The present disclosure discloses a method for detecting electrical characteristics of individual soot nanoparticles, wherein the electrical characteristics comprise conductance and work function. The conductance of individual soot nanoparticles is measured by a PF-TUNA mode of an atomic force microscope, and the work function of soot nanoparticles is measured by a KPFM mode of the atomic force microscope. The method mainly comprises steps of preparing a gold film substrate, sampling soot nanoparticles, measuring the conductance of individual soot nanoparticles, and measuring the work function of soot nanoparticles. The detection method of the present disclosure reduces the influence on the inherent characteristics of soot nanoparticles.

A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

A new resonant-cavity-enhanced Atomic Force Microscopy (AFM) active optical probe integrates a semiconductor laser source and an aperture AFM/near-field scanning optical microscopy (NSOM) probe in either external-resonant-cavity or internal-resonant-cavity configuration to enable both conventional AFM measurements and optical imaging and spectroscopy at the nanoscale.

A new resonant-cavity-enhanced Atomic Force Microscopy (AFM) active optical probe integrates a semiconductor laser source and an aperture AFM/near-field scanning optical microscopy (NSOM) probe in either external-resonant-cavity or internal-resonant-cavity configuration to enable both conventional AFM measurements and optical imaging and spectroscopy at the nanoscale.

A scanning probe microscope includes a tip. A quantum dot is applied to the tip.

A scanning probe microscope includes a tip. A quantum dot is applied to the tip.

A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

Exemplary embodiments of the present disclosure can include, for example, an atomic force microscopy (AFM) system, including a cantilever(s), an optical pickup unit(s) (OPU(s)) including a laser positioned over the cantilever(s), and a power source providing noise with a noise level that is below 300 Picometers. The noise level of the power source can be below 200

Picometers. A digitizing arrangement can be included which can be associated with the OPU. The digitizing arrangement(s) can have a bandwidth of about 2 MHZ. The OPU(s) can have a detection bandwidth of at least 80 MHZ. The exemplary apparatus can be combined with a chemical protocol and statistical signal processing and image analysis procedures to map DNA at high speed and accuracy.

Exemplary embodiments of the present disclosure can include, for example, an atomic force microscopy (AFM) system, including a cantilever(s), an optical pickup unit(s) (OPU(s)) including a laser positioned over the cantilever(s), and a power source providing noise with a noise level that is below 300 Picometers. The noise level of the power source can be below 200

Picometers. A digitizing arrangement can be included which can be associated with the OPU. The digitizing arrangement(s) can have a bandwidth of about 2 MHZ. The OPU(s) can have a detection bandwidth of at least 80 MHZ. The exemplary apparatus can be combined with a chemical protocol and statistical signal processing and image analysis procedures to map DNA at high speed and accuracy.

Exemplary embodiments of the present disclosure can include, for example, an atomic force microscopy (AFM) system, including a cantilever(s), an optical pickup unit(s) (OPU(s)) including a laser positioned over the cantilever(s), and a power source providing noise with a noise level that is below 300 Picometers. The noise level of the power source can be below 200 Picometers. A digitizing arrangement can be included which can be associated with the OPU. The digitizing arrangement(s) can have a bandwidth of about 2 MHZ. The OPU(s) can have a detection bandwidth of at least 80 MHZ. The exemplary apparatus can be combined with a chemical protocol and statistical signal processing and image analysis procedures to map DNA at high speed and accuracy.