A system for conducting real-time chemical analysis of deposits is provided. The system includes an electromagnetic radiation source positioned on a downhole tool that emits electromagnetic radiation to a surrounding downhole environment within a field of view of interest. The system also includes a multivariate optical element positioned on the downhole tool that has optical filters configured to receive reflected radiation from the field of view of interest and generate respective filtered radiation signals. Each of the optical filters has a different transmission function that corresponds to a respective chemical species of interest. The system also includes an image sensor positioned on the downhole tool that detects each of the respective filtered radiation signals from the multivariate optical element. The image sensor provides image information of the field of view of interest that indicates a presence of at least one chemical species of interest located in the surrounding downhole environment.

The invention aims to provide an inspection device that can sensitively detect a defect even if intensity of scattered light reflected from an inspection object greatly varies depending on portions of the inspection object. An inspection device according to the invention uses a history of detection signals to predict whether a next detection signal level exceeds a threshold. When the detection signal level is predicted to exceed the threshold, operation of the device is beforehand changed such that the detection signal level does not exceed the threshold.

Disclosed is a method of processing a Raman spectroscopy signal. The method includes: obtaining a first resolution of Raman spectroscopy by irradiating a target sample with broadband excitation light; calculating a Raman spectroscopy signal corresponding to the Raman spectroscopy of the first resolution; and calculating a signal corresponding to a second resolution of Raman spectroscopy that is higher than the first resolution by deconvoluting a Raman light signal.

A method of determining overlay (OVL) in a pattern in a semiconductor wafer manufacturing process comprises capturing images from a cell in a metrology target formed in at least two different layers in the wafer with parts of the target offset in opposing directions with respect to corresponding parts in a different layer. The images may be captured using radiation of multiple different wavelengths, each image including +1 and 1 diffraction patterns. A first and second differential signal may be determined for respective pixels in each image by subtracting opposing pixels from the +1 and 1 diffraction orders for each of the multiple wavelengths. An OVL for the respective pixels may be determined based on analyzing the differential signals from multiple wavelengths simultaneously. Then an OVL for the pattern may be determined as a weighted average of the OVL of the respective pixels.

The present application relates to the measurement technology of the striae in optical materials, and more particularly to a quantitative test method for the striae in optical materials. The method includes: establishing a concept and algorithm of the striae quantitative expression; establishing a gray ruler of striae quantitative measurement and standard proof samples to calibrate a photoelectric projection measurement apparatus equipped with a photoelectric image sensor; imaging a measurement sample with the calibrated photoelectric projection measurement apparatus and obtaining the striae image of the measurement sample thereof and determining values of the parameters of the area and gray of the striae image; and inputting the values into the algorithm to calculate the striae value of the measurement sample.

The present application relates to the measurement technology of the striae in optical materials, and more particularly to a quantitative test method for the striae in optical materials. The method includes: establishing a concept and algorithm of the striae quantitative expression; establishing a gray ruler of striae quantitative measurement and standard proof samples to calibrate a photoelectric projection measurement apparatus equipped with a photoelectric image sensor; imaging a measurement sample with the calibrated photoelectric projection measurement apparatus and obtaining the striae image of the measurement sample thereof and determining values of the parameters of the area and gray of the striae image; and inputting the values into the algorithm to calculate the striae value of the measurement sample.

The transmissive sampling module includes a light emitting element, an accommodation tank, and a lens group having a positive refractive power. The light emitting element is configured to emit an illumination beam. The accommodation tank is configured to accommodate an object to be measured. The lens group includes a first lens and a second lens. The first lens and the second lens are respectively located at a first side and a second side of the accommodation tank. The accommodation tank is located between the first lens and the second lens. The illumination beam is transmitted to the object after passing through the first lens. The object converts the illumination beam into a sample beam. The sample beam is transmitted to a main body of the spectrometer after passing through the second lens. A transmissive spectrometer having a transmissive sampling module is also provided.

Embodiments relate generally to electromagnetic radiation detector devices, systems, and methods using a planar Golay cell. A method for gas detection may comprise providing a gas sealed in a cavity of a gas detector; directing radiative power from a light source through one or more target gases and through a cell body of the gas detector toward the cavity and a wavelength selective absorber of the gas detector, wherein the one or more target gases are located between the light source and the cavity; setting wavelength sensitivity with the wavelength selective absorber, wherein the wavelength sensitivity is irrespective of an angle of incidence (?); absorbing the radiative power by the wavelength selective absorber and by the one or more target gases; detecting, by a pressure sensing element, a pressure change caused by the absorbing of the radiative power; and determining the one or more target gases based on the detected pressure change.

Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation. The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom.

An arrangement for measuring gas concentrations in a gas absorption method, wherein the arrangement includes a plurality of light sources, a measuring cell, at least one measuring receiver and an evaluation apparatus. The measuring cell has a narrow, longitudinally-extended beam path with an entrance-side opening diameter B and an absorption length L with L>B, wherein the measuring cell has a gas inlet and a gas outlet wherein a plurality of light sources of different wavelength spectra is grouped into a first light source group wherein an optical homogeniser is interposed between the first light source group and the measuring cell, wherein, in particular, the homogeniser is coupled to the light source group directly or via a common optical assembly.