A method for improving the quality/integrity of an EBSD/TKD map, wherein each data point is assigned to a corresponding grid point of a sample grid and represents crystal information based on a Kikuchi pattern detected for the grid point; comprising determining a defective data point of the EBSD/TKD map and a plurality of non-defective neighboring data points, comparing the position of Kikuchi bands of a Kikuchi pattern detected for a grid point corresponding to the defective data point with the positions of bands in at least one simulated Kikuchi pattern corresponding to crystal information of the neighboring data points and assigning the defective data point the crystal information of one of the plurality of neighboring data point based on the comparison.

A detector for Kikuchi diffraction comprising a detector body and a detector head mountable to each other. The detector body comprises a body part which is enclosing a photodetector configured for detecting incident radiation and further comprises a vacuum window arranged upstream the photodetector with respect to a propagation direction of the incident radiation, a first body mounting portion configured to be mounted to a SEM chamber port and a second body mounting portion. The detector head comprises a scintillation screen and a head mounting portion configured to be mounted to the second body mounting portion.

The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focusing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points x.sub.D, y.sub.D and mapping each of the detected image points x.sub.D, y.sub.D to an image point of an improved TKD pattern (20a) with the coordinates x.sub.0, y.sub.0 by using and inverting generalized terms of the form x.sub.D=γ*A+(1−γ)*B and y.sub.D=γ*C+(1−γ)*D wherein $\gamma =\frac{Z}{D}$
with Z being an extension in the z-direction of a cylindrically symmetric magnetic field B.sub.Z of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x.sub.0, y.sub.0, with B and D defining a rotation around a symmetry axis of the magnetic field B.sub.Z, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field B.sub.Z. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.

Dynamic band contrast image (DBCI) is constructed with scattering patterns acquired at multiple scanning locations of a sample using a charged particle beam. Each pixel of the DBCI is generated by integrating the corresponding scattering pattern along a diffraction band. The DBCI includes charged particle channeling condition and can be used for detecting sample defects.

A method includes simulating diffraction in a transmission geometry of relativistic electron bunches from a crystallographic structure of a crystal thereby simulating diffraction of the relativistic electron bunches into a plurality of Bragg peaks. The method includes selecting a range of angles between a direction of propagation of the relativistic electron bunches and a normal direction of crystal including an angle at which a diffraction portion is maximized. The method includes sequentially accelerating a plurality of physical electron bunches to relativistic energies toward a physical crystal having the crystallographic structure and diffracting the plurality of physical electron bunches off the physical crystal at different angles and measuring the diffraction portion into the respective Bragg peak at the different angles. The method includes selecting a final angle based on the measured diffraction portion into the respective Bragg peak at the different angles and generating a pulse of light.

The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focussing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points x.sub.D, y.sub.D and mapping each of the detected image points x.sub.D, y.sub.D to an image point of an improved TKD pattern (20a) with the coordinates x.sub.0, y.sub.0 by using and inverting generalized terms of the form x.sub.D=γ*A+(1−γ)*B and y.sub.D=γ*C+(1−γ)*D wherein

[00001]$\gamma =\frac{Z}{D}$ with Z being an extension in the z-direction of a cylindrically symmetric magnetic field B.sub.Z of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x.sub.0, y.sub.0, with B and D defining a rotation around a symmetry axis of the magnetic field B.sub.Z, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field B.sub.Z. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.

Molecular structure may be determined based on structure factors solved from the diffraction pattern and the electron microscopy image of the sample. In particular, the amplitudes of the structure factors may be determined based on intensities of diffraction peaks in the multiple diffraction patterns. The phases of the structure factors may be determined based on electron microscopy images and the intensities of the diffraction peaks.

A fatigue level estimation method includes estimating a fatigue portion in a metal material, measuring a distribution of a misorientation in the fatigue portion, obtaining a specific area ratio of the fatigue portion based on the distribution of the misorientation in the fatigue portion, and obtaining an estimated fatigue level of the metal material based on at least one of the specific area ratio of the fatigue portion and a degree of change in the specific area ratio of the fatigue portion. The specific area ratio of the fatigue portion is a ratio of a specific area existing in a measurement area of the fatigue portion.

A detector for Kikuchi diffraction comprising a detector body and a detector head mountable to each other. The detector body comprises a body part which is enclosing a photodetector configured for detecting incident radiation and further comprises a vacuum window arranged upstream the photodetector with respect to a propagation direction of the incident radiation, a first body mounting portion configured to be mounted to a SEM chamber port and a second body mounting portion. The detector head comprises a scintillation screen and a head mounting portion configured to be mounted to the second body mounting portion.

Molecular structure may be determined based on structure factors solved from the diffraction pattern and the electron microscopy image of the sample. In particular, the amplitudes of the structure factors may be determined based on intensities of diffraction peaks in the multiple diffraction patterns. The phases of the structure factors may be determined based on electron microscopy images and the intensities of the diffraction peaks.