such that the beam of light falls through the window (30) into the channel (21). In addition, the spark chamber (10) and the coupling unit (20) comprise means for purging with an inert gas. The spark chamber (10) is directly connected with a window holder (31) and via the window holder (31) with the coupling unit (20), wherein between spark chamber (10) and window holder (31) a sealing element (33) is provided. The coupling unit (20) comprises at least one elastic means which is arranged such that it presses the window holder (31) against the spark chamber (10).

The invention relates to an optical emission spectrometer with a spark chamber (10) which comprises a spark stand opening (14) and an oblong electrode (11) being arranged inside thereof for generating a spark and a beam of light originating therefrom. Furthermore, a coupling unit (20) is provided which comprises at least one window being arranged on a window holder and a channel. The spark chamber (10) and the coupling unit (20) are arranged with respect to each other such that the beam of light falls through the window (30) into the channel (21). In addition, the spark chamber (10) and the coupling unit (20) comprise means for purging with an inert gas. The spark chamber (10) is directly connected with a window holder (31) and via the window holder (31) with the coupling unit (20), wherein between spark chamber (10) and window holder (31) a sealing element (33) is provided. The coupling unit (20) comprises at least one elastic means which is arranged such that it presses the window holder (31) against the spark chamber (10).

A tissue analysis device is described having a light receiving device and a spectrometer device for determination of tissue characteristics which includes an evaluation device connected with an assignment device. The evaluation device serves for determination of at least one tissue characteristic of a biological tissue, e.g. of its type or an infection with a disease. The assignment device serves for assignment of a suitable transmission curve model that models the contamination of the light receiving device. For different degrees of contamination different transmission curve models are provided that comprise reliability values for each tissue characteristic that can be determined respectively. Not only the tissue analysis can be achieved, but also the indication of the reliability with which the analysis has been carried out, i.e. how reliable the indication of the tissue characteristic is.

Systems and methods are disclosed for using downhole plasma discharge effects to determine porosity and/or permeability of formation material. In some embodiments, a method includes determining a concentration of at least one chemical reaction product in a drilling fluid that has interacted with a plasma discharge proximate formation material. A relation between arc and spark of the plasma discharge is determined based, at least in part, on the at least one chemical reaction product, and at least one of porosity and permeability of the formation material is determined based, at least in part, on the relation between arc and spark.

Various methods and systems are provided for analyzing sample inclusions. As one example, a correction factor may be generated based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system. The OES system may be calibrated with the correction factor. The inclusion properties of a second, different, sample may be determined using the calibrated OES system.

Various methods and systems are provided for analyzing sample inclusions. As one example, a correction factor may be generated based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system. The OES system may be calibrated with the correction factor. The inclusion properties of a second, different, sample may be determined using the calibrated OES system.