Patent classifications
G02B7/1815
Matrix addressable, line laser, marking system using laser additives
Apparatus and method for using a line laser (LL) to quickly mark a substrate or media by utilizing a laser additive on/within the substrate/media, which greatly reduces the power requirement for marking the substrate/media. The combination of the LL wide swath (>305 mm) and the improved media/surface sensitivity to laser wavelength allows the LL marking system to achieve faster marking than other systems. The LL is mounted over a transport which transports the sensitized substrate/media past the LL for marking. The desired image is projected from the LL line by line in synch with the moving media and once the media passes the beam path of the LL, marking is complete. In this case, the media has been physically-altered via the heat generated by the LL interacting with the photosensitized media and is permanent. A second method would use a photosensitizing agent coated on top of the media to be marked.
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION AND OPTICAL ARRANGEMENT
The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λ.sub.EUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.
Photothermally Actuated Self-Tuning Optical Light Valve
A tunable optical filter for a detector is presented including a plate having a top side and a bottom side. The plate has material properties making it transparent to a range of optical frequencies. A transparent metasurface is proximate the top side of the plate. The transparent metasurface is configured to have a transmissive pass band and a stop band. An undercarriage support structure is proximate the bottom side of the plate. The undercarriage support is responsive to photothermal heating. The undercarriage support is configured to deform from the photothermal heating caused by an undesired signal thereby shifting the stop band in frequency toward the undesired signal to block reception of the undesired signal by the detector.
OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
An optical system, for example in a microlithographic projection exposure apparatus, comprises a mirror and a temperature-regulating device. The mirror has an optical effective surface and a mirror substrate. A plurality of temperature-regulating zones are arranged in the mirror substrate. The temperature-regulating device is used to adjust the temperatures present in each of the temperature-regulating zones independently of one another. The temperature-regulating zones are arranged in at least two planes at different distances from the optical effective surface. The temperature-regulating zones in the at least two planes are configured as cooling channels through which, independently of one another, a cooling fluid at a variably adjustable cooling fluid temperature is able to flow. A method for operating such an optical system is provided.
Heating system for an optical component of a lithographic apparatus
A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.
REFLECTIVE OPTICS PROVIDED WITH A COOLING SYSTEM
Reflective optics for transporting, transforming or correcting a light beam in particular of the laser type, including a mirror receiving the light beam, a primary cooling circuit formed by an intermediate chamber of thermally conductive fluid arranged against the mirror at the rear thereof, and a secondary cooling circuit formed by a thermal heat sink arranged against the intermediate chamber of thermally conductive fluid, the heat sink being either in the form of a cold mass cooled by convection or conduction, or in the form of a plate made from a material with good thermal conductivity, the heat sink having a size and a shape equivalent to those of the reflective optics.
METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY, AND MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY
A method for producing a main body (33) of an optical element for semiconductor lithography includes: —producing a blank (32), —introducing at least one fluid channel (36.x) into the blank (32), then —producing the main body (33) by shaping the blank (32) onto a mold (42). Furthermore, the disclosure describes a main body (33) of an optical element that includes at least one fluid channel (36.x), the fluid channel (36.x) being embodied such that the distance between the fluid channel (36.x) and the surface (40) of the main body (33) provided for an optically active area (41) varies by less than 1 mm, preferably less than 0.1 mm and particularly preferably less than 0.02 mm.
Photothermally actuated self-tuning optical light valve
A tunable optical filter for a detector is presented including a plate having a top side and a bottom side. The plate has material properties making it transparent to a range of optical frequencies. A transparent metasurface is proximate the top side of the plate. The transparent metasurface is configured to have a transmissive pass band and a stop band. An undercarriage support structure is proximate the bottom side of the plate. The undercarriage support is responsive to photothermal heating. The undercarriage support is configured to deform from the photothermal heating caused by an undesired signal thereby shifting the stop band in frequency toward the undesired signal to block reception of the undesired signal by the detector.
HAIR REMOVING DEVICE
The present disclosure provides a hair removing device, including: a reflector, a light source, a first light-transmitting body, a heat dissipation base and a refrigerating member. The light source is arranged inside the reflector and can emit light. The reflector can reflect light, such that the hair removing device can emit light to remove the hair from the skin. The first light-transmitting body and the reflector cooperatively define a cavity to receive the light source. A body of the light source is suspended in the cavity. Two sides of the heat dissipation base are thermally coupled to the reflector and the refrigerating member respectively.
HAIR REMOVING DEVICE
The present disclosure provides a hair removing device, including: a reflector, a light source, a first light-transmitting body, a heat dissipation base and a refrigerating member. The light source is arranged inside the reflector and can emit light. The reflector can reflect light, such that the hair removing device can emit light to remove the hair from the skin. The first light-transmitting body and the reflector cooperatively define a cavity to receive the light source. A body of the light source is suspended in the cavity. Two sides of the heat dissipation base are thermally coupled to the reflector and the refrigerating member respectively.