Patent classifications
G01Q60/40
Tip enhanced laser assisted sample transfer for biomolecule mass spectrometry
Disclosed are various embodiments for transferring molecules from a surface for mass spectrometry and other sample analysis methods, and the like. A laser is focused onto a tip of an atomic force microscope to remove and capture a quantity of molecules from the surface, so they can be transferred to a mass spectrometer or another instrument for analysis.
COMPACT PROBE FOR ATOMIC-FORCE MICROSCOPY AND ATOMIC-FORCE MICROSCOPE INCLUDING SUCH A PROBE
A probe for atomic force microscopy comprises a tip for atomic force microscopy oriented in a direction referred to as the longitudinal direction and protrudes from an edge of a substrate in the longitudinal direction, wherein the tip is arranged at one end of a shuttle attached to the substrate at least via a first and via a second structure, which structures are referred to as support structures, at least the first support structure being a flexible structure, extending in a direction referred to as the transverse direction, perpendicular to the longitudinal direction and anchored to the substrate by at least one mechanical linkage in the transverse direction, the support structures being suitable for allowing the shuttle to be displaced in the longitudinal direction. An atomic force microscope comprising at least one such probe is also provided.
COMPACT PROBE FOR ATOMIC-FORCE MICROSCOPY AND ATOMIC-FORCE MICROSCOPE INCLUDING SUCH A PROBE
A probe for atomic force microscopy comprises a tip for atomic force microscopy oriented in a direction referred to as the longitudinal direction and protrudes from an edge of a substrate in the longitudinal direction, wherein the tip is arranged at one end of a shuttle attached to the substrate at least via a first and via a second structure, which structures are referred to as support structures, at least the first support structure being a flexible structure, extending in a direction referred to as the transverse direction, perpendicular to the longitudinal direction and anchored to the substrate by at least one mechanical linkage in the transverse direction, the support structures being suitable for allowing the shuttle to be displaced in the longitudinal direction. An atomic force microscope comprising at least one such probe is also provided.
Manufacturing process with atomic level inspection
Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.
Manufacturing process with atomic level inspection
Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.
Electrostatic force balance microscopy
An apparatus for mapping the topography of a sample, comprising a control electrode, an oscillator adapted to, provide an AC signal to the control electrode and the sample, a cantilever having a tip, wherein the cantilever is positioned between the control electrode and the sample, a deflection monitoring component, a controller connected to the deflection monitoring component, and a transducer, wherein the transducer raises or lowers the sample with respect to the cantilever until force balance is achieved.
A method of providing a bias for depletion while sensing the DC potential of buried lines comprises the steps of setting an oscillator frequency, and if tip-sample bias is needed, setting a DC source to set the tip-sample bias, and monitoring a ratio of gains of a first amplifier and a second amplifier wherein if the ratio has changed, adjusting the first amplifier to null the 2 signal.
HIGH TEMPERATURE SUPERCONDUCTING DEVICES AND METHODS THEREOF
A high temperature superconducting device including a substrate, a high temperature superconducting thin film disposed on the substrate and one or more non-superconducting thin film regions formed adjacent to and across a substantially entire thickness of the high temperature superconducting thin film. In the high temperature superconducting device, the one or more non-superconducting thin film regions are formed from degrading corresponding superconducting materials same to the high temperature superconducting thin film through applying an external voltage. In addition, the one or more non-superconducting thin film regions and the high temperature superconducting thin film form one or more Josephson tunnel junctions.
MANUFACTURING PROCESS WITH ATOMIC LEVEL INSPECTION
Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.
MANUFACTURING PROCESS WITH ATOMIC LEVEL INSPECTION
Costs may be avoided and yields improved by applying scanning probe microscopy to substrates in the midst of an integrated circuit fabrication process sequence. Scanning probe microscopy may be used to provide conductance data. Conductance data may relate to device characteristics that are normally not available until the conclusion of device manufacturing. The substrates may be selectively treated to ameliorate a condition revealed by the data. Some substrates may be selectively discarded based on the data to avoid the expense of further processing. A process maintenance operation may be selectively carried out based on the data.
CONDUCTIVE PROBE, ELECTRICAL PROPERTY EVALUATING SYSTEM, SCANNING PROBE MICROSCOPE, CONDUCTIVE PROBE MANUFACTURING METHOD, AND ELECTRICAL PROPERTY MEASURING METHOD
A conductive probe includes a protruding portion provided on an elastic member, a conductive metal film covering at least a tip of the protruding portion; and an insulating thin film covering the conductive metal film provided on the tip of the protruding portion.