The invention provides a solution based process based on high molecular weight block copolymer (BCP) nanolithography for fabrication of periodic structures on large areas of optical surfaces. In one embodiment there is provided method of fabricating a nano-patterned surface for application in a photonic, optical or other related device, said method comprising the steps of: providing a substrate material; depositing a block copolymer (BCP) material on the substrate material; and phase separating the BCPs using at least one solvent selected to facilitate polymer chain mobilisation and lead to phase separation to fabricate said nano-patterned surface; wherein the nano-patterned surface comprises an ordered array of structures and having a domain or diameter of 100 nm or greater. A new photonic device and optical device is also described.

The invention provides a solution based process based on high molecular weight block copolymer (BCP) nanolithography for fabrication of periodic structures on large areas of optical surfaces. In one embodiment there is provided method of fabricating a nano-patterned surface for application in a photonic, optical or other related device, said method comprising the steps of: providing a substrate material; depositing a block copolymer (BCP) material on the substrate material; and phase separating the BCPs using at least one solvent selected to facilitate polymer chain mobilisation and lead to phase separation to fabricate said nano-patterned surface; wherein the nano-patterned surface comprises an ordered array of structures and having a domain or diameter of 100 nm or greater. A new photonic device and optical device is also described.

A multilayer film according to an embodiment of the present disclosure includes: semiconductor layers; and dielectric layers. In each of the semiconductor layers, a value of an optical constant k1 for light having a wavelength in a visible light region among optical constants k is larger than a value of an optical constant k2 for light having a wavelength in an infrared light region. The optical constants k each serves as an extinction coefficient that includes an imaginary part of a complex refractive index. The semiconductor layers and the dielectric layers are alternately stacked and the multilayer film has an optical distance of 0.3 μm or more and 10 μm or less in a stack direction and absorbs at least a portion of visible light and transmits infrared light.

An optical lens assembly includes a glass lens element. The glass lens element has a refractive power, an optical surface of the glass lens element is non-planar, an anti-reflective membrane layer is formed on the optical surface, and the anti-reflective membrane layer includes a nanostructure layer and a structure connection film. The nanostructure layer has a plurality of ridge-like protrusions extending non-directionally from the optical surface, and a material of the nanostructure layer includes aluminum oxide. The structure connection film is disposed between the optical surface and the nanostructure layer, the structure connection film includes at least one silicon dioxide layer, the at least one silicon dioxide layer contacts a bottom of the nanostructure layer physically, and a thickness of the at least one silicon dioxide layer is greater than or equal to 20 nm and less than or equal to 150 nm.

An optical lens assembly includes a glass lens element. The glass lens element has a refractive power, an optical surface of the glass lens element is non-planar, an anti-reflective membrane layer is formed on the optical surface, and the anti-reflective membrane layer includes a nanostructure layer and a structure connection film. The nanostructure layer has a plurality of ridge-like protrusions extending non-directionally from the optical surface, and a material of the nanostructure layer includes aluminum oxide. The structure connection film is disposed between the optical surface and the nanostructure layer, the structure connection film includes at least one silicon dioxide layer, the at least one silicon dioxide layer contacts a bottom of the nanostructure layer physically, and a thickness of the at least one silicon dioxide layer is greater than or equal to 20 nm and less than or equal to 150 nm.

A transparent covering affixable to a substrate includes a stack of two or more lenses, an adhesive layer interposed between each pair of adjacent lenses from among the two or more lenses, a first anti-reflective coating on a first outermost lens of the stack, and a second anti-reflective coating on a second outermost lens of the stack opposite the first outermost lens. The first anti-reflective coating has a first design wavelength range, and the second anti-reflective coating has a second design wavelength range that is different from the first design wavelength range.

A transparent covering affixable to a substrate includes a stack of two or more lenses, an adhesive layer interposed between each pair of adjacent lenses from among the two or more lenses, a first anti-reflective coating on a first outermost lens of the stack, and a second anti-reflective coating on a second outermost lens of the stack opposite the first outermost lens. The first anti-reflective coating has a first design wavelength range, and the second anti-reflective coating has a second design wavelength range that is different from the first design wavelength range.

An imaging lens assembly includes an imaging lens element assembly, and an optical axis passes through the imaging lens assembly. The imaging lens element assembly includes a plurality of lens elements, and the lens elements includes a first lens element and a second lens element, wherein a refractive index of the first lens element is different from a refractive index of the second lens element. Each of the first lens element and the second lens element includes at least one nanostructure layer and at least one structure connection film. The nanostructure layer is irregularly arranged, the nanostructure layer includes an alumina crystal. The structure connection film is disposed between a surface of the first lens element and the nanostructure layer and between a surface of the second lens element and the nanostructure layer.

A metasurface optical device composed of three stacked dielectric layers which form an anti-reflective structure for wavelengths in a predetermined operational wavelength range within the visible spectrum. The anti-reflective structure contains a rectangular lattice of rhombohedral perturbations that produce guided-mode resonances within the predetermined operational wavelength range. The guided-mode-resonant dielectric metasurface device is capable of detecting by colorimetric readout the presence and orientation of a linearly birefringent anisotropic medium, such as a fibrous tissue, positioned above the stacked dielectric layers.

A metasurface optical device composed of three stacked dielectric layers which form an anti-reflective structure for wavelengths in a predetermined operational wavelength range within the visible spectrum. The anti-reflective structure contains a rectangular lattice of rhombohedral perturbations that produce guided-mode resonances within the predetermined operational wavelength range. The guided-mode-resonant dielectric metasurface device is capable of detecting by colorimetric readout the presence and orientation of a linearly birefringent anisotropic medium, such as a fibrous tissue, positioned above the stacked dielectric layers.