In some implementations, a photonic transmission structure includes a first cladding structure; a first active structure disposed over the first cladding structure; and a second cladding structure disposed over the first active structure. The first active structure includes a non-alkali, oxide solution that includes a cation that is niobium.

A graphene optical device according to an embodiment of the present disclosure includes: an upper semiconductor layer; a lower semiconductor layer; and a graphene capacitor disposed between the upper semiconductor layer and the lower semiconductor layer, wherein the graphene capacitor includes a first graphene, a second graphene, and a first insulation layer disposed between the first graphene and the second graphene, wherein the first graphene and the second graphene partially overlap each other when viewed from the upper semiconductor layer toward the lower semiconductor layer.

Disclosed are structures and methods for active optic cable (AOC) assembly having improved thermal characteristics. In one embodiment, an AOC assembly includes a fiber optic cable having a first end attached to a connector with a thermal insert attached to the housing for dissipating heat from the connector. The AOC assembly can dissipate a suitable heat transfer rate from the active components of the connector such as dissipating a heat transfer rate of 0.75 Watts or greater from the connector. In one embodiment, the thermal insert is at least partially disposed under the boot of the connector. In another embodiment, at least one component of the connector has a plurality of fins. Other AOC assemblies may include a connector having a pull tab for dissipating heat from the assembly.

In some implementations, a photonic transmission structure includes a first cladding structure; a first active structure disposed over the first cladding structure; and a second cladding structure disposed over the first active structure. The first active structure includes a non-alkali, oxide solution that includes a cation that is niobium.

A thin film optical waveguide includes a silicon-based substrate, a cladding layer arranged on the silicon-based substrate, and an optical waveguide core layer arranged on the silicon-based substrate. The optical waveguide core layer is arranged in the cladding layer, the refractive index of the optical waveguide core layer is higher than that of the cladding layer, the optical waveguide core layer includes a double-layer optical waveguide dielectric thin film and a thin film material interlayer arranged between the double-layer optical waveguide dielectric thin film, the thin film material interlayer has a two-dimensional lattice sub-wavelength structure, and the effective lattice constant and the duty cycle of the two-dimensional lattice sub-wavelength structure are approximately the same in each propagation direction, so as to make the effective refractive index of the thin film optical waveguide approximately isotropic.

Optical device films and methods of forming optical device films having a RMS surface roughness less than about 2.2 μin and a refractive index greater than 2.0 are provided. In one embodiment, an optical device film is provided and includes a crystalline or nano-crystalline material having a refractive index greater than 2.0. A top surface of the optical device film has a root-mean-square (RMS) surface roughness less than about 2.2 microinches (μin).

A stacked edge coupler for a photonic chip is provided. The stacked edge coupler includes an insulating layer, a waveguide core, a first assisting waveguide, and a back-end-of-line stack. The first assisting waveguide is on the insulating layer. The waveguide core is over the first assisting waveguide and includes a tapered section. The back-end-of-line stack is over the waveguide core. The back-end-of-line stack includes a side edge, a dielectric layer, and a second assisting waveguide. The second assisting waveguide is on the dielectric layer and arranged adjacent to the side edge. The second assisting waveguide has an overlapping arrangement with the tapered section of the waveguide core.

An optical device with an optical transmitter circuit and an optical receiver circuit integrated on a substrate has at least one of a first oblique waveguide extending obliquely with respect to an edge of the substrate at or near an incident port for introducing a light emitted from a light source to the optical device, a second oblique waveguide extending obliquely with respect to the edge of the substrate at or near a signal receiving port optically connected to the optical receiver circuit, and a third oblique waveguide extending obliquely with respect to the edge of the substrate at or near a signal transmission port optically connected to the optical transmitter circuit.

A surface-relief grating comprises a plurality of grating ridges including a first material, and a layer of a second material conformally deposited on surfaces of the plurality of grating ridges. A first region of the surface-relief grating is characterized by a first grating depth and a first duty cycle greater than a first threshold value. A second region of the surface-relief grating is characterized by a second grating depth and a second duty cycle lower than a second threshold value that is lower than the first threshold value. A difference between the first grating depth and the second grating depth is less than 20% of the second grating depth.

A photonic integrated circuit includes a photonic device. The photonic device includes an input region configured to receive an input signal including a plurality of multiplexed channels. The photonic device includes a metastructured dispersive region structured to partially demultiplex the input signal into an output signal and a throughput signal. The output signal includes a channel of the multiplexed channels. The throughput signal includes the remaining channels of the multiplexed channels. The photonic device includes an output region and a throughput region optically coupled with the metastructured dispersive region to receive the output signal and the throughput signal, respectively. The metastructured dispersive region includes a heterogeneous distribution of a first material and a second material that structures the metastructured dispersive region to partially demultiplex the input signal into the output signal and the throughput signal.