A method is disclosed for providing a component. During this method, braze powder is deposited with a substrate. The braze powder is sintered together during the depositing of the braze powder to provide the substrate with sintered braze material. The sintered braze material is heated to melt the sintered braze material and to diffusion bond the sintered braze material to the substrate to provide braze filler material. A first object is scanned using computed tomography to provide first object scan data. The first object includes the substrate and the braze filler material diffusion bonded to the substrate. The first object scan data is compared to first object reference data to provide machining data. The first object is machined using the machining data to provide a second object.

A method includes determining a predicted contrast-to-noise ratio sensitivity function (CNR SF) for crack detection of a predetermined target flaw size with the radiographic inspection system in the selected set-up. The method also includes qualifying an inspection image quality indicator (IQI) for the predetermined target flaw size for use in the radiographic inspection system in the selected set-up. The method also includes performing an inspection process. The inspection process includes selecting the qualified inspection IQI for the predetermined target flaw size. The inspection process also includes performing an inspection test on the qualified inspection IQI using the radiographic inspection system in the selected set-up. The inspection process also includes determining one or more inspection output parameters. The inspection process also includes verifying that the one or more inspection output parameters meet or exceed minimum qualified values to qualify the radiographic inspection system in the selected set-up.

A method of detecting defects on a surface or interface of a part is provided. The method includes: providing data from an X-ray scan of the part; processing the scan data to obtain an original 3D or 2D model of a surface or interface topology of the part; and filtering the original 3D or 2D model of the surface or interface topology to identify deviations from the expected surface or interface topology of the part. The identified deviations may be produced by surface or interface defects on the part.

An electron beam inspection apparatus according to one aspect of the present invention includes an image acquisition mechanism to acquire a secondary electron image by scanning a substrate, on which a figure pattern is formed, with an electron beam, and detecting a secondary electron emitted due to irradiation with the electron beam by the scanning, a resize processing unit to perform, using design pattern data being a basis of the figure pattern, resize processing on the figure pattern to enlarge its size in a scan direction of the electron beam, a first developed image generation unit to generate, using the design pattern data which has not been resized, a first developed image by developing an image of a design pattern of a region corresponding to the secondary electron image, a second developed image generation unit to generate, using partial patterns enlarged by the resize processing in the figure pattern having been resized, a second developed image by developing an image of partial patterns in a region corresponding to the secondary electron image, a map generation unit to generate a pseudo defect candidate pixel map which can identify a pseudo defect candidate pixel that has no pattern in the first developed image and has a pattern in the second developed image, a reference image generation unit to generate a reference image of the region corresponding to the second electron image, and a comparison unit to compare, using the pseudo defect candidate pixel map, the second electron image with the reference image of the region corresponding to the second electron image.

Aspects of the disclosure are directed to an analysis of a material of a component. A radiation source is activated to transmit radiation to the component. A beam pattern is obtained based on the component interfering with the radiation. The beam pattern is compared to a reference beam pattern. An anomaly is detected to exist in the material when the comparison indicates a deviation between the beam pattern and the reference beam pattern.

The present disclosure relates to an X-ray measuring method and an X-ray measuring device for measuring a strand.

A reaching and grabbing assist device is provided having a reaching extension for aid in reaching out of distance objects. The distal terminus of the extension has an articulating grapnel that may be angularly positioned about the lateral centerline of the shaft. A support strip on the user's wrist allows total control without the risk of the device falling out of one's grasp or reach. Made of a hard outer casing, the shaft may allow internal rigging to connect the articulating grapnel to controls at the handle. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.

A defect inspection device is provided with an illumination optical system that irradiates light or an electron beam onto a sample, a detector that detects a signal obtained from the sample through the irradiation of the light or electron beam, a defect detection unit that detects a defect candidate on the sample through the comparison of a signal output by the detector and a prescribed threshold, and a display unit that displays a setting screen for setting the threshold. The setting screen is a two-dimensional distribution map that represents the distribution of the defect candidates in a three dimensional feature space having three features as the axes thereof and includes the axes of the three features and the threshold, which is represented in one dimension.

Aspects of the disclosure are directed to an analysis of a material of a component. A radiation source is activated to transmit radiation to the component. A beam pattern is obtained based on the component interfering with the radiation. The beam pattern is compared to a reference beam pattern. An anomaly is detected to exist in the material when the comparison indicates a deviation between the beam pattern and the reference beam pattern.

A sizing apparatus has input and output ends and a sampling window therebetween. Sizing means determines the size of each item passing through the sampling window. Singulating means arranges the items in a line and delivers them sequentially at the input end of the sizing apparatus. A lower conveyor belt extends through the sizing apparatus from the input end through the sampling window to the output end. The lower conveyor belt is translated at a speed sufficient to receive, transport, and maintain the items in sequential fashion. A flexible upper stabilizer belt is arranged above and generally in alignment with the lower conveyor belt, and is driven to match the speed of the lower conveyor belt. The upper stabilizer belt is suspended so as to engage the items incoming from said singulating means and to maintain loose contact with them until the items have passed through the sampling window.