Patent classifications
G01N23/2255
Dispositioning defects detected on extreme ultraviolet photomasks
Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photomask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects.
Dispositioning defects detected on extreme ultraviolet photomasks
Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photomask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects.
METHOD FOR CROSS-SECTION SAMPLE PREPARATION
A novel method for cross-section sample preparation has a sample oriented normal to an SEM/GFIS or other imaging column via a stage, and is operated upon by an FIB to form the cross-section pre-lamella within the sample, followed by an approximate 90 rotation with no tilt of the stage for cut out by the FIB. Asymmetric trenches are milled to have a three-dimensional depth profile to ensure that the FIB has clear line of sight to a face of the resulting pre-lamella when the sample has been rotated. The three-dimensional depth profile further minimizes overall milling time required for the preparation of the pre-lamella.
METHOD FOR CROSS-SECTION SAMPLE PREPARATION
A novel method for cross-section sample preparation has a sample oriented normal to an SEM/GFIS or other imaging column via a stage, and is operated upon by an FIB to form the cross-section pre-lamella within the sample, followed by an approximate 90 rotation with no tilt of the stage for cut out by the FIB. Asymmetric trenches are milled to have a three-dimensional depth profile to ensure that the FIB has clear line of sight to a face of the resulting pre-lamella when the sample has been rotated. The three-dimensional depth profile further minimizes overall milling time required for the preparation of the pre-lamella.
Structured detectors and detector systems for radiation imaging
Detector module designs for radiographic imaging include first and second layers of scintillator rods or pixel arrays oriented in first and second directions. The first and second directions are transversely oriented to define a light sharing region between the first and second layers. Encoding features may be disposed in, on or between the first and second layers, and configured to modulate propagation of optical signals therealong or therebetween.
Structured detectors and detector systems for radiation imaging
Detector module designs for radiographic imaging include first and second layers of scintillator rods or pixel arrays oriented in first and second directions. The first and second directions are transversely oriented to define a light sharing region between the first and second layers. Encoding features may be disposed in, on or between the first and second layers, and configured to modulate propagation of optical signals therealong or therebetween.
STRUCTURED DETECTORS AND DETECTOR SYSTEMS FOR RADIATION IMAGING
A radiation detector module including a scintillator element configured to generate optical signals in response to incident radiation. A photodetector is coupled to at least a first surface of the scintillator element, the photodetector configured to convert the optical signals into output characterizing the radiation. An acoustic array is coupled to at least a second surface of the scintillator element, the acoustic array configured to convert acoustic signals generated in the scintillator element into output characterizing acoustic energy deposited therein.
STRUCTURED DETECTORS AND DETECTOR SYSTEMS FOR RADIATION IMAGING
A radiation detector module including a scintillator element configured to generate optical signals in response to incident radiation. A photodetector is coupled to at least a first surface of the scintillator element, the photodetector configured to convert the optical signals into output characterizing the radiation. An acoustic array is coupled to at least a second surface of the scintillator element, the acoustic array configured to convert acoustic signals generated in the scintillator element into output characterizing acoustic energy deposited therein.
DISPOSITIONING DEFECTS DETECTED ON EXTREME ULTRAVIOLET PHOTOMASKS
Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photornask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects.
DISPOSITIONING DEFECTS DETECTED ON EXTREME ULTRAVIOLET PHOTOMASKS
Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photornask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects.