An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.

A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.

An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

The invention concerns an adaptive optical device (I) comprising a deformable plate (2) intended to deform an incident wavefront by refraction and/or reflection, characterised in that it comprises: —tabs (5) fixedly attached to the plate (2), —a frame (21) fixed relative to the plate (2), each tab (5) comprising a moving portion (22) connected to at least one respective peripheral actuator (7) in order that the latter can locally deform the tab (5) in order that the tab transmits a deformation force to the deformable plate (2), each tab (5) further comprising a respective fixed portion (23) fixedly attached to the frame (21) in order to be immobilised relative to the frame. The invention is particularly suitable for the introduction or controlled correction of an optical aberration in an incident wavefront.

An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

The invention concerns an adaptive optical device (I) comprising a deformable plate (2) intended to deform an incident wavefront by refraction and/or reflection, characterised in that it comprises: —tabs (5) fixedly attached to the plate (2), —a frame (21) fixed relative to the plate (2), each tab (5) comprising a moving portion (22) connected to at least one respective peripheral actuator (7) in order that the latter can locally deform the tab (5) in order that the tab transmits a deformation force to the deformable plate (2), each tab (5) further comprising a respective fixed portion (23) fixedly attached to the frame (21) in order to be immobilised relative to the frame. The invention is particularly suitable for the introduction or controlled correction of an optical aberration in an incident wavefront.

A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.

A mirror assembly includes a mirror housing and a mirror. The mirror is supported by the mirror housing. The mirror has an outer reflective surface. The mirror is bendable between a flat shape and a fisheye shape. The mirror assembly further includes an actuator assembly coupled to the mirror. Upon actuation, the actuator assembly is configured to bend the mirror between the flat shape and the fisheye shape to adjust a field of view of the mirror.