An apparatus for the production of solid dosage forms is presented, wherein the apparatus comprises a material processing chamber which is operable for manufacturing a product according to a pre-set product formation process path. The apparatus has at least one sensor for continuously monitoring formation of the product in the material processing chamber during the product formation process non-invasively in real time by sensing at least one product functional attribute value and a means for comparing each sensed product functional attribute value with a desirable product functional attribute value for that point on the product formation process path. A controller controls operation of the material processing chamber in response to the sensed product functional attribute value for maintaining the product on the product formation process path.

The invention relates to a method for controlling an enzymatic pre-treatment process, e.g. a mashing process. The method allows for accurate determination of specific sugar molecules as well as the average length of the sugar chains in real-time during e.g. a mashing process. Further information on e.g. the concentration of dissolved protein and free amino acids can also be obtained simultaneously. The method comprises the use of an infrared (IR) spectometer for continuously measuring attenuated total reflectance (ATR) IR spectra of samples obtained during pre-treatment of biomass.

Methods and systems are provided for using optical interferometry in the context of material modification processes such as surgical laser, sintering, and welding applications. An imaging optical source that produces imaging light. A feedback controller controls at least one processing parameter of the material modification process based on an interferometry output generated using the imaging light. A method of processing interferograms is provided based on homodyne filtering. A method of generating a record of a material modification process using an interferometry output is provided.

An apparatus includes a base component and a plurality of collimators housed within the base component. Each collimator of the plurality of collimators corresponds to a respective location of a plurality of locations of a wafer in an etch chamber. The plurality of locations includes a center location of the wafer, a plurality of inner ring locations along an inner ring of the wafer associated with a first set of radially symmetric optical emission spectroscopy (OES) signal sampling paths, and a plurality of outer ring locations along an outer ring of the wafer associated with a second set of radially symmetric OES signal sampling paths.

An inspection system includes an acquisition unit and a determination unit. The acquisition unit acquires an image representing a surface of an object. The determination unit performs color determination processing. The color determination processing is performed to determine a color of the surface of the object based on a plurality of conditions of reflection. The plurality of conditions of reflection are obtained from the image representing the surface of the object as acquired by the acquisition unit, and have a specular reflection component and a diffuse reflection component at respectively different ratios on the surface of the object.

A method for monitoring and/or controlling a biopharmaceutical process includes determining a query point associated with scanning of the process by a spectroscopy system (e.g., a Raman spectroscopy system), and querying an observation database containing observation data sets associated with past observations of biopharmaceutical processes. Each of the observation data sets includes spectral data and a corresponding actual analytical measurement. Querying the observation database includes selecting as training data, from among the observation data sets, those data sets that satisfy one or more relevancy criteria with respect to the query point. The method also includes using the selected training data to calibrate a local model specific to the biopharmaceutical process. The local model (e.g., a Gaussian process model) is trained to predict analytical measurements based on spectral data inputs. The method also includes using the local model to predict an analytical measurement of the biopharmaceutical process.

The present invention provides an information processing apparatus comprising: an obtainer configured to, in a process of supplying a curable composition onto a substrate or a mold and forming a film of the curable composition in a space between the substrate and the mold, obtain the captured image of the curable composition; a generator configured to generate a predicted image representing a prediction result of a behavior of the curable composition on the substrate in the process; and a display controller configured to display, on a display unit, the captured image and the predicted image to be comparable to each other.

In some implementations, a device may receive spectroscopic data associated with a dynamic process. The device may generate a principal component analysis (PCA) model based on a first block of spectra from the spectroscopic data. The device may project a second block of spectra from the spectroscopic data to the PCA model generated based on the first block of spectra. The device may determine a value of a metric associated with the second block based on projecting the second block of spectra to the PCA model. The device may determine whether the dynamic process has reached an end point based on the value of the metric associated with the second block.

A method includes receiving, by a processing device, first data from an optical sensor of a processing chamber. The method further includes processing the first data to obtain second data. The second data includes an indication of a condition of a coating on an interior surface of the processing chamber. The method further includes generating an indication of performance of a processing operation of the processing chamber in view of the second data. The method further includes causing performance of a corrective action in view of the indication of performance of the processing chamber.

Provided are a monitoring device and method. A monitoring device includes a laser processor configured to emit a processing laser beam to perform a melting annealing process on a wafer; a laser monitor configured to emit a monitoring laser beam onto the wafer while the laser processor performs the melting annealing process, the laser monitor configured to measure reflectivity of the wafer; and a data processor configured to process data on the reflectivity measured by the laser monitor, and monitor one or more characteristics of the wafer based on the data on the reflectivity.