There is provided a light source module in which an optical element is accommodated in a housing, in which three projection portions are provided in the housing, and the light source module has a structure where the optical element is pressed to be brought into contact with the three projection portions by a pressing member, so that the optical element is fixed in the housing.

A laser beam alignment system includes at least one mirror with a surface pattern configured to receive and reflect a laser beam, at least one detector configured to detect a deflected portion of a laser beam from the mirror, and at least one controller configured to communicate with the at least one mirror and the at least one detector and to control the mirror position on the basis of the deflected portion of the laser beam.

An optical mount includes a support substrate defining an aperture configured to receive an optical element. A support assembly is positioned proximate a perimeter of the aperture. The support assembly includes a resilient member configured reflects in response to relative motion between the optical element and the support substrate. A support plate is positioned on the resilient member and is in contact with the optical element.

A telescope including a fastener plate, a primary mirror carried by a front face of the plate, and a secondary mirror held facing the primary mirror by a support, wherein the support includes a primary sleeve mounted around the primary mirror, a secondary sleeve mounted around the secondary mirror, arms connecting the secondary sleeve to the primary sleeve, and mechanical decoupler for decoupling the secondary mirror relative to the primary mirror.

An adjustable mirror assembly comprising a mirror, a support, a leaf spring element biased between the support and a planar reverse side of the mirror, said leaf spring element generating a spring force, as well as at least two adjusting units mounted in the support and acting on the mirror in opposition to the spring force. The leaf spring element is mounted to the reverse side of the mirror via at least one mirror mounting point by a substance-to-substance bond and to the support via at least one support mounting point. The spring force is directed toward the support.

Disclosed herein is a laser apparatus including: a laser oscillator configured to generate a laser beam; a plurality of mirror mount assemblies each arranged in one of predetermined reference transmission steps, each of the mirror mount assemblies including: a mount-side reflective mirror configured to reflect and transmit the laser beam; and an aligner configured to change alignment of the mount-side reflective mirror to adjust a machining optical path through which the laser beam transmitted by the mount-side reflective mirror travels; a laser nozzle assembly including a laser nozzle configured to radiate the laser beam transmitted from the mirror mount assembly located in the last step of the reference transmission steps onto an object to be processed; a database configured to store big data constructed to include optical path adjustment data indicating a pattern of selective adjustment of the machining optical path by the mount-side reflective mirror linked with the aligner according to a driving method of the aligner; and a controller configured to correct, when distortion occurs in the machining optical path, the distortion of the machining optical path by selectively driving the aligner provided in each of at least one mirror mount assembly among the mirror mount assemblies based on the big data using a driving method according to a pattern of the distortion of the machining optical path.

In one method, a display source aligned with an illumination prism assembly is displaced along a displacement axis to adjust the distance between the display source and a collimating prism assembly. The display source, the illumination prism assembly, and an illumination module are translationally moved in unison in a plane normal to the displacement axis. In another method, a component of an optical device is coupled to a mechanical assembly at a known orientation. The mechanical assembly has a test pattern at a known orientation. An image sensor is aligned with the test pattern, and the image sensor captures an image of the test pattern. The captured image is analyzed to determine an estimated orientation of the test pattern. An orientation parameter of the image sensor is adjusted based on a comparison between the known orientation of the test pattern and the estimated orientation of the test pattern.

Systems and methods of the present disclosure are directed to optics used in absorption cell spectrometers. The absorption cell includes a plurality of mirrors arranged in a manner such that a detection light traverses multiple passes through the fluid within the absorption cell. In some implementations, the detection light is reflected by the plurality of mirrors to form optical paths in more than one plane. In some implementations, the orientation of the mirrors are aligned with specific orientations to provide the desired optical path to the detection light. In one or more embodiments, an alignment apparatus can be used to pre-align the mirrors before they are placed within the absorption cell. The alignment apparatus includes an aperture plate and an adjustable mount to mount one or more mirrors. The mirrors are aligned based on reflected images on the aperture plate laser light incident on the mirrors.

A telescope including a fastener plate, a primary mirror carried by a front face of the plate, and a secondary mirror held facing the primary mirror by a support. The telescope is of the Cassegrain type and the plate has a rear surface including positioning references for positioning the telescope relative to an image capture device arranged facing the rear face.

A projection exposure apparatus for semiconductor lithography having a projection optical unit. The projection optical unit includes a sensor frame, a carrying frame, and a module. The module includes an optical element and actuators for positioning and orienting the optical element. The module is on the carrying frame, and the sensor frame is a reference for the positioning of the optical element. The module includes an infrastructure which includes interfaces for separating a module from the projection optical unit. A method exchanges the module of a projection optical unit of a projection exposure apparatus for semiconductor lithography, wherein the module includes an optical element, while the reference remains in the projection exposure apparatus.