An inductively coupled plasma (ICP) torch is described that includes an injector protector to shield an injector end. A system embodiment includes, but is not limited to, a tubular sample injector configured to receive an aerosolized sample in an interior defined by walls of the tubular sample injector; an injector protector surrounding at least a portion of the tubular sample injector; an inner tube surrounding at least a portion of the injector protector to form a first annular space between the inner tube and the injector protector, the inner tube defining at least one inlet port for introduction of an auxiliary gas into the first annular space; and an outer tube surrounding at least a portion of the inner tube to form a second annular space, the outer tube defining at least one inlet port for introduction of a cooling gas into the second annular space.

An inductively coupled plasma (ICP) torch is described that includes an injector protector to shield an injector end. A system embodiment includes, but is not limited to, a tubular sample injector configured to receive an aerosolized sample in an interior defined by walls of the tubular sample injector; an injector protector surrounding at least a portion of the tubular sample injector; an inner tube surrounding at least a portion of the injector protector to form a first annular space between the inner tube and the injector protector, the inner tube defining at least one inlet port for introduction of an auxiliary gas into the first annular space; and an outer tube surrounding at least a portion of the inner tube to form a second annular space, the outer tube defining at least one inlet port for introduction of a cooling gas into the second annular space.

A sample analysis system including: a droplet device that intermittently introduces a sample to a measurement region set in plasma; a light emission detection device that detects light emission in the measurement region at a detection timing, the detection timing being set at a predetermined cycle in advance; and an analysis device that analyzes the sample based on the detected light emission, the analysis device being provided with: a distribution computing unit that computes a time-spatial light intensity distribution based on the detected light emission, the time-spatial light intensity distribution being a distribution of a light intensity according to the detection timing, a position in the measurement region, and an wavelength component of the light emission; and a characteristic specifying unit that computes a feature amount that correlates with a sample characteristic indicating a property of the sample and specifies the sample characteristic based on the feature amount.

Systems and methods are described for integrated decomposition and scanning of a semiconducting wafer, where a single chamber is utilized for decomposition and scanning of the wafer of interest.

Systems and methods are described for integrated decomposition and scanning of a semiconducting wafer, where a single chamber is utilized for decomposition and scanning of the wafer of interest.

A ruthenium oxide gas absorbent liquid includes an organic alkali solution containing a ligand and/or an onium salt composed of an onium ion and an anion, at least part of which is a hydroxide ion, wherein the hydroxide ion has a concentration ranging from more than 1×10.sup.−7 mol/L to 6 mol/L or less.

Systems and methods for use in introducing samples to an analytical device for single particle compositional analysis. Suitable analytical devices include, for example, an inductively coupled plasma-optical emission spectrometer. Prior to introduction to the analytical device, the sample gas is exchanged with argon gas, for example, using a gas exchange device. The analytical device may be calibrated with a liquid sample which is aerosolized prior to entry into the analytical device.

Systems and methods for use in introducing samples to an analytical device for single particle compositional analysis. Suitable analytical devices include, for example, an inductively coupled plasma-optical emission spectrometer. Prior to introduction to the analytical device, the sample gas is exchanged with argon gas, for example, using a gas exchange device. The analytical device may be calibrated with a liquid sample which is aerosolized prior to entry into the analytical device.

An optical emission spectrometry instrument may comprise an inductively coupled plasma generator (ICP) with an electromagnetic coil having input and ground connectors. The electromagnetic coil may be mounted to a mounting disk, and the input connector may be coupled to a power output of a radio frequency power source, and the ground connector may be connected to the mounting disk. A spectro-chemical source may be used for sample excitation. The spectro-chemical source and the ICP may have a longitudinal axis. An optical system may be included for viewing the spectro-chemical source with a fixed view axis. The electromagnetic coil may be mounted pivotably around one of its connectors so that the orientation of the ICP can be altered from a first orientation of its longitudinal axis to a second orientation of its longitudinal axis, and vice versa.

An optical emission spectrometry instrument may comprise an inductively coupled plasma generator (ICP) with an electromagnetic coil having input and ground connectors. The electromagnetic coil may be mounted to a mounting disk, and the input connector may be coupled to a power output of a radio frequency power source, and the ground connector may be connected to the mounting disk. A spectro-chemical source may be used for sample excitation. The spectro-chemical source and the ICP may have a longitudinal axis. An optical system may be included for viewing the spectro-chemical source with a fixed view axis. The electromagnetic coil may be mounted pivotably around one of its connectors so that the orientation of the ICP can be altered from a first orientation of its longitudinal axis to a second orientation of its longitudinal axis, and vice versa.