A correction apparatus for correcting a structure factor includes a structure factor acquisition section that acquires the structure factor; a PDF calculation section that calculates PDF from the acquired structure factor; a correction function preparation section that prepares a first correction function that is Fourier-transformed in a predetermined range, and a second correction function that is Fourier-transformed in the predetermined range, the first correction function comprising data of the PDF and a cut-off function for cutting off data on a long distance side of the PDF and the second correction function comprising the cut-off function; a correction amount calculation section that calculates a correction amount comprising the first correction function, the second correction function, and a scale factor; a structure factor correction section that corrects the structure factor; and an R-factor value calculation section that calculates an R-factor value indicating correction accuracy.

A correction apparatus for correcting a structure factor includes a structure factor acquisition section that acquires the structure factor; a PDF calculation section that calculates PDF from the acquired structure factor; a correction function preparation section that prepares a first correction function that is Fourier-transformed in a predetermined range, and a second correction function that is Fourier-transformed in the predetermined range, the first correction function comprising data of the PDF and a cut-off function for cutting off data on a long distance side of the PDF and the second correction function comprising the cut-off function; a correction amount calculation section that calculates a correction amount comprising the first correction function, the second correction function, and a scale factor; a structure factor correction section that corrects the structure factor; and an R-factor value calculation section that calculates an R-factor value indicating correction accuracy.

A single-crystal X-ray structure analysis apparatus capable of surely and easily performing a single-crystal X-ray structure analysis using a crystalline sponge, an analysis method and a sample holder thereof, are provided. There are provided a sample holder 250 that holds a sample; a goniometer that rotationally moves, the goniometer to which the sample holder 250 is attached; an X-ray irradiation section that irradiates the X-rays from the X-ray source to the sample held by the sample holder 250 attached to the goniometer, wherein the sample holder 250 comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein, and the porous complex crystal is fixed at a position of the sample holder, the position where the X-rays are irradiated from the X-ray irradiation section, in a state where the sample holder 250 is attached to the goniometer.

A single-crystal X-ray structure analysis apparatus capable of surely and easily performing a single-crystal X-ray structure analysis using a crystalline sponge, an analysis method and a sample holder thereof, are provided. There are provided a sample holder 250 that holds a sample; a goniometer that rotationally moves, the goniometer to which the sample holder 250 is attached; an X-ray irradiation section that irradiates the X-rays from the X-ray source to the sample held by the sample holder 250 attached to the goniometer, wherein the sample holder 250 comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein, and the porous complex crystal is fixed at a position of the sample holder, the position where the X-rays are irradiated from the X-ray irradiation section, in a state where the sample holder 250 is attached to the goniometer.

Aspects of the disclosure are directed to an analysis of a material of a component. A radiation source is activated to transmit radiation to the component. A beam pattern is obtained based on the component interfering with the radiation. The beam pattern is compared to a reference beam pattern. An anomaly is detected to exist in the material when the comparison indicates a deviation between the beam pattern and the reference beam pattern.

Aspects of the disclosure are directed to an analysis of a material of a component. A radiation source is activated to transmit radiation to the component. A beam pattern is obtained based on the component interfering with the radiation. The beam pattern is compared to a reference beam pattern. An anomaly is detected to exist in the material when the comparison indicates a deviation between the beam pattern and the reference beam pattern.

A device keeps an electrochemical cell under current and at operating temperature during an X-ray beam diffraction analysis of a first electrode, the cell comprising a solid electrolyte interposed between the electrodes. The device comprises: first and second interconnectors having contact faces contacting the electrodes, which allow a gas flow and exchange between the interconnectors and the electrodes. The contact face of the first interconnector allows an X-ray beam to pass to the first electrode. A thermal and atmospheric containment chamber has an inner cavity housing a stack formed from the cell between the interconnectors and a cover closing the cavity, provided with a window allowing X-rays to pass through, the first interconnector being intended to be arranged facing the cover. The contact face of each interconnector is a slotted element; slotted portions of the slotted element are uniformly arranged and form 30% to 80% of the element's surface area.

A device keeps an electrochemical cell under current and at operating temperature during an X-ray beam diffraction analysis of a first electrode, the cell comprising a solid electrolyte interposed between the electrodes. The device comprises: first and second interconnectors having contact faces contacting the electrodes, which allow a gas flow and exchange between the interconnectors and the electrodes. The contact face of the first interconnector allows an X-ray beam to pass to the first electrode. A thermal and atmospheric containment chamber has an inner cavity housing a stack formed from the cell between the interconnectors and a cover closing the cavity, provided with a window allowing X-rays to pass through, the first interconnector being intended to be arranged facing the cover. The contact face of each interconnector is a slotted element; slotted portions of the slotted element are uniformly arranged and form 30% to 80% of the element's surface area.

Provided is an X-ray analysis apparatus including: a goniometer including an incident-side arm extending in a first direction, a fixing portion, and a receiving-side arm; an X-ray source portion, which is arranged on the incident-side arm and generates an X-ray source extending in a second direction, which crosses the first direction; a support base, which is arranged on the fixing portion, and is configured to support a sample; a parallel slit, which is arranged on the fixing portion, and is configured to limit a line width along the second direction of the X-ray source generated by the X-ray source portion; and a detector, which is arranged on the receiving-side arm, and is configured to detect a scattered X-ray generated by the sample.

Provided is an X-ray analysis apparatus including: a goniometer including an incident-side arm extending in a first direction, a fixing portion, and a receiving-side arm; an X-ray source portion, which is arranged on the incident-side arm and generates an X-ray source extending in a second direction, which crosses the first direction; a support base, which is arranged on the fixing portion, and is configured to support a sample; a parallel slit, which is arranged on the fixing portion, and is configured to limit a line width along the second direction of the X-ray source generated by the X-ray source portion; and a detector, which is arranged on the receiving-side arm, and is configured to detect a scattered X-ray generated by the sample.