An efficient method of scanning is provided that may be used for treatment, analysis, inspection and testing physical objects and spaces. High precision, resolution and throughput of scanning are achieved by employing a dual motion of probing devices and scanned objects. A probing device spins with high speed about an axis of spinning directed towards a scanned object. Concurrently, the spinning axis is set in a relatively slow motion with respect to the scanned object. Both the spinning of the probing and the motion of the spin axis are implemented in a controlled and predetermined way to achieve objectives of scanning. Accordingly, arbitrary large and shaped objects may be efficiently scanned with high precision and throughput.

In the system and method disclosed, an ultrahigh vacuum (UHV) scanning tunneling microscope (STM) tip is used to selectively desorb hydrogen atoms from the Si(100)-2X1:H surface by injecting electrons at a negative sample bias voltage. A new lithography method is disclosed that allows the STM to operate under imaging conditions and simultaneously desorb H atoms as required. A high frequency signal is added to the negative sample bias voltage to deliver the required energy for hydrogen removal. The resulted current at this frequency and its harmonics are filtered to minimize their effect on the operation of the STM's feedback loop. This approach offers a significant potential for controlled and precise removal of hydrogen atoms from a hydrogen-terminated silicon surface and thus may be used for the fabrication of practical silicon-based atomic-scale devices.

The present invention relates to a device for operating at least one bending beam in at least one closed control loop, wherein the device has: (a) at least one first interface designed to receive at least one controlled variable of the at least one control loop; (b) at least one programmable logic circuit designed to process a control error of the at least one control loop using a bit depth greater than the bit depth of the controlled variable; and (c) at least one second interface designed to provide a manipulated variable of the at least one control loop.

An AFM that suppress parasitic deflection signals is described. In particular, the AFM may use a cantilever with a probe tip that is offset along a lateral direction from a longitudinal axis of torsion of the cantilever. During AFM measurements, an actuator may vary a distance between the sample and the probe tip along a direction approximately perpendicular to a plane of the sample stage in an intermittent contact mode. Then, a measurement circuit may measure a lateral signal associated with a torsional mode of the cantilever during the AFM measurements. This lateral signal may correspond to a force between the sample and the probe tip. Moreover, a feedback circuit may maintain, relative to a threshold value: the force between the sample and the probe tip; and/or a deflection of the cantilever corresponding to the force. Next, the AFM may determine information about the sample based on the lateral signal.

A measuring device for a scanning probe microscope including a sample receptacle configured to receive a sample; a measuring probe which is arranged on a probe holder and has a probe tip; a displacement device which moves the measuring probe and the sample receptacle relative to each other; a control device which is connected to the displacement device and controls the relative movement between the measuring probe and the sample receptacle; and a sensor device which is configured to detect, movement measurement signals during an absolute measurement for a movement of the measuring probe and/or a movement of the sample receptacle. The movement measurement signals are relayed to the control device. The control device is configured to control the relative movement. The invention also provides a scanning probe microscope, as well as a method for examining a sample.

The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system. A probe tip and substrate surface are moved relative to each other in one or more directions parallel to the scanning plane to position the probe tip to a scanning position on the substrate surface with the probe tip; a displacement is measured by an encoder of said probe tip in said one or more directions; and a fiducial pattern is provided fixed relative to the substrate surface, said fiducial pattern having a scannable structure that is scannable by said probe tip and said structure forming a grid of fiducial marks in said one or more dimensions; said grid dimensioned to allow for measuring placement deviations of the probe tip relative to the probe head by identifying one or more fiducial marks in the fiducial pattern.

In the system and method disclosed, an ultrahigh vacuum (UHV) scanning tunneling microscope (STM) tip is used to selectively desorb hydrogen atoms from the Si(100)-2X1:H surface by injecting electrons at a negative sample bias voltage. A new lithography method is disclosed that allows the STM to operate under imaging conditions and simultaneously desorb H atoms as required. A high frequency signal is added to the negative sample bias voltage to deliver the required energy for hydrogen removal. The resulted current at this frequency and its harmonics are filtered to minimize their effect on the operation of the STM's feedback loop. This approach offers a significant potential for controlled and precise removal of hydrogen atoms from a hydrogen-terminated silicon surface and thus may be used for the fabrication of practical silicon-based atomic-scale devices.

A method of operating a scanning probe microscope, wherein a control loop is provided which is configured for controlling one or more feedback parameters of the scanning probe microscope. One or more system identification measurements are performed during operation of the control loop, wherein during the one or more system identification measurements an excitation signal with a plurality of frequency components is introduced in the control loop and a resulting response signal indicative of a cantilever displacement or a stage-sample distance between a sensor device and a sample is measured. A model response function is identified using said excitation signal and said resulting response signal, wherein one or more settings and/or input signals are adapted in the control loop based on the identified model response function. The scanning probe microscope is used for characterization of the sample using the adapted one or more settings and/or input signals.

A scanning probe microscope for high-speed imaging and/or nanomechanical mapping including a scanning probe comprising a cantilever with a tip at the distal end, and means for modulating a tip-sample distance separating the tip from an intended sample to be viewed with the microscope, the means for modulating being adapted to provide a direct cantilever actuation.

A method of carrying out sub-resonant tapping in an atomic force microscope includes causing a probe that is disposed above a sample to be translated in a direction parallel to a horizontal plane defined by the sample and to oscillate in a vertical direction that is perpendicular to the horizontal plane about an equilibrium line that is separated from the horizontal plane by a vertical offset. As a result, the probe repeatedly taps a surface of the sample. Each tap begins with a first contact of the probe on the surface followed by a progressive increase in force exerted by the sample on the probe until a peak force is attained. The vertical offset is controlled by relying at least in part on a feature other than the peak force as a basis for controlling the vertical offset.