Patent classifications
G02B7/1815
Digital micro-mirror device with a heat dissipation structure
A digital micro-mirror unit is arranged on a circuit board. A digital micro-mirror device mask surroundingly covers the digital micro-mirror unit. A thermo-insulation element is arranged between the digital micro-mirror unit and the digital micro-mirror device mask. The digital micro-mirror unit is thermally insulated against the digital micro-mirror device mask through the thermos-insulation element. A thermoelectric cooler (TEC) is thermally connected to the digital micro-mirror unit. A thermo-conductive body is attached on the hot side of the TEC. Therefore the digital micro-mirror unit can meet temperature requirements of safety standards and avoid reducing its service life.
Lightweight adaptive metal cooled mirrors
The present disclosure generally pertains to lightweight adaptive metal cooled mirrors and methods of producing the same. The metal mirror surface is integrated with and supported by metal channels which are physically incorporated into the mirror surface through an additive manufacturing process. These channels are nominally conformal with the desired mirror surface shape. A liquid or gaseous coolant may be directed through some or all of the channels to cool the mirror surface. The mirrors are produced through an additive manufacturing process which allows for the creation of a unitary optical mirror containing finely spaced channels.
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH REDUCE THERMAL DEFORMATION
A projection exposure apparatus for semiconductor lithography has a mirror arrangement that is exposed to thermal loads in operation. The mirror arrangement includes a mirror carrier having an optically active surface arranged on a top surface of the mirror carrier. A cooling system is integrated into the mirror carrier. The cooling system has cooling lines through which a cooling fluid circulates. The cooling system is designed so that the thermal load introduced into the mirror carrier via the optically active surface is dissipated at least partially into a rear region remote from the top surface of the mirror carrier.
All-reflective solar coronagraph sensor and thermal control subsystem
An all-reflective coronagraph optical system for continuously imaging a wide field of view. The optical system can comprise a fore-optics assembly comprising a plurality of mirrors that reflect light rays, about a wide field of view centered around the Sun, to an aft-optics assembly that reflects the light rays to an image sensor. A fold mirror, having an aperture, is optically supported between the fore-optics assembly and the aft-optics assembly. The aperture defines an angular subtense (e.g., 1.0 degree) sized larger than the angular subtense of the Sun. The aperture facilitates passage of a direct solar image and a solar thermal load. A thermal control subsystem comprises a shroud radiatively coupled to each fore-optics mirror and the fold mirror. A cold radiator is thermally coupled to each shroud. Heaters adjacent fore optics mirrors and the fold mirror control temperature to provide a steady state optical system to minimize wavefront error.
MECHANISM, SYSTEM AND METHOD FOR REDUCING INTERNAL AIR TEMPERATURE GRADIENT IN A CENTRALLY-OBSCURED REFLECTIVE TELESCOPE
In some embodiments, a catadioptric optical system (CDOS) including a centrally obscured reflective telescope is disclosed, which includes: a telescope compartment defining a telescope space therein, a primary reflector including a central opening and a secondary reflector. The reflectors are located in the telescope compartment. The CDOS also includes a mechanism for reducing temperature gradient in the telescope space. The mechanism includes an air duct including a first opening and a second opening; a hollow enclosure including side openings and one or more airflow generation devices. The mechanism is configured for forming an air passageway between the airflow generation device and the inner telescope space via the air duct and hollow enclosure located therebetween, for reducing internal air temperature gradient in the telescope space.
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
Reflector and light sintering apparatus comprising the same
Provided is a reflector comprising: an outer wall; and an inner wall which reflects the xenon lamp light from a xenon lamp toward an object to be light sintered, and which consists of inner side walls and an inner top wall which are spaced apart by a predetermined distance from the outer wall to allow cooling water for cooling heat generated by the xenon lamp light to flow, wherein at least a part of the inner side walls has the same thickness as at least a part of the inner top wall.
Optical element having a coating for influencing heating radiation and optical arrangement
The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (?.sub.EUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.
Fast temperature tuning for optical receivers
A new and improved tunable optical receiver based on thermal optics and controllers for technologies that require fast wavelength channel tuning. The device entails a thermal control system in which a wavelength tunable filter, a sensor and at least two thermal actuators enables fast tuning, which are controlled by advanced algorithms. The key compositions of both parts are outlined and their main requirements are discussed.
OPTICAL ELEMENT ANGLE ADJUSTMENT DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
An optical element angle adjustment device includes a first hinge that is an elastic hinge configured to connect a first plate and a second plate with each other, an optical element holding part attached to at least one of the first plate and the second plate, and a first adjusting screw configured to apply force in a direction of closing the first hinge to adjust a tilt angle of at least one of the first plate and the second plate. An end in an axis direction of the first adjusting screw is provided with a first press member configured to slidably abut on one of the first plate and the second plate. At least one of a first press member side abutting portion and a first hinge side abutting portion on which the first press member abuts has a curved surface in a curved surface shape.