Patent classifications
G02B5/226
Glass substrate, laminated substrate, and production method for glass substrate
The present invention provides a glass substrate in which in a heat treatment step of sticking a silicon substrate and a glass substrate to each other, an alkali ion is hardly diffused into the silicon substrate, and a residual strain generated in the silicon substrate is small. A glass substrate of the present invention has: an average thermal expansion coefficient .sub.50/100 at 50 C. to 100 C. of 2.70 ppm/ C. to 3.20 ppm/ C.; an average thermal expansion coefficient .sub.200/300 at 200 C. to 300 C. of 3.45 ppm/ C. to 3.95 ppm/ C.; a value .sub.200/300/.sub.50/100 obtained by dividing the average thermal expansion coefficient .sub.200/300 at 200 C. to 300 C. by the average thermal expansion coefficient .sub.50/100 at 50 C. to 100 C. of 1.20 to 1.30; and a content of an alkali metal oxide being 0% to 0.1% as expressed in terms of a molar percentage based on oxides.
OPTICAL PRODUCT AND OPTICAL FILTER INCLUDING SAME
The present invention relates to an optical article, and an optical filter and an imaging device including the same. The optical article comprises: a near-infrared absorption glass substrate including a divalent copper ion as a chromatic ingredient; and a pigment dispersion layer formed on one surface or both surfaces of the near-infrared absorption glass substrate and having a near-infrared absorption pigment and an ultraviolet absorption pigment dispersed across the resin matrix thereof. Provided with a first and a second transmission cut-off region, the optical article has the advantage of allowing the fabrication of an excellent near-infrared cut-off filter that can effectively block light in near-infrared and ultraviolet bands and does not permit a difference in color sense with the change of incident angles.
ULTRAVIOLET STERILIZER
The present invention has as its object the provision of an ultraviolet sterilizer that can reduce ultraviolet light in a wavelength region of 230 to 300 nm, which is harmful to the human body, and can output effective light in a wavelength region of 200 to 230 nm with high emission intensity.
The ultraviolet sterilizer of the present invention is an ultraviolet sterilizer comprising: an ultraviolet light source; a lamp storage chamber for storing the ultraviolet light source; and alight guiding part for guiding light from the ultraviolet light source, in which a band pass filter for reducing ultraviolet light in a wavelength region harmful to a human body is provided at least one of a position between the light guiding part and the lamp storage chamber and a position of a light outputting leading end of the light guiding part, and an inner surface of the light guiding part is formed from an ultraviolet absorbing member that absorbs the ultraviolet light in the wavelength region harmful to the human body.
Filter gas
The invention relates to a filter glass comprising Na.sub.2O and K.sub.2O and the following (in % by weight on an oxide basis): TABLE-US-00001 P.sub.2O.sub.5 58-68 Al.sub.2O.sub.3 5-10 CuO 8-15 V.sub.2O.sub.5 0.05-1 SiO.sub.2 <2 F <1 Total RO (R = Mg, Ca, Sr, Ba) 0-11 Total R.sub.2O (R = Li, Na, K) 3-17.
Color filter for low temperature applications
A color filter comprising a cured layer of a photosensitive resist composition comprising a highly reactive polyacrylate monomer and a process for the preparation thereof are provided. The color filter is especially useful for low temperature applications such as electrophoretic displays, polymer dispersed liquid crystal displays, OLED devices and the like.
Photochromic glass with sharp cutoff
A photochromic glass that includes a base glass and a photochromic agent is described. The base glass is a modified boroaluminosilicate glass and the photochromic agent is a nanocrystalline cuprous halide phase. The photochromic glass exhibits a sharp cutoff in the UV or short wavelength visible portion of the spectrum along with an absorption band at longer wavelengths in the visible. The nanocrystalline cuprous halide phase includes Cu.sup.2+, which provides states within the bandgap of the cuprous halide that permit the glass to absorb visible light. Absorption of visible light drives a photochromic transition without compromising the sharp cutoff. The nanocrystalline cuprous halide phase may optionally include Ag.
Light selective transmission type glass and laminated substrate
A light selective transmission type glass 10 according to the present invention includes: a glass substrate 12; and a light selective transmission layer 11 provided on at least one main surface of the glass substrate 12. The glass substrate 12 has an average thermal expansion coefficient .sub.50/100 at 50 C. to 100 C. of 2.70 ppm/ C. to 3.20 ppm/ C., an average thermal expansion coefficient .sub.200/300 at 200 C. to 300 C. of 3.45 ppm/ C. to 3.95 ppm/ C., a value .sub.200/300/.sub.50/100 obtained by dividing the average thermal expansion coefficient .sub.200/300 at 200 C. to 300 C. by the average thermal expansion coefficient .sub.50/100 at 50 C. to 100 C. of 1.20 to 1.30, and a content of an alkali metal oxide being 0% to 0.1%.
RADIATION IMAGE READING DEVICE
A radiation image reading device includes: a light scanning unit; a light detection unit. Each of a transmittance when the excitation light reflected from the surface of the recording medium is transmitted through the optical filter and a transmittance when the signal light emitted from the surface of the recording medium at an angle larger than a predetermined angle with respect to a direction perpendicular to the scan line within the detection surface is transmitted through the optical filter is smaller than a transmittance when the signal light emitted from the surface of the recording medium at an angle smaller than the predetermined angle with respect to a direction perpendicular to the scan line within the detection surface is transmitted through the optical filter.
Organic thin film structure and method for manufacturing same
An organic thin film structure is formed on a surface of a glass substrate. At least two color resist blocks are formed by patterning. A recess is formed between the two adjacent color resist blocks. Each of the color resist blocks has a lower color resist layer and an upper color resist layer formed on a surface of the lower color resist layer. A boundary of the upper color resist layer and a boundary the lower color resist layer are connected, and an angle between the boundaries and the surface of the glass substrate ranges from 10 to 60.
HEAT RAY-SCREENING MATERIAL, INTERLAYER FOR LAMINATED GLASS, AND LAMINATED GLASS
Provided are a heat ray-screening material and an interlayer for laminated glass and laminated glass which have the heat ray-screening material. A first embodiment of the heat ray-screening material has at least a metal flat plate particle-containing layer A containing metal flat plate particles a having an aspect ratio equal to or higher than 10 and equal to or lower than 20. A second embodiment of the heat ray-screening material has at least a metal flat plate particle-containing layer A containing metal flat plate particles a and a metal flat plate particle-containing layer B containing metal flat plate particles b, in which an absolute value of a difference between a maximum reflection wavelength of the metal flat plate particle-containing layer A and a maximum reflection wavelength of the metal flat plate particle-containing layer B is equal to or higher than 220 nm.