Patent classifications
G01Q70/12
Atomic force microscope integrated with a multiple degrees-of-freedom magnetic actuator
The present invention relates to a biomolecular measurement system (1), which enables to measure the intermolecular forces arising from the interaction between two biomolecules or the intramolecular forces within a single biomolecule by using an atomic force microscope (AFM). In the present invention, the cantilever (2) is moved only when the actuator (4) moves the magnetic nanowire (3) and thus moves the molecule attached to the end of the magnetic nanowire (3). Since the cantilever (2) is not moved, fluctuation and disturbance is not created in the liquid containing the biomolecules. Thus, the measurements are made more accurately and with higher resolution. Additionally, by means of the actuator (4), the biomolecules are enabled to be moved upon exertion of magnetic force at any coordinate on x, y and z axes on the nanowire (3), or exertion of torque on two axes.
Carbon nanomaterial functionalized needle tip modified with low work function material and preparation method thereof
A carbon nanomaterial functionalized needle tip is modified with a low work function material. The needle tip is formed by combining a carbon nanomaterial with a material of a needle tip through a covalent bond. The interior or outer surface of the carbon nanomaterial is modified with a low work function material. The material of the needle tip is a metal which can be any of tungsten, iron, cobalt, nickel, and titanium. The carbon nanomaterial can be carbon nanocone or carbon nanotube. The tip of the carbon nanomaterial has the same orientation as the metal needle tip. The low work function material can be selected from metals, metal carbides, metal oxides, borides, nitrides, and endohedral metallofullerene. The carbon nanomaterial functionalized needle tip has a lower electron emission barrier, and can effectively reduce the electric field intensity required for electron emission, and improve the emission current and emission efficiency.
Carbon nanomaterial functionalized needle tip modified with low work function material and preparation method thereof
A carbon nanomaterial functionalized needle tip is modified with a low work function material. The needle tip is formed by combining a carbon nanomaterial with a material of a needle tip through a covalent bond. The interior or outer surface of the carbon nanomaterial is modified with a low work function material. The material of the needle tip is a metal which can be any of tungsten, iron, cobalt, nickel, and titanium. The carbon nanomaterial can be carbon nanocone or carbon nanotube. The tip of the carbon nanomaterial has the same orientation as the metal needle tip. The low work function material can be selected from metals, metal carbides, metal oxides, borides, nitrides, and endohedral metallofullerene. The carbon nanomaterial functionalized needle tip has a lower electron emission barrier, and can effectively reduce the electric field intensity required for electron emission, and improve the emission current and emission efficiency.
Method of manufacturing a MEMS device
A method of manufacturing a MEMS device comprising a main body and a protrusion. To provide a generic method of manufacturing a protrusion with reduced vulnerability, the method includes creating a recess in a wafer substrate, said recess having an upper recess section and a lower recess section. The upper recess section is created using anisotropic etching and the lower recess section is formed using corner lithography followed by directional etching. Finally, a filler material is introduced in the recess and at least part of the wafer substrate material is removed so as to expose the filler material introduced in the recess. Additionally, the method allows for the batch-wise production of protrusions having oblique ends.
Method of manufacturing a MEMS device
A method of manufacturing a MEMS device comprising a main body and a protrusion. To provide a generic method of manufacturing a protrusion with reduced vulnerability, the method includes creating a recess in a wafer substrate, said recess having an upper recess section and a lower recess section. The upper recess section is created using anisotropic etching and the lower recess section is formed using corner lithography followed by directional etching. Finally, a filler material is introduced in the recess and at least part of the wafer substrate material is removed so as to expose the filler material introduced in the recess. Additionally, the method allows for the batch-wise production of protrusions having oblique ends.
DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.