Disclosed is a method, system, and apparatus for optical emission measurement. The apparatus includes a collection system for collecting a plasma optical emission spectra through an optical window disposed at a wall of a plasma processing chamber. The optical system includes a mirror configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra.

Disclosed is a method, system, and apparatus for optical emission measurement. The apparatus includes a collection system for collecting a plasma optical emission spectra through an optical window disposed at a wall of a plasma processing chamber. The optical system includes a mirror configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra.

Provided is a sample-analyzing system used for identifying a target sample from its measurement data obtained using a plurality of analyzing devices including at least one device selected from a fluorescent X-ray analyzer, atomic absorption photometer and inductively coupled plasma emission analyzer as well as at least one device selected from an infrared spectrophotometer and Raman spectrophotometer. The system includes: a storage section for holding measurement data obtained for each of the reference objects using the analyzing devices; a measurement data comparator for comparing, for each analyzing device, the measurement data of the target sample with those of the reference objects and for determining the degree of matching of the target sample with each reference object; an integrated degree-of-matching calculator for calculating an integrated degree of matching from the degrees of matching determined for the analyzing devices; and a comparison result output section for outputting information concerning a predetermined number of reference objects in descending order of the integrated degree of matching.

A chamber cleaning method includes processing a wafer for a Cu-to-Cu bonding process using plasma in a chamber; and removing copper from the chamber. Removing copper includes forming copper oxide on an inner wall of the chamber by oxidizing copper in the chamber by a plasma treatment that uses a first gas, performing a first monitoring operation that monitors a copper contamination state in the chamber using an optical diagnostic method, removing the copper oxide by a plasma treatment that uses a second gas; and performing a second monitoring operation that monitors a copper contamination state in the chamber using the optical diagnostic method.

An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.

An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.

An ICP emission spectrometer is schematically configured to include an inductively coupled plasma generation unit, a light condensing unit, a spectroscope, a detector, and a controller. The detector includes a photomultiplier and has a detector controller and an input unit. The photomultiplier has voltage dividing resistors, which make an amplification factor not to become constant immediately due to a change in an application voltage applied to the photomultiplier, but the detector controller controls an idle voltage and an idle voltage application time so that a multiplication factor becomes constant, during a period from when analysis conditions are input to the input unit in advance until a sample containing an analysis-targeted element is introduced into the inductively coupled plasma generation unit.

An ICP emission spectrometer is schematically configured to include an inductively coupled plasma generation unit, a light condensing unit, a spectroscope, a detector, and a controller. The detector includes a photomultiplier and has a detector controller and an input unit. The photomultiplier has voltage dividing resistors, which make an amplification factor not to become constant immediately due to a change in an application voltage applied to the photomultiplier, but the detector controller controls an idle voltage and an idle voltage application time so that a multiplication factor becomes constant, during a period from when analysis conditions are input to the input unit in advance until a sample containing an analysis-targeted element is introduced into the inductively coupled plasma generation unit.

Information relating to a target molecule in a sample volume containing sample molecules is obtained by applying a sequence of temporally varying fields in a field direction to the sample volume caused by acoustic forces and/or by electromagnetic fields where the sequence of temporally varying fields is chosen to produce a sequence of at least two different perturbed molecular configurations for said target molecule in the sample and where the perturbed molecular configurations are at least in part correlated with the direction of said applied fields. A sequence of probe radiation is applied on the sample molecules and interaction radiation is collected for measuring amplitudes of the interaction radiation collected for a plurality of directions and/or polarizations which are related to the field direction. Where reference spectra are available from previous experiments, the method can be used for identifying a target molecule in the sample volume.

Information relating to a target molecule in a sample volume containing sample molecules is obtained by applying a sequence of temporally varying fields in a field direction to the sample volume caused by acoustic forces and/or by electromagnetic fields where the sequence of temporally varying fields is chosen to produce a sequence of at least two different perturbed molecular configurations for said target molecule in the sample and where the perturbed molecular configurations are at least in part correlated with the direction of said applied fields. A sequence of probe radiation is applied on the sample molecules and interaction radiation is collected for measuring amplitudes of the interaction radiation collected for a plurality of directions and/or polarizations which are related to the field direction. Where reference spectra are available from previous experiments, the method can be used for identifying a target molecule in the sample volume.