The present invention provides a specific gradient-optical-index porous (GRIP) layer coating on inorganic optical substrate surfaces, and the fabrication method used to create the GRIP layer coating. The method consists of two major processing steps: (1) the co-deposition of an optical index-matching material and a mass density-modulating material, followed by (2) the sacrificial etch of the mass-density-modulating material to reveal a GRIP surface. The method is designed for use with crystalline, polycrystalline, and dry or wet etch-resistant substrate materials, where anti-reflective (AR) solutions using AR surface structures (ARSSs) do not exist. These coatings are designed to minimize Fresnel reflectivity of the original substrate surfaces, using a single porous layer matched to the optical index of the original substrate material.

The present invention provides a specific gradient-optical-index porous (GRIP) layer coating on inorganic optical substrate surfaces, and the fabrication method used to create the GRIP layer coating. The method consists of two major processing steps: (1) the co-deposition of an optical index-matching material and a mass density-modulating material, followed by (2) the sacrificial etch of the mass-density-modulating material to reveal a GRIP surface. The method is designed for use with crystalline, polycrystalline, and dry or wet etch-resistant substrate materials, where anti-reflective (AR) solutions using AR surface structures (ARSSs) do not exist. These coatings are designed to minimize Fresnel reflectivity of the original substrate surfaces, using a single porous layer matched to the optical index of the original substrate material.

Strontium tetraborate can be used as an optical material. Strontium tetraborate exhibits high refractive indices, high optical damage threshold, and high microhardness. The transmission window of strontium tetraborate covers a very broad range of wavelengths, from 130 nm to 3200 nm, making the material particularly useful at VUV wavelengths. An optical component made of strontium tetraborate can be incorporated in an optical system, such as a semiconductor inspection system, a metrology system, or a lithography system. These optical components may include mirrors, lenses, lens arrays, prisms, beam splitters, windows, lamp cells or Brewster-angle optics.

Strontium tetraborate can be used as an optical material. Strontium tetraborate exhibits high refractive indices, high optical damage threshold, and high microhardness. The transmission window of strontium tetraborate covers a very broad range of wavelengths, from 130 nm to 3200 nm, making the material particularly useful at VUV wavelengths. An optical component made of strontium tetraborate can be incorporated in an optical system, such as a semiconductor inspection system, a metrology system, or a lithography system. These optical components may include mirrors, lenses, lens arrays, prisms, beam splitters, windows, lamp cells or Brewster-angle optics.

A process for the production of an optically selective coating of a receiver substrate of a suitable material for solar receiver devices particularly suitable for operating at high temperatures, more specifically for receiver tubes of linear parabolic trough, which comprises: deposition of a layer reflecting infrared radiation consisting of a high-melting metal on a heated receiver substrate of a suitable material; annealing under the same temperature and pressure conditions as the deposition of the reflecting layer; deposition on the high-melting metal of one or more layers of metal-ceramic composite materials (CERMET), wherein the metal is W and the ceramic matrix is YPSZ (“Yttria-Partially Stabilized Zirconia”); deposition on the cermet of an antireflection layer; annealing under the same temperature and pressure conditions as the depositions of the cermet and antireflection layers.

A process for the production of an optically selective coating of a receiver substrate of a suitable material for solar receiver devices particularly suitable for operating at high temperatures, more specifically for receiver tubes of linear parabolic trough, which comprises: deposition of a layer reflecting infrared radiation consisting of a high-melting metal on a heated receiver substrate of a suitable material; annealing under the same temperature and pressure conditions as the deposition of the reflecting layer; deposition on the high-melting metal of one or more layers of metal-ceramic composite materials (CERMET), wherein the metal is W and the ceramic matrix is YPSZ (“Yttria-Partially Stabilized Zirconia”); deposition on the cermet of an antireflection layer; annealing under the same temperature and pressure conditions as the depositions of the cermet and antireflection layers.

A coating composition contains (A) an acrylate component and (B) a metal oxide. A mass ratio (B)/(A) is from 0.6 to 1.3, (A) contains the components (a-1), (a-2) and (a-3), and a content ratio X of (a-1), a content ratio Y of (a-2) and a content ratio Z of (a-3) satisfies the conditions (1) and (2): (a-1): a polyfunctional acrylate compound having 3 or more acrylate groups in one molecule; (a-2): a dendritic aliphatic compound having an acrylate group at an end thereof; and (a-3): a modified acrylate compound having been modified with an alkylene oxide or ε-caprolactone. The condition (1): in (A), X is from 40 to 60% by mass, and a total of Y and Z is from 60 to 40% by mass, and the condition (2): in the total of Y and Z, Z is 30% by mass or more and less than 100% by mass.

A coating composition contains (A) an acrylate component and (B) a metal oxide. A mass ratio (B)/(A) is from 0.6 to 1.3, (A) contains the components (a-1), (a-2) and (a-3), and a content ratio X of (a-1), a content ratio Y of (a-2) and a content ratio Z of (a-3) satisfies the conditions (1) and (2): (a-1): a polyfunctional acrylate compound having 3 or more acrylate groups in one molecule; (a-2): a dendritic aliphatic compound having an acrylate group at an end thereof; and (a-3): a modified acrylate compound having been modified with an alkylene oxide or ε-caprolactone. The condition (1): in (A), X is from 40 to 60% by mass, and a total of Y and Z is from 60 to 40% by mass, and the condition (2): in the total of Y and Z, Z is 30% by mass or more and less than 100% by mass.

The present disclosure relates to a solid-state imaging device that is designed to reduce reflection of incident light at the sidewall surface of the light blocking layer of each phase difference detection pixel, and to an electronic apparatus.

A solid-state imaging device according to one aspect of the present disclosure includes: a normal pixel for generating a pixel signal; and a phase difference detection pixel for generating a phase difference signal for image plane phase difference AF. In this solid-state imaging device, the normal pixel and the phase difference detection pixel each include a photoelectric conversion layer and a lens for gathering incident light onto the photoelectric conversion layer, the phase difference detection pixel includes a light blocking layer having an apertural portion with an aperture deviating from the optical axis of the lens, and an antireflection portion that prevents reflection of the incident light gathered by the lens unit is formed on the light blocking layer. The present disclosure can be applied to back-illuminated CISs.

The present disclosure relates to a solid-state imaging device that is designed to reduce reflection of incident light at the sidewall surface of the light blocking layer of each phase difference detection pixel, and to an electronic apparatus.

A solid-state imaging device according to one aspect of the present disclosure includes: a normal pixel for generating a pixel signal; and a phase difference detection pixel for generating a phase difference signal for image plane phase difference AF. In this solid-state imaging device, the normal pixel and the phase difference detection pixel each include a photoelectric conversion layer and a lens for gathering incident light onto the photoelectric conversion layer, the phase difference detection pixel includes a light blocking layer having an apertural portion with an aperture deviating from the optical axis of the lens, and an antireflection portion that prevents reflection of the incident light gathered by the lens unit is formed on the light blocking layer. The present disclosure can be applied to back-illuminated CISs.