An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.

A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.

The invention relates to a device with a planar mirror (1), comprising a first axis of symmetry (A), and an actuating and holding means (10) with a frame (2), said frame (2) being firmly connected to the peripheral surface (1.3) of the planar mirror (1) and centrally contacting the rear surface (1.2) of the planar mirror (1). There is a socket (3), which is linearly adjustable along the axis of symmetry (A) in the frame (2) and is firmly connected, via a membrane spring (8), to the frame (2), on the one hand, and to a crown-like adjusting element (5), on the other hand. The crown-like adjusting element (5) has crown spikes which act on retaining lugs (6) connected to the planar mirror (1) and deform them, thereby applying forces corresponding to said deformation into the planar mirror (1) in order to deform the latter.

The invention relates to a device with a planar mirror (1), comprising a first axis of symmetry (A), and an actuating and holding means (10) with a frame (2), said frame (2) being firmly connected to the peripheral surface (1.3) of the planar mirror (1) and centrally contacting the rear surface (1.2) of the planar mirror (1). There is a socket (3), which is linearly adjustable along the axis of symmetry (A) in the frame (2) and is firmly connected, via a membrane spring (8), to the frame (2), on the one hand, and to a crown-like adjusting element (5), on the other hand. The crown-like adjusting element (5) has crown spikes which act on retaining lugs (6) connected to the planar mirror (1) and deform them, thereby applying forces corresponding to said deformation into the planar mirror (1) in order to deform the latter.

An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.

A deformable mirror with variable curvature including: a plate having a reflective face and opposite hidden face and whose shape has a center (C) and radiuses (r), and at least one actuator intended to exert a force on the hidden face in order to deform the plate. The plate comprises a plurality of primary and secondary portions. The secondary portions being interposed between the primary portions, each of the primary portions extending locally substantially along and on either side of a respective radius (r) among said radiuses (r), and having a stiffness different from the adjacent secondary portions. The deformable mirror is intended to the introduction or the correction of an optical aberration in a light beam.

A deformable mirror with variable curvature including: a plate having a reflective face and opposite hidden face and whose shape has a center (C) and radiuses (r), and at least one actuator intended to exert a force on the hidden face in order to deform the plate. The plate comprises a plurality of primary and secondary portions. The secondary portions being interposed between the primary portions, each of the primary portions extending locally substantially along and on either side of a respective radius (r) among said radiuses (r), and having a stiffness different from the adjacent secondary portions. The deformable mirror is intended to the introduction or the correction of an optical aberration in a light beam.

A mirror is comprised of a reflective film including a flexible polymer with a reflective coating, at least one magnet attached to the reflective film, a motor configured to rotate the reflective film wherein the reflective film is secured to the motor, and at least one electromagnet configured to receive an applied voltage. The mirror further comprises a first flexible support layer to increase the rigidity of the reflective film during curvature change and a second rigid support layer to prevent the reflective film, first support layer, and at least one magnet from contacting the at least one electromagnet.