A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

A defogger defogs a reflective mirror with heat from sunlight without relying on electric power. A defogger for a reflective mirror includes a heat collector with a hollow structure to store heat from sunlight, an air inlet port through which air is fed into the heat collector, a warm-air outlet port through which air from the heat collector is discharged in a heated state, a support attached to a pole of the reflective mirror, and a connector connecting the heat collector and the support. The structure allows warm air discharged through the warm-air outlet port to come in contact with the surface of the reflective mirror to increase the surface temperature and thus defog the reflective mirror.

A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. At least one insertion opening is in the mount arrangement. The seat section of the carrier element plunges into the insertion opening. In addition, the arrangement includes a channel device for guiding a heat transfer medium is formed in the mount arrangement in the region surrounding the seat section. A method for dissipating heat is provided.

A cleaning device for cleaning a transparent element of an optical or optoelectronic device with a fluid cleaning agent, includes a housing in which the device is arranged. The housing is equipped with an annular channel which can be filled with the cleaning agent via a cleaning agent inlet and encloses at least some areas of the transparent element, and at least one nozzle which is designed to deflect the cleaning agent onto the transparent element and is supplied from the annular channel. The cleaning device allows an increase of uptime and ensured functionality of the optical or optoelectronic device in all weather conditions and operating conditions or to maintain a high degree of uptime and ensured functionality at all times. At least one electrically conductive heating element is provided for heating the annular channel and/or the area of housing directly adjoining the annular channel or the cleaning agent inlet.

An optical element reflects radiation, such as EUV radiation. The optical element includes a substrate with a surface to which a reflective coating is applied. The substrate has at least one channel through which a coolant can flow. The substrate is formed from fused silica, such as titanium-doped fused silica, or a glass ceramic. The channel has a length of at least 10 cm below the surface to which the reflective coating is applied. The cross-sectional area of the channel varies by no more than +/20% over the length of the channel.

A heated extreme ultraviolet (EUV) mirror, method of making same, and a projection optics box (POB) of an EUV lithography scanner employing same, are disclosed. The POB includes EUV mirrors disposed inside a vacuum chamber and arranged respective to project an image of a reflective EUV photolithography mask disposed on a reticle stage onto a wafer disposed on a wafer stage. Each EUV mirror of the plurality of EUV mirrors includes a mirror support and an EUV-reflective multilayer disposed on a front side of the mirror support. The plurality of EUV mirrors includes at least one heated EUV mirror that further includes a resistive heater disposed in the mirror support of the heated EUV mirror. In integrated circuit manufacturing, the exposure of a photoresist layer on a semiconductor wafer to EUV light using the POB includes controlling mirror temperature using a heater embedded in the EUV mirror.

A rearview assembly for a vehicle includes a rearview device and a processor. A housing supports the rearview device and the processor. The housing defines a recess therein. An air moving device is operably coupled with the housing and is configured to draw air from an area exterior to the housing into the recess, thereby cooling at least one of the rearview device and the processor.

An optical element angle adjustment device includes a first hinge that is an elastic hinge configured to connect a first plate and a second plate with each other, an optical element holding part attached to at least one of the first plate and the second plate, and a first adjusting screw configured to apply force in a direction of closing the first hinge to adjust a tilt angle of at least one of the first plate and the second plate. An end in an axis direction of the first adjusting screw is provided with a first press member configured to slidably abut on one of the first plate and the second plate. At least one of a first press member side abutting portion and a first hinge side abutting portion on which the first press member abuts has a curved surface in a curved surface shape.

A cooling system comprising of a coolant manifold, a heat sink configured to fit in the coolant manifold, a plurality of cooling fins formed in the heat sink, and a coolant configured to flow through the coolant manifold to the heat sink. Diamond shaped pin fins associated with the heat sink create a series of divergent fluid paths for the cooling fluid that helps to create turbulence and improved heat transfer.

A semiconductor apparatus includes a light source, a reflection mirror, and a heat exchanger. The reflection mirror has a reflection surface configured to reflect a light of the light source and a channel behind the reflection surface. The heat exchanger is connected to the channel and configured to circulate a working fluid in the channel.