Patent classifications
G01N2223/3301
X-RAY TOMOGRAPHY
An x-ray tomography system which can generate a qualitative 3D image of a region of interest using a an x-ray source, the x-ray source configured to emit x-ray radiation at the region of interest. The x-ray radiation or the x-ray source or the relative position of the x ray source configured to be moved in a two dimensional plane. An x-ray detector including a plurality of detector elements arranged in a two dimensional plane opposite the x-ray source, the x-ray detector configured to detect x-ray radiation after attenuation by the subject and provide an indication of the detected x-rays. And a processor configured to receive the indication of the detected x-rays and resolve the detected x-ray radiation into a three dimensional image. The three dimensional image is qualitative in nature.
Handheld Backscatter Scanning Systems With Different Detector Panel Configurations
The present specification provides a detector for an X-ray imaging system. The detector includes at least one high resolution layer having high resolution wavelength-shifting optical fibers, each fiber occupying a distinct region of the detector, at least one low resolution layer with low resolution regions, and a single segmented multi-channel photo-multiplier tube for coupling signals obtained from the high resolution fibers and the low resolution regions.
X-ray source optics for small-angle X-ray scatterometry
An X-ray apparatus includes a mount, an X-ray source, a detector and a beam limiter. The mount is configured to hold a planar sample. The X-ray source is configured to direct a beam of X-rays toward a first side of the sample. The detector is positioned on a second side of the sample, opposite the first side, so as to receive at least a part of the X-rays that have been transmitted through the sample. The beam limiter is positioned on the first side of the sample so as to intercept the beam of the X-rays. The beam limiter includes first and second blades and first and second actuators. The first and second blades have respective first and second edges positioned in mutual proximity so as to define a slit, through which the beam of the X-rays will pass, at a distance smaller than 25 mm from the first side of the sample. The first and second actuators are configured to shift the first and second blades along respective, first and second translation axes so as to adjust a width of the slit.
Wafer alignment for small-angle x-ray scatterometry
An X-ray apparatus includes a mount, an X-ray source, a detector, an optical gauge and a motor. The mount is configured to hold a planar sample having a first side, which is smooth, and a second side, which is opposite the first side and on which a pattern has been formed. The X-ray source is configured to direct a first beam of X-rays toward the first side of the sample. The detector is positioned on the second side of the sample so as to receive at least a part of the X-rays that have been transmitted through the sample and scattered from the pattern. The optical gauge is configured to direct a second beam of optical radiation toward the first side of the sample, to sense the optical radiation that is reflected from the first side of the sample, and to output a signal, in response to the sensed optical radiation, that is indicative of a position of the sample. The motor is configured to adjust an alignment between the detector and the sample in response to the signal.
X-ray detection optics for small-angle X-ray scatterometry
An X-ray apparatus includes a mount, an X-ray source, a detector, an actuator, and a controller. The mount is configured to hold a sample. The X-ray source is configured to direct a beam of X-rays toward a first side of the sample. The detector is positioned on a second side of the sample, opposite the first side, so as to receive at least a portion of the X-rays that have been transmitted through the sample and to output signals indicative of an intensity of the received X-rays. The actuator is configured to scan the detector over a range of positions on the second side of the sample so as to measure the transmitted X-rays as a function of a scattering angle. The controller is coupled to receive the signals output by the detector and to control the actuator, responsively to the signals, so as to increase an acquisition time of the detector at first positions where the intensity of the received X-rays is weak relative to the acquisition time at second positions where the intensity of the received X-rays is strong.
Reducing scatter for computed tomography
A method of computed tomography includes illuminating an object with a cone of illumination, wherein the object is between a source of the cone of illumination and a two-dimensional photo-detector array. The method includes shielding the photodetector array from the collimator shield that includes a slit defined therethrough and moving the slit of the collimator shield across the photodetector array in a direction perpendicular to the slit to expose the photodetector array to the cone of illumination through the slit as the slit scans across the photodetector array to acquire a two-dimensional image of the object. The method includes rotating the object to a new rotational position and repeating movement of the slit to expose the photodetector and rotating the object along the axis until the object has been imaged from multiple rotational positions to form a three-dimensional model of the object.
NON-COVALENT MODIFICATION OF GRAPHENE-BASED CHEMICAL SENSORS
Embodiments herein relate to chemical sensors, devices and systems including the same, and related methods. In an embodiment, a medical device is included having a graphene varactor including a graphene layer and a self-assembled monolayer disposed on an outer surface of the graphene layer through non-covalent interactions between the self-assembled monolayer and a -electron system of graphene. The self-assembled monolayer includes one or more pillarenes, substituted pillarenes, calixarenes, substituted calixarenes, peralkylated cyclodextrins, substituted peralkylated cyclodextrins, pyrenes, or substituted pyrenes, or derivatives thereof. Other embodiments are also included herein.
ADDITIVE MANUFACTURING SYSTEM WITH X-RAY BACKSCATTER IMAGING SYSTEM AND METHOD OF INSPECTING A STRUCTURE DURING ADDITIVE MANUFACTURING OF THE STRUCTURE
A method of inspecting a structure during additive manufacturing of the structure and additive manufacturing systems are presented. An additive manufacturing system comprises additive manufacturing equipment comprising a casing and an additive manufacturing head configured to form a plurality of layers of a structure within the casing; and an x-ray backscatter imaging system configured to send an x-ray beam into a structure formed within the additive manufacturing equipment and detect scattered x-rays for imaging and analysis of the structure during fabrication.
X-ray fluorescence spectrometer
The present invention relates to an X-ray fluorescence, XRF, spectrometer, for measuring X-ray fluorescence emitted by a target, wherein the XRF spectrometer comprises an X-ray tube with an anode to emit a divergent X-ray beam, a capillary lens that is configured to focus the divergent X-ray beam on the target, an aperture system that is positioned between the anode of the X-ray tube and the capillary lens and comprises at least one pinhole, and a detector that is configured for detecting X-ray fluorescence radiation emitted by the target, wherein the at least one pinhole is configured for being inserted into the divergent X-ray beam and for reducing a beam cross section of the divergent X-ray beam between the anode and the capillary lens. The present invention further relates to an aperture system for a spectrometer, to the use of an aperture system for adjusting the focal depth of a spectrometer and to a method for adjusting the focal depth of as spectrometer.
Time-dependent defect inspection apparatus
An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus for detecting a thin device structure defect is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source to direct charged particles to a location of a wafer under inspection over a time sequence. The improved charged particle beam apparatus may further include a controller configured to sample multiple images of the area of the wafer at difference times over the time sequence. The multiple images may be compared to detect a voltage contrast difference or changes to identify a thin device structure defect.