According to this invention, a scanning probe microscope for scanning a surface of a sample with a probe by bringing the probe into contact with the surface of the sample, comprises a cantilever having the probe at its tip; a displacement detection unit to detect both a bending amount and a torsion amount of the cantilever; and a contact determination unit to determine a primary contact of the probe with the surface of the sample, based on the bending amount and the torsion amount detected by the displacement detection unit in all directions from an undeformed condition of the cantilever.

An atomic force microscope includes a cantilever operating in amplitude modulation mode. A controller determines the amplitude of the cantilever oscillation by processing a signal representative of the cantilever motion by square-rooting a signal having a value substantially equal to a sum of a square of the received signal and a squared and phase-shifted version of the received signal. The aforementioned processing, in some implementations is implemented using analog circuit components.

Provided is a scanning probe microscope, and in particular, a scanning probe microscope capable of scanning a large area using a probe including a plurality of conductive tips and capable of simply generating a surface image of a sample with high resolution by recognizing only two binary states of contact/non-contact between the conductive tips and a surface of the sample.

The present application relates to an apparatus for a scanning probe microscope, said apparatus having: (a) at least one first measuring probe having at least one first cantilever, the free end of which has a first measuring tip; (b) at least one first reflective area arranged in the region of the free end of the at least one first cantilever and embodied to reflect at least two light beams in different directions; and (c) at least two first interferometers embodied to use the at least two light beams reflected by the at least one first reflective area to determine the position of the first measuring tip.

The present application relates to a method for avoiding damage when analyzing a sample surface with a scanning probe microscope, the method comprising the step of: detecting an electrostatic interaction between a charging of the sample surface and a measuring tip of the scanning probe microscope in the course of the approach of the measuring tip to the sample surface already at a distance from the sample surface which is greater than the distance of the measuring tip when analyzing the sample surface.

A method includes scanning a probe laterally across a surface so that the probe follows a scanning motion across the surface and steering a detection beam onto the probe via a steering mirror, the detection beam reflecting from the probe in the form of a return beam. The method also includes moving the steering mirror so that the detection beam follows a tracking motion which is synchronous with the scanning motion and the detection beam remains steered onto the probe by the steering mirror and using the return beam to obtain image measurements, each indicative of a measured height of a respective point on the surface. An associated height error measurement is obtained for each point on the surface, each measurement being indicative of a respective error in the measured height. The height error measurements are used to correct the image measurements so as to generate corrected image measurements.

The present application relates to an apparatus for a scanning probe microscope, said apparatus having: (a) at least one first measuring probe having at least one first cantilever, the free end of which has a first measuring tip; (b) at least one first reflective area arranged in the region of the free end of the at least one first cantilever and embodied to reflect at least two light beams in different directions; and (c) at least two first interferometers embodied to use the at least two light beams reflected by the at least one first reflective area to determine the position of the first measuring tip.

A nanoprober system can land a probe onto a device under test (DUT) by positioning a conductive probe above the DUT by a motion control device; applying electrical signals between the conductive probe and the DUT; measuring electrical responses from the applied electrical signal; calculating impedance magnitude values and / or phase angle values based on the measured electrical response values; causing the conductive probe to move towards the DUT while continuing to calculate impedance magnitude values and / or phase angle values from measured electrical response; determining that the conductive probe has contacted the DUT based on a change in the calculated impedance magnitude values and / or phase angle values; and signaling to the motion control device to stop moving the probe towards the DUT based on the change in the calculated impedance magnitude values and / or phase angle values.

The present document relates to a scanning probe microscopy system and method for mapping nanostructures on the surface of a sample. The system comprises a sample support structure, a scan head including a probe comprising a cantilever and a probe tip, and an actuator for scanning the probe tip relative to the sample surface. The system also includes an optical source, and a sensor unit for obtaining a sensor signal indicative of a position of the probe tip. The sensor unit includes a partially reflecting element for reflecting a reference fraction and for transmitting a sensing fraction of the optical signal. It further includes directional optics for directing the sensing fraction as an optical beam towards the probe tip, and for receiving a reflected fraction thereof to provide a sensed signal. Moreover the sensor includes an interferometer for providing one or more output signals, and signal conveyance optics for conveying the sensed signal and the reference signal to the interferometer. The directional optics is configured for directing the sensing fraction such that at least a part of the sensing fraction is reflected by the probe tip such as to form the reflected fraction.

The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system. A probe tip and substrate surface are moved relative to each other in one or more directions parallel to the scanning plane to position the probe tip to a scanning position on the substrate surface with the probe tip; a displacement is measured by an encoder of said probe tip in said one or more directions; and a fiducial pattern is provided fixed relative to the substrate surface, said fiducial pattern having a scannable structure that is scannable by said probe tip and said structure forming a grid of fiducial marks in said one or more dimensions; said grid dimensioned to allow for measuring placement deviations of the probe tip relative to the probe head by identifying one or more fiducial marks in the fiducial pattern.