The invention relates to a method for obtaining a functionalised sensor tip for atomic force microscopy, which is characterised in that functionalisation takes place by means of an activated vapour silanisation process, comprising: a) evaporating an organometallic compound containing at least one silicon atom and at least one functional group selected from an amine group, a hydroxyl group, a carboxyl group and a thiol group; b) activating the vapour of the organometallic compound of step a) by heating; and c) causing the activated vapour of step b) to impinge on a sensor tip for atomic force microscopy in order to deposit a film of the organometallic compound on the sensor tip, steps b) and c) taking place consecutively. The invention also relates to the functionalised sensor tip obtained using the method.

The invention relates to a method for obtaining a functionalised sensor tip for atomic force microscopy, which is characterised in that functionalisation takes place by means of an activated vapour silanisation process, comprising: a) evaporating an organometallic compound containing at least one silicon atom and at least one functional group selected from an amine group, a hydroxyl group, a carboxyl group and a thiol group; b) activating the vapour of the organometallic compound of step a) by heating; and c) causing the activated vapour of step b) to impinge on a sensor tip for atomic force microscopy in order to deposit a film of the organometallic compound on the sensor tip, steps b) and c) taking place consecutively. The invention also relates to the functionalised sensor tip obtained using the method.

A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

The present invention provides an apparatus and a method for detecting the presence of and/or determining the amount of a label-free microRNA using an atomic force microscope. The method is extremely selective and/or ultrasensitive. In particular, the present invention provides a cantilever comprising a probe that selectively binds to a double strand of DNA/RNA hybrid complex. The probe comprises a hybrid binding domain (HBD) or a variant thereof.

The present invention provides an apparatus and a method for detecting the presence of and/or determining the amount of a label-free microRNA using an atomic force microscope. The method is extremely selective and/or ultrasensitive. In particular, the present invention provides a cantilever comprising a probe that selectively binds to a double strand of DNA/RNA hybrid complex. The probe comprises a hybrid binding domain (HBD) or a variant thereof.

Methods and systems for subsurface imaging of nanostructures buried inside a plate shaped substrate are provided. An ultrasonic generator at a side face of the substrate is used to couple ultrasound waves (W) into an interior of the substrate. The interior has or forms a waveguide for propagating the ultrasound waves (W) in a direction (X) along a length of the substrate transverse to the side face. The nanostructures are imaged using an AFM tip to measure an effect (E) at the top surface caused by direct or indirect interaction of the ultrasound waves (W) with the buried nanostructures.

Methods and systems for subsurface imaging of nanostructures buried inside a plate shaped substrate are provided. An ultrasonic generator at a side face of the substrate is used to couple ultrasound waves (W) into an interior of the substrate. The interior has or forms a waveguide for propagating the ultrasound waves (W) in a direction (X) along a length of the substrate transverse to the side face. The nanostructures are imaged using an AFM tip to measure an effect (E) at the top surface caused by direct or indirect interaction of the ultrasound waves (W) with the buried nanostructures.

A system and method for evaluating a geological formation including subjecting a source-rock sample from the geological formation to atomic force microscopy (AFM) to determine a thermal property or material property of the source-rock sample. The properties determined may include thermal conductivity or material transition temperature.

A system and method for evaluating a geological formation including subjecting a source-rock sample from the geological formation to atomic force microscopy (AFM) to determine a thermal property or material property of the source-rock sample. The properties determined may include thermal conductivity or material transition temperature.

A scanning probe microscope and method of operating the microscope uses a resonant material between a metallic probe tip and a surface of a sample with at least one material having a dielectric constant . When electromagnetic radiation from a light source is transmitted to an interface between the metallic probe tip and the sample, absorption of the electromagnetic radiation by the resonant sensor material that is dependent on the dielectric constant of the at least one material of the sample is detected.